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US4370054A Expired / Lapsed US ⏱️ 0.0 years remaining

Projection exposure apparatus

Assignee: Canon Inc
•
Filing: 1981-05-04
•
Granted: 1983-01-25
•
Expires: 2001-05-04
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Abstract

Abstract A projection exposure apparatus in which a mask and a wafer are displaced in a plane perpendicular to the optical axis of the projection optical system to form circuit patterns on the entire surface of the wafer. The mask and wafer are displaced along guides having two guide rails between which are provided means for compensating for non-linearity of one of the guide rails.

Inventors

  • 👤 Junji Isohata
  • 👤 Hironori Yamamoto

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 23:46
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70358

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 115 words
A projection exposure apparatus, comprising: a mask support member for supporting a mask; a wafer support member for supporting a wafer; a projection optical system for projecting the image of said mask onto a part of said wafer; guide means for displacing at least one of said mask and said wafer relative to said projection optical system in a plane perpendicular to the optical axis thereof, said guide means comprising first and second generally linear guide members and first and second guided members respectively engaging with said first and said second guide members; and compensating means provided between said first and said second guide members for compensating for non-linearity of one of said guide members.
Claim 2
Dependent Claim 115 words
A projection exposure apparatus, comprising: a mask support member for supporting a mask; a wafer support member for supporting a wafer; a projection optical system for projecting the image of said mask onto a part of said wafer; guide means for displacing at least one of said mask and said wafer relative to said projection optical system in a plane perpendicular to the optical axis thereof, said guide means comprising first and second generally linear guide members and first and second guided members respectively engaging with said first and said second guide members; and compensating means provided between said first and said second guide members for compensating for non-linearity of one of said guide members.
Claim 3
Dependent Claim 32 words
A projection exposure apparatus according to claim 1, comprising floating means between at least one of said first and said second linear guide members and said corresponding first and second guided member.
Claim 4
Dependent Claim 47 words
A projection exposure apparatus according to claim 1, comprising floating means respectively between said first and said second linear guide members and said corresponding first and second guided members, one of said floating means being provided with a higher rigidity than the other of said floating means.
Claim 5
Dependent Claim 58 words
A projection exposure apparatus according to claim 3, wherein one of said floating means comprises a fluid bearing defined in all directions in one plane perpendicular to movement of said guided members and the other of said floating means comprises a fluid bearing defined in the vertical direction in one plane perpendicular to movement of said guided members.
Claim 6
Dependent Claim 15 words
A projection exposure apparatus according to claim 1, wherein said compensating means comprises buffer means.
Claim 7
Dependent Claim 15 words
A projection exposure apparatus according to claim 5, wherein said buffer means comprises a bearing.

References Cited (Backward Citations)

US3563648A Cited
US3722996A Cited
US3927939A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1986-01-24 1986-07-26 1987-01-25 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1990-01-24 1990-07-26 1991-01-25 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1994-01-24 1994-07-26 1995-01-25 $7700.00 Window Closed / Lapsed

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