Cryogenic pump with radiation shield

Claim 2

In a cryogenic pump for removing gaseous species from a chamber: a first stage having an inlet opening at one end thereof for gaseous communication with the chamber and a generally cylindrical pumping surface maintained at a first temperature for removing a portion of the gaseous species, a second stage positioned coaxially within the first stage and having a pumping surface maintained at a temperature lower than the first temperature for removing an additional portion of the gaseous species, and a plurality of baffle members spaced axially apart between the first and second stages for shielding the pumping surface of the second stage from direct exposure to the inlet opening while permitting substantially unimpeded flow of the gaseous species from the inlet opening to the second stage.

Claim 3

The cryogenic pump of claim 1 wherein the pumping surface of the first stage is blackened to prevent reflection of thermal energy from the inlet opening to the pumping surface of the second stage.

Claim 4

The cryogenic pump of claim 1 wherein the baffle members include a first baffle member having a generally planar portion positioned axially between the inlet opening and the second stage and a frustroconcial portion extending outwardly from the generally planar portion and away from the inlet opening, and a second baffle positioned radially adjacent the second stage and having a frustroconical wall of larger diameter than the frustroconical portion of the first baffle member.

Claim 5

The cryogenic pump of claim 1 wherein the baffle members include radially extending annular plates.

Claim 6

The cryogenic pump of claim 1 wherein the first stage comprises a ring adjacent the inlet opening, a support plate at the end of the stage opposite the inlet opening, and a plurality of individual leaves extending between the ring and plate to form the generally cylindrical pumping surface.

Claim 7

The cryogenic pump of claim 5 wherein the leaves are formed to provide a radial bulge for increased gas flow in the vicinity of the second stage.

Claim 8

The cryogenic