US4375398A
Expired / Lapsed
US
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Electron beam sensitive resist of an anhydride copolymer
Assignee: GAF Chemicals Corp
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Filing: 1982-05-24
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Granted: 1983-03-01
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Expires: 2002-05-24
Abstract
Abstract This invention describes an ionizing radiation sensitive material having high contrast, high sensitivity and comprised of a mixed half-ester or half amide of the reaction of an N-hydroxy or N-aminoalkyl amide and a hydroxy alkyl terminally unsaturated compound with an alkylvinyl ether-maleic anhydride copolymer. A typical material is made by reacting hydroxyethyl pyrrolidone and hydroxyethyl acrylate with octadecylvinyl ether-maleic anhydride copolymer.
Inventors
- 👤 Donald H. Lorenz
- 👤 Earl P. Williams
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 08:52
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; G03F7/0388
Claims Analysis
Total Claims: 37
Claim 1
Independent Claim
43 words
A high sensitivity electron beam resist polymer which is the mixed half-ester reaction product of a reaction between an alkyl vinyl ether-maleic anhydride copolymer with a terminally unsaturated alcohol and a compound selected from the group consisting of N-hydroxyalkyl amides and N-aminoalkyl amides.
Claim 2
Dependent Claim
43 words
A high sensitivity electron beam resist polymer which is the mixed half-ester reaction product of a reaction between an alkyl vinyl ether-maleic anhydride copolymer with a terminally unsaturated alcohol and a compound selected from the group consisting of N-hydroxyalkyl amides and N-aminoalkyl amides.
Claim 3
Dependent Claim
31 words
A high sensitivity electron beam resist polymer comprising the mixed half-ester product of the reaction of an N-hydroxyalkyl amide and a terminally unsaturated alcohol with an alkyl vinyl ether-maleic anhydride copolymer.
Claim 4
Dependent Claim
31 words
A high sensitivity electron beam resist polymer comprising the mixed half-ester product of the reaction of an N-hydroxyalkyl amide and a terminally unsaturated alcohol with an alkyl vinyl ether-maleic anhydride copolymer.
Claim 5
Dependent Claim
16 words
A resist according to claim 2 in which said N-hydroxyalkyl amide is an N-hydroxyalkyl cyclic amide.
Claim 6
Dependent Claim
14 words
A resist according to claim 3 in which said amide is a hydroxyalkyl pyrrolidone.
Claim 7
Dependent Claim
13 words
A resist according to claim 3 in which said amide is a hydroxyalkyl-l-caprolactam.
Claim 8
Dependent Claim
20 words
A resist according to claim 3 in which said amide is hydroxyethyl pyrrolidone, hydroxypropyl pyrrolidone, hydroxybutylpyrrolidone, hydroxethyl-l-caprolactam, hydroxypropyl-l-caprolactam or hydroxybutyl-l-caprolactam.
Claim 9
Dependent Claim
16 words
A resist according to claim 2 in which said N-hydroxyalkyl amide is an N-hydroxyalkyl linear amide.
Claim 10
Dependent Claim
16 words
A resist according to claim 7 in which said amide is N-hydroxyethyl acetamide, or N-hydroxyethyl propionamide.
Claim 11
Dependent Claim
25 words
A resist according to claim 2 in which said terminally unsaturated alcohol is hydroxyethyl acrylate, hydroxyethyl methacrylate, 3-hydroxypropyl acrylate, 3-hydroxypropylmethacrylate, 4-hydroxybutyl acrylate or 4-hydroxybutyl methacrylate.
Claim 12
Dependent Claim
33 words
A resist according to claim 2 in which said hydroxyalkyl amide and terminally unsaturated alcohol compounds are present in a molar ratio of about 40:60 to 60:40 to one another in said polymer.
Claim 13
Dependent Claim
33 words
A resist according to claim 2 in which said hydroxyalkyl amide and terminally unsaturated alcohol compounds are present in a molar ratio of about 10:90 to 90:10 to one another in said polymer.
Claim 14
Dependent Claim
31 words
A resist according to claim 2 in which said hydroxyalkyl amide and terminally unsaturated alcohol compounds are present in a molar ratio of about 50:50 to one another in said polymer.
Claim 15
Dependent Claim
31 words
A high sensitivity electron beam resist polymer comprising the mixed half-ester product of the reaction of an N-aminoalkyl amide and a terminally unsaturated alcohol with an alkyl vinyl ether-maleic anhydride copolymer.
Claim 16
Dependent Claim
31 words
A high sensitivity electron beam resist polymer comprising the mixed half-ester product of the reaction of an N-aminoalkyl amide and a terminally unsaturated alcohol with an alkyl vinyl ether-maleic anhydride copolymer.
