US4374193A
Expired / Lapsed
US
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Photosensitive material and process for developing the same
Assignee: Kimoto Co Ltd
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Filing: 1981-04-29
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Granted: 1983-02-15
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Expires: 2001-04-29
Abstract
Abstract A positive-working photosensitive material and a process for developing the same are disclosed. The positive-working photosensitive material is obtained by forming on a base material a layer of a photosensitive composition containing (A), 100 weight parts of a resin binder including a vinylic polymer compound having phenolic hydroxyl groups and (B), 3-30 weight parts of an aromatic diazonium salt having only a single diazo group. The positive-working photosensitive material is developed by using an aqueous alkali solution.
Inventors
- 👤 Takeo Moriya
- 👤 Toshio Yamagata
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 23:16
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/54; G03C; G03C1/00; G03C1/52; G03C1/58; G03C1/60; G03F7/00; G03F7/004; G03F7/016; G03F7/021; G03F7/0212; G03F7/0215
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
94 words
A positive-working photosensitive material comprising: (1) a base material and (2) a layer of photosensitive composition formed on said base material and comprising (A), 100 weight parts of a resin binder containing at least 50 weight % of a vinylic polymer compound having an average polymerization degree of 300-2600 and represented by the general formula: ##STR6## wherein R represents hydrogen, hydroxyl, carboxyl, alkyl, alkoxyl, aryl, nitro, amino or halogen; and having a copolymerization ratio of x:y:z of 5-50:5-85:10-60 and (B), 3-30 weight parts of an aromatic diazonium salt having only a single diazo group.
Claim 2
Dependent Claim
94 words
A positive-working photosensitive material comprising: (1) a base material and (2) a layer of photosensitive composition formed on said base material and comprising (A), 100 weight parts of a resin binder containing at least 50 weight % of a vinylic polymer compound having an average polymerization degree of 300-2600 and represented by the general formula: ##STR6## wherein R represents hydrogen, hydroxyl, carboxyl, alkyl, alkoxyl, aryl, nitro, amino or halogen; and having a copolymerization ratio of x:y:z of 5-50:5-85:10-60 and (B), 3-30 weight parts of an aromatic diazonium salt having only a single diazo group.
Claim 3
Dependent Claim
21 words
A positive-working photosensitive material according to claim 1, wherein the copolymerization ratio of x:y:z in the vinylic polymer compound is 10-45:7-70:20-25.
Claim 4
Dependent Claim
27 words
A positive-working photosensitive material according to claim 1 or 2, wherein the base material is a sheet material of a thermoplastic or thermosetting polymer, metal or glass.
Claim 5
Dependent Claim
135 words
A process for developing a positive-working photosensitive material comprising: providing a base material; forming on said base material a layer of a photosensitive composition comprising (A), 100 weight parts of a resin binder containing at least 50 weight % of a vinylic polymer compound having an average polymerization degree of 300-2600 and represented by the general formula: ##STR7## wherein R represents hydrogen, hydroxyl, carboxyl, alkyl, alkoxyl, aryl, nitro, amino or halogen; and having a copolymerization ratio of x:y:z of 5-50:5-85:10-60 and (B), 3-30 weight parts of an aromatic diazonium salt having only a single diazo group; bringing said positive-working photosensitive material into intimate contact with a positive manuscript; exposing said positive-working photosensitive material to radiation through said manuscript; and developing said exposed material by contact with an alkali developer to obtain a positive relief image.
Claim 6
Dependent Claim
135 words
A process for developing a positive-working photosensitive material comprising: providing a base material; forming on said base material a layer of a photosensitive composition comprising (A), 100 weight parts of a resin binder containing at least 50 weight % of a vinylic polymer compound having an average polymerization degree of 300-2600 and represented by the general formula: ##STR7## wherein R represents hydrogen, hydroxyl, carboxyl, alkyl, alkoxyl, aryl, nitro, amino or halogen; and having a copolymerization ratio of x:y:z of 5-50:5-85:10-60 and (B), 3-30 weight parts of an aromatic diazonium salt having only a single diazo group; bringing said positive-working photosensitive material into intimate contact with a positive manuscript; exposing said positive-working photosensitive material to radiation through said manuscript; and developing said exposed material by contact with an alkali developer to obtain a positive relief image.
Claim 7
Dependent Claim
24 words
A process for developing a photosensitive material according to claim 4, wherein the copolymerization ratio of x:y:z in the vinylic polymer compound is 10-45:7-70:20-55.
Claim 8
Dependent Claim
21 words
A process for developing a photosensitive material according to claim 4, wherein an aqueous alkali solution has a pH of 12.0-12.8.
Claim 9
Dependent Claim
37 words
A process for developing a photosensitive material according to claim 4 or 5, wherein a coupler which reacts with the water soluble diazonium salt (B) to form an azo dye is dissolved in an aqueous alkali solution.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1986-02-14 | 1986-08-16 | 1987-02-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1990-02-14 | 1990-08-16 | 1991-02-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1994-02-14 | 1994-08-16 | 1995-02-15 | $7700.00 | Window Closed / Lapsed |