US4376009A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Limp-stream method for selectively etching integral cathode substrate and support
Assignee: RCA Licensing Corp
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Filing: 1982-04-29
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Granted: 1983-03-08
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Expires: 2002-04-29
Abstract
Abstract In a method for preparing an integral cathode substrate and support in which selected surface portions of a formed metal part are masked, the unmasked surface portions etched, and then the mask removed, the improvement wherein the etching step is conducted by alternately directing a solid limp stream of liquid etchant into and out of contact with the part while permitting the liquid etchant to drain away from the part by gravity.
Inventors
- 👤 Peter J. Kunz
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 18:08
CPC Classifications
C; C23; C23F; C23F1/00; C23F1/02; C23F1/04
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
103 words
In a method for preparing an integral cathode substrate and support including (a) providing a formed metallic part, said part including a cathode substrate and an integral support therefor, (b) masking selected portions of the surface of said part with an etch-resistant mask, (c) etching the unmasked portions of said surface to a desired depth (d) and then removing said mask, the improvement wherein said etching step is conducted by alternately directing a solid limp stream of liquid etchant into and out of contact with said part while permitting said liquid etchant to drain away from said part by the force of gravity.
Claim 2
Dependent Claim
103 words
In a method for preparing an integral cathode substrate and support including (a) providing a formed metallic part, said part including a cathode substrate and an integral support therefor, (b) masking selected portions of the surface of said part with an etch-resistant mask, (c) etching the unmasked portions of said surface to a desired depth (d) and then removing said mask, the improvement wherein said etching step is conducted by alternately directing a solid limp stream of liquid etchant into and out of contact with said part while permitting said liquid etchant to drain away from said part by the force of gravity.
Claim 3
Dependent Claim
36 words
The method defined in claim 1 wherein said metallic part comprises a bimetal laminate of which one metal thereof is soluble in a particular etchant and the other metal thereof is substantially insoluble in said etchant.
Claim 4
Dependent Claim
48 words
The method defined in claim 2 wherein said metallic part comprises a substantially cylindrical bimetal sidewall and a bimetal endwall integral with one end of said sidewall, said endwall comprising said cathode substrate, and wherein said selected masked portions include said endwall and adjacent portions of said sidewall.
Claim 5
Dependent Claim
28 words
A method defined in claim 1 wherein said limp stream is directed alternately into and out of contact with said part between 2 and 10 times per minute.
Claim 6
Dependent Claim
21 words
The method defined in claim 4 wherein said etching step is conducted for a period of between 2 and 5 minutes.
Claim 7
Dependent Claim
23 words
The method defined in claim 5 wherein said etching step is conducted by moving said part and said stream relative to one another.
Claim 8
Dependent Claim
26 words
The method defined in claim 6 wherein said etching step is conducted by moving said part into and out of contact with a stationary downwardly-directed stream.
Claim 9
Dependent Claim
31 words
The method defined in claim 6 wherein said etching step is conducted by downwardly directing said stream and moving said downwardly-directed stream into and out of contact with a stationary part.
Claim 10
Dependent Claim
63 words
The method defined in claim 1 including pressing surface portions of an etch-resistant, compressible sheet against selected surface portions of said part, providing a chamber around said part, said sheet constituting one wall of said chamber, and wherein said etching step is conducted by passing said stream of liquid etchant downwardly through said chamber into contact with unmasked surface portions of said part.
Claim 11
Dependent Claim
76 words
The method defined in claim 9 including providing a plurality of said formed metal parts, each part including an endwall and a peripheral sidewall integral with said endwall, mounting each metal part on a mandrel with all of the external surfaces endwalls of parts located in a plane, pressing surface portions of said sheet against all of said endwalls in said plate, and moving said downwardly-directed stream back and forth over the parts in said chamber.
References Cited (Backward Citations)
US2905539A
Cited
US3432900A
Cited
US3510372A
Cited
US3986911A
Cited
US4021279A
Cited
US3861981A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1986-03-07 | 1986-09-06 | 1987-03-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1990-03-07 | 1990-09-06 | 1991-03-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1994-03-07 | 1994-09-06 | 1995-03-08 | $7700.00 | Window Closed / Lapsed |