Claim 17
Dependent Claim
16 words
A resist according to claim 13 in which said N-aminoalkyl amide is an N-aminoalkyl cyclic amide.
Claim 18
Dependent Claim
14 words
A resist according to claim 14 in which said amide is a aminoalkyl pyrrolidone.
Claim 19
Dependent Claim
13 words
A resist according to claim 14 in which said amide is a aminoalkyl-l-caprolactam.
Claim 20
Dependent Claim
20 words
A resist according to claim 14 in which said amide is aminoethyl pyrrolidone, aminopropyl pyrrolidone, aminobutylpyrrolidone, aminoethyl-l-caprolactam, aminopropyl-l-caprolactam or aminobutyl-l-caprolactam.
Claim 21
Dependent Claim
16 words
A resist according to claim 14 in which said N-aminoalkyl amide is an N-aminoalkyl linear amide.
Claim 22
Dependent Claim
16 words
A resist according to claim 18 in which said amide is, N-aminoethyl acetamide, or N-aminoethyl propionamide.
Claim 23
Dependent Claim
25 words
A resist according to claim 13 in which said terminally unsaturated alcohol is hydroxyethyl acrylate, hydroxyethyl methacrylate, 3-hydroxypropyl acrylate, 3-hydroxypropylmethacrylate, 4-hydroxybutyl acrylate or 4-hydroxybutyl methacrylate.
Claim 24
Dependent Claim
33 words
A resist according to claim 13 in which said aminoalkyl amide and terminally unsaturated alcohol compounds are present in a molar ratio of about 40:60 to 60:40 to one another in said polymer.
Claim 25
Dependent Claim
33 words
A resist according to claim 13 in which said aminoalkyl amide and terminally unsaturated alcohol compounds are present in a molar ratio of about 10:90 to 90:10 to one another in said polymer.
Claim 26
Dependent Claim
31 words
A resist according to claim 13 in which said aminoalkyl amide and terminally unsaturated alcohol compounds are present in a molar ratio of about 50:50 to one another in said polymer.
Claim 27
Dependent Claim
23 words
A resist according to claim 2 in which the alkyl group of said alkylvinyl ether-maleic anhydride copolymer is a long chain alkyl group.
Claim 28
Dependent Claim
16 words
A resist according to claim 24 in which said alkyl group has about 10-20 carbon atoms.
Claim 29
Dependent Claim
13 words
A resist according to claim 24 in which said alkyl group is octadecyl.
Claim 30
Dependent Claim
43 words
A high sensitivity electron beam resist according to claim 1 which said polymer material comprises the mixed half-ester product of the reaction of about 40-60 mole percent of hydroxyethyl pyrrolidone and about 60-40 mole percent of hydroxyethyl acrylate with octadecylvinyl ether-maleic anhydride copolymer.
Claim 31
Dependent Claim
21 words
A resist according to claim 27 which comprises about 50 mole percent each of said hydroxyethyl pyrrolidone and said hydroxyethyl acrylate.
Claim 32
Dependent Claim
21 words
A crosslinked negative resist polymer product formed by irradiation of any of the resists of claims 1-28 with an electron beam.
Claim 33
Dependent Claim
36 words
An information recording material sensitive to ionizing radiation exposure comprising a copolymer of maleic anhydride and a vinyl monomer, the maleic anhydride being reacted with a mixture of terminally unsaturated alcohol compound and an N-hydroxyalkyl amide.
Claim 34
Dependent Claim
36 words
An information recording material sensitive to ionizing radiation exposure comprising a copolymer of maleic anhydride and a vinyl monomer, the maleic anhydride being reacted with a mixture of terminally unsaturated alcohol compound and an N-hydroxyalkyl amide.
Claim 35
Dependent Claim
18 words
A resist according to claim 2 which said terminally unsaturated alcohol is allyl, propargyl or penta erythritol triacrylate.
Claim 36
Dependent Claim
36 words
An information recording material sensitive to ionizing radiation exposure comprising a copolymer of maleic anhydride and a vinyl monomer, the maleic anhydride being reacted with a mixture of terminally unsaturated alcohol compound and an N-aminoalkyl amide.
Claim 37
Dependent Claim
36 words
An information recording material sensitive to ionizing radiation exposure comprising a copolymer of maleic anhydride and a vinyl monomer, the maleic anhydride being reacted with a mixture of terminally unsaturated alcohol compound and an N-aminoalkyl amide.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1986-02-28 | 1986-08-30 | 1987-03-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1990-02-28 | 1990-08-30 | 1991-03-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1994-02-28 | 1994-08-30 | 1995-03-01 | $7700.00 | Window Closed / Lapsed |