← Back to Patent Explorer
US4367281A Expired / Lapsed US ⏱️ 0.0 years remaining

Fine fabrication process using radiation sensitive resist

Assignee: Tosoh Corp
•
Filing: 1981-08-03
•
Granted: 1983-01-04
•
Expires: 2001-08-03
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A fine work process comprises forming a thin film made of a radiation sensitive polymer on a board; irradiating radiation; developing and etching the product. The radiation sensitive polymer comprises at least 10 wt. % of a polymer having repeat units: ##STR1## wherein R and R' respectively represent hydrogen atom or an alkyl group and n is an integer of number of substituent groups.

Inventors

  • 👤 Kimio Shibayama
  • 👤 Kingo Itaya
  • 👤 Teruo Fujimoto

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 20:01
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/038

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 72 words
In a fine fabrication process comprising forming a thin film made of a radiation sensitive polymer on a substrate; imagewise exposing to radiation; developing and etching the product, an improvement characterized in that said radiation sensitive polymer comprises at least 10 wt. % of a polymer having repeat units: ##STR3## wherein R and R' respectively represent hydrogen atom or an alkyl group and n is an integer of number of substituent groups.
Claim 2
Dependent Claim 72 words
In a fine fabrication process comprising forming a thin film made of a radiation sensitive polymer on a substrate; imagewise exposing to radiation; developing and etching the product, an improvement characterized in that said radiation sensitive polymer comprises at least 10 wt. % of a polymer having repeat units: ##STR3## wherein R and R' respectively represent hydrogen atom or an alkyl group and n is an integer of number of substituent groups.
Claim 3
Dependent Claim 18 words
The fine work process according to claim 1 wherein said radiation sensitive polymer is a polymer of 4-vinylbenzyldimethylamine.
Claim 4
Dependent Claim 27 words
The fine work process according to claim 1 wherein said radiation sensitive polymer is obtained by reacting a polystyrene with a chloromethylating agent followed by reacting dimethylamine.

References Cited (Backward Citations)

US3890147A Cited
US4065414A Cited
US4208211A Cited
US4286049A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1986-01-03 1986-07-05 1987-01-04 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1990-01-03 1990-07-05 1991-01-04 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1994-01-03 1994-07-05 1995-01-04 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag