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US4374193A Expired / Lapsed US ⏱️ 0.0 years remaining

Photosensitive material and process for developing the same

Assignee: Kimoto Co Ltd
•
Filing: 1981-04-29
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Granted: 1983-02-15
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Expires: 2001-04-29
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Abstract

Abstract A positive-working photosensitive material and a process for developing the same are disclosed. The positive-working photosensitive material is obtained by forming on a base material a layer of a photosensitive composition containing (A), 100 weight parts of a resin binder including a vinylic polymer compound having phenolic hydroxyl groups and (B), 3-30 weight parts of an aromatic diazonium salt having only a single diazo group. The positive-working photosensitive material is developed by using an aqueous alkali solution.

Inventors

  • 👤 Takeo Moriya
  • 👤 Toshio Yamagata

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 23:16
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/54; G03C; G03C1/00; G03C1/52; G03C1/58; G03C1/60; G03F7/00; G03F7/004; G03F7/016; G03F7/021; G03F7/0212; G03F7/0215

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 94 words
A positive-working photosensitive material comprising: (1) a base material and (2) a layer of photosensitive composition formed on said base material and comprising (A), 100 weight parts of a resin binder containing at least 50 weight % of a vinylic polymer compound having an average polymerization degree of 300-2600 and represented by the general formula: ##STR6## wherein R represents hydrogen, hydroxyl, carboxyl, alkyl, alkoxyl, aryl, nitro, amino or halogen; and having a copolymerization ratio of x:y:z of 5-50:5-85:10-60 and (B), 3-30 weight parts of an aromatic diazonium salt having only a single diazo group.
Claim 2
Dependent Claim 94 words
A positive-working photosensitive material comprising: (1) a base material and (2) a layer of photosensitive composition formed on said base material and comprising (A), 100 weight parts of a resin binder containing at least 50 weight % of a vinylic polymer compound having an average polymerization degree of 300-2600 and represented by the general formula: ##STR6## wherein R represents hydrogen, hydroxyl, carboxyl, alkyl, alkoxyl, aryl, nitro, amino or halogen; and having a copolymerization ratio of x:y:z of 5-50:5-85:10-60 and (B), 3-30 weight parts of an aromatic diazonium salt having only a single diazo group.
Claim 3
Dependent Claim 21 words
A positive-working photosensitive material according to claim 1, wherein the copolymerization ratio of x:y:z in the vinylic polymer compound is 10-45:7-70:20-25.
Claim 4
Dependent Claim 27 words
A positive-working photosensitive material according to claim 1 or 2, wherein the base material is a sheet material of a thermoplastic or thermosetting polymer, metal or glass.
Claim 5
Dependent Claim 135 words
A process for developing a positive-working photosensitive material comprising: providing a base material; forming on said base material a layer of a photosensitive composition comprising (A), 100 weight parts of a resin binder containing at least 50 weight % of a vinylic polymer compound having an average polymerization degree of 300-2600 and represented by the general formula: ##STR7## wherein R represents hydrogen, hydroxyl, carboxyl, alkyl, alkoxyl, aryl, nitro, amino or halogen; and having a copolymerization ratio of x:y:z of 5-50:5-85:10-60 and (B), 3-30 weight parts of an aromatic diazonium salt having only a single diazo group; bringing said positive-working photosensitive material into intimate contact with a positive manuscript; exposing said positive-working photosensitive material to radiation through said manuscript; and developing said exposed material by contact with an alkali developer to obtain a positive relief image.
Claim 6
Dependent Claim 135 words
A process for developing a positive-working photosensitive material comprising: providing a base material; forming on said base material a layer of a photosensitive composition comprising (A), 100 weight parts of a resin binder containing at least 50 weight % of a vinylic polymer compound having an average polymerization degree of 300-2600 and represented by the general formula: ##STR7## wherein R represents hydrogen, hydroxyl, carboxyl, alkyl, alkoxyl, aryl, nitro, amino or halogen; and having a copolymerization ratio of x:y:z of 5-50:5-85:10-60 and (B), 3-30 weight parts of an aromatic diazonium salt having only a single diazo group; bringing said positive-working photosensitive material into intimate contact with a positive manuscript; exposing said positive-working photosensitive material to radiation through said manuscript; and developing said exposed material by contact with an alkali developer to obtain a positive relief image.
Claim 7
Dependent Claim 24 words
A process for developing a photosensitive material according to claim 4, wherein the copolymerization ratio of x:y:z in the vinylic polymer compound is 10-45:7-70:20-55.
Claim 8
Dependent Claim 21 words
A process for developing a photosensitive material according to claim 4, wherein an aqueous alkali solution has a pH of 12.0-12.8.
Claim 9
Dependent Claim 37 words
A process for developing a photosensitive material according to claim 4 or 5, wherein a coupler which reacts with the water soluble diazonium salt (B) to form an azo dye is dissolved in an aqueous alkali solution.

References Cited (Backward Citations)

US2405523A Cited
US2551133A Cited
US2937085A Cited
US3544317A Cited
US3778270A Cited
US4193797A Cited
US4193797B1 Cited
US3847614A Cited
US4296193A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1986-02-14 1986-08-16 1987-02-15 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1990-02-14 1990-08-16 1991-02-15 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1994-02-14 1994-08-16 1995-02-15 $7700.00 Window Closed / Lapsed

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