Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
106 words
A process for pretreating a substantially non-conductive substrate to render it receptive to subsequent electroplating operations which comprises the steps of contacting a substrate with a dilute aqueous conditioning solution containing controlled effective amounts of copper ions, acid and a bath soluble polyether compound for a period of time to effect an immersion deposit of copper on the substate and reduce the resistivity thereof, and thereafter electrolytically depositing on the conditioned substrate a copper strike employing an aqueous acidic electrolyte containing copper ions, acid and a bath soluble polyether compound present in amounts effective to deposit a uniform, adherent and conductive copper strike on the substrate.
Claim 2
Dependent Claim
106 words
A process for pretreating a substantially non-conductive substrate to render it receptive to subsequent electroplating operations which comprises the steps of contacting a substrate with a dilute aqueous conditioning solution containing controlled effective amounts of copper ions, acid and a bath soluble polyether compound for a period of time to effect an immersion deposit of copper on the substate and reduce the resistivity thereof, and thereafter electrolytically depositing on the conditioned substrate a copper strike employing an aqueous acidic electrolyte containing copper ions, acid and a bath soluble polyether compound present in amounts effective to deposit a uniform, adherent and conductive copper strike on the substrate.
Claim 3
Dependent Claim
29 words
The process as defined in claim 1 in which said substrate comprises a plateable plastic comprising a polymer containing a conductive filler in at least the surface stratum thereof.
Claim 4
Dependent Claim
28 words
The process as defined in claim 1 in which said substrate comprises a plastic having an electroless metal deposit on at least a portion of the surface thereof.
Claim 5
Dependent Claim
37 words
The process as defined in claim 1 in which said conditioning solution contains about 0.05 to about 5 g/l copper ions, about 0.5 to about 40 g/l acid and about 0.01 to about 10 g/l polyether compound.
Claim 6
Dependent Claim
37 words
The process as defined in claim 1 in which said conditioning solution contains about 0.25 to about 2 g/l copper ions, about 2 to about 25 g/l acid and about 0.05 to about 5 g/l polyether compound.
Claim 7
Dependent Claim
24 words
The process as defined in claim 1 in which the conditioning solution is controlled at a temperature of about 60° to about 150° F.
Claim 8
Dependent Claim
24 words
The process as defined in claim 1 in which the conditioning solution is controlled at a temperature of about 70° to about 120° F.
Claim 9
Dependent Claim
29 words
The process as defined in claim 2 in which the step of contacting the substrate with said conditioning solution is performed for a period up to about 5 minutes.
Claim 10
Dependent Claim
42 words
The process as defined in claim 3 in which the step of contacting the substrate with said conditioning solution is performed for a period of about 15 seconds up to a period before adverse chemical attack of the electroless metal deposit occurs.
Claim 11
Dependent Claim
32 words
The process as defined in claim 1 in which the step of contacting the substrate with said conditioning solution is performed for a period of about 30 seconds to about 2 minutes.
Claim 12
Dependent Claim
31 words
The process as defined in claim 1 in which the step of electrolytically depositing copper on the conditioned substrate is performed directly following the conditioning step without an intervening rinse treatment.
Claim 13
Dependent Claim
36 words
The process as defined in claim 1 in which said electrolyte contains about 15 to about 45 g/l copper ions, about 45 to about 225 g/l acid, and about 0.01 to about 10 g/l polyether compound.
Claim 14
Dependent Claim
36 words
The process as defined in claim 1 in which said electrolyte contains about 25 to about 35 g/l copper ions, about 150 to about 190 g/l acid, and about 0.05 to about 5 g/l polyether compound.
Claim 15
Dependent Claim
23 words
The process as defined in claim 1 in which said electrolyte is controlled at a temperature of about 60° to about 120° F.
Claim 16
Dependent Claim
31 words
The process as defined in claim 1 in which the step of electrolytically depositing the copper strike is performed at an average current density of about 6 to about 20 ASF.
Claim 17
Dependent Claim
34 words
The process as defined in claim 1 in which the step of electrolytically depositing the copper strike is performed for a period of time to deposit a copper strike up to about 0.0001 inch.
Claim 18
Dependent Claim
53 words
The process as defined in claim 1 in which the copper ions are introduced into said conditioning solution and said electrolyte by a bath soluble salt selected from the group consisting of copper sulfate, copper fluoroborate, copper acetate, copper nitrate, the alkali metal and ammonium acid salts thereof as well as mixtures thereof.
Claim 19
Dependent Claim
36 words
The process as defined in claim 1 in which said acid in said conditioning solution and said electrolyte is selected from the group consisting of sulfuric acid, fluoroboric acid, acetic acid, nitric acid and mixtures thereof.
Claim 20
Dependent Claim
67 words
The process as defined in claim 1 in which said conditioning solution contains copper sulfate to provide copper ions in an amount of about 0.05 to about 5 g/l, sulfuric acid in an amount of about 0.5 to about 40 g/l and a bath soluble polyethylene oxide compound of an average molecular weight of about 4,000 present in an amount of about 0.01 to about 10 g/l.
Claim 21
Dependent Claim
53 words
The process as defined in claim 1 in which said electrolyte contains copper sulfate in an amount to provide about 15 to about 45 g/l copper ions, about 45 to about 225 g/l sulfuric acid, about 0.01 to about 10 g/l of said polyether compound, and up to about 0.5 g/l halide ions.