US4361441A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Treatment of matter in low temperature plasmas
Assignee: Refranco Corp
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Filing: 1980-04-07
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Granted: 1982-11-30
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Expires: 2000-04-07
Abstract
Abstract A plasma reactor, in which particulate matter is caused to interact with low temperature plasma (i.e. below 100,000 K.) comprises spaced stationary electrode structures 2, 11 of which at least one is annular, between which an arc or arcs 7 is established by a power supply which may include a thyristor (SCR) 9. The arc is pulsated and caused to orbit or circulate round the or each annular electrode structure to form a conical plasma zone between the electrodes, while particulate solids are introduced through inlets 5 to enter the plasma zone and interact with the plasma therein. Extended dwell periods and highly effective interaction are brought about by circulation and pulsation of the arc and a high particle population density. The arc can be circulated at high speed by electrical means, for example by sequential energization of plasma torches 1 in an annular array or of the segments 8 of a segmental anode, or by electromagnetic circulation of the arc attachment round an annular cathode or round a segmental anode with the help of coils 10 fitted between the segments. Examples of reactions that can be efficiently conducted by this method include the reduction of metal ores, beneficiation of low grade chromite ores, recovery of energy values from low grade carbonaceous matter such as colliery wastes and the formation of pozzolanic material and cements from siliceous minerals.
Inventors
- 👤 Jozef K. Tylko
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 03:31
CPC Classifications
H; H05; H05H; H05H1/00; H05H1/24; H05H1/26; H05H1/32; H05H1/42; C; C22; C22B; C22B4/00; C22B4/005; H05H1/44; B; B01; B01J; B01J2219/00; B01J2219/08; B01J2219/0894; Y; Y02; Y02E; Y02E30/00; Y02E30/10
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
91 words
Apparatus for treating particulate matter with low temperature plasma, comprising: a pair of stationary electrode structures at least one of which is generally annular, said electrodes being spaced apart to provide a reaction zone; means for introducing particulate matter into the reaction zone; power supply means applying a pulsating potential difference having a frequency of at least 50 Hz between the electrode structures for establishing and maintaining a discharge therebetween; and means for causing circulation of the disposition of the discharge around the peripheries of the or each annular electrode structure.
Claim 2
Dependent Claim
91 words
Apparatus for treating particulate matter with low temperature plasma, comprising: a pair of stationary electrode structures at least one of which is generally annular, said electrodes being spaced apart to provide a reaction zone; means for introducing particulate matter into the reaction zone; power supply means applying a pulsating potential difference having a frequency of at least 50 Hz between the electrode structures for establishing and maintaining a discharge therebetween; and means for causing circulation of the disposition of the discharge around the peripheries of the or each annular electrode structure.
Claim 3
Dependent Claim
31 words
The apparatus of claim 1 wherein the power supply means is adapted to supply substantially direct current fluctuating at a frequency in the range 50 cycles per sec. to 1 kHz.
Claim 4
Dependent Claim
26 words
The apparatus of claim 1 comprising a single hollow annular cathode, and a coil associated therewith for causing circulation of the attachment point of said arc.
Claim 5
Dependent Claim
15 words
The apparatus of claim 3 wherein the coil is disposed within the annular cathode structure.
Claim 6
Dependent Claim
39 words
The apparatus of claim 1 wherein the cathode structure comprises a plurality of separate cathodes spaced round the periphery of the cathode structure and the disposition changing means includes means for controllably varying the energization of the respective cathodes.
Claim 7
Dependent Claim
23 words
The apparatus of claim 1 wherein the anode structure comprises spaced segments in an annular array, which are connected for individual controlled energization.
Claim 8
Dependent Claim
18 words
The apparatus of claim 6 wherein the segments are each connected to respective thyristors which are activated sequentially.
Claim 9
Dependent Claim
28 words
The apparatus of claim 6 wherein electromagnet coils are provided between the anode segments and are connected in pairs to respective phases of a variable frequency polyphase generator.
Claim 10
Dependent Claim
19 words
The apparatus of claim 1 wherein the anode is provided in or constituted by the bottom of the reactor.
Claim 11
Dependent Claim
31 words
The apparatus of claim 1 wherein the particle introducing means includes means for electrically charging the particles and for feeding the charged particles to the vicinity of the cathode or cathodes.
Claim 12
Dependent Claim
20 words
The apparatus of claim 1 including means for introducing further material for reaction downstream from one or both electrode structures.
Claim 13
Dependent Claim
43 words
The apparatus of claim 1 wherein means are provided for further treatment of particulate matter after passage through the reaction zone, said means comprising at least one of: quenching means, means for collecting the reaction products, and means for withdrawing the reaction products.
Claim 14
Dependent Claim
60 words
The apparatus of claim 1 in combination with a second such apparatus, and including means interconnecting the first and second apparatus for transferring effluent gas from the first apparatus to the second downstream of the anode of the second apparatus and for transferring effluent gas from the second apparatus to the first upstream of the anode of the first apparatus.
Claim 15
Dependent Claim
97 words
In apparatus for treating particulate matter with low temperature plasma of the type having spaced electrode structures providing a reaction zone therebetween and means for maintaining expanded plasma within said reaction zone, the improvement wherein said electrode structures comprise stationary structures at least one of which is annular, said expanded plasma maintaining means comprising means applying a discharge establishing and maintaining potential difference between said electrode structures while causing a circulation of the disposition of the discharge around the peripheries of each annular electrode while said potential difference pulsates at a frequency of at least 50 Hz.
Claim 16
Dependent Claim
97 words
In apparatus for treating particulate matter with low temperature plasma of the type having spaced electrode structures providing a reaction zone therebetween and means for maintaining expanded plasma within said reaction zone, the improvement wherein said electrode structures comprise stationary structures at least one of which is annular, said expanded plasma maintaining means comprising means applying a discharge establishing and maintaining potential difference between said electrode structures while causing a circulation of the disposition of the discharge around the peripheries of each annular electrode while said potential difference pulsates at a frequency of at least 50 Hz.
Claim 17
Dependent Claim
54 words
In apparatus for treating particulate matter with low temperature plasma of the type having spaced electrode structures providing a reaction zone therebetween and means for maintaining expanded plasma within said reaction zone, the improvement wherein said electrode structures comprises stationary structures, said expanded plasma maintaining means comprising means for introducing discontinuities in said plasma.
Claim 18
Dependent Claim
54 words
In apparatus for treating particulate matter with low temperature plasma of the type having spaced electrode structures providing a reaction zone therebetween and means for maintaining expanded plasma within said reaction zone, the improvement wherein said electrode structures comprises stationary structures, said expanded plasma maintaining means comprising means for introducing discontinuities in said plasma.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-11-29 | 1986-05-31 | 1986-11-30 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-11-29 | 1990-05-31 | 1990-11-30 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-11-29 | 1994-05-31 | 1994-11-30 | $7700.00 | Window Closed / Lapsed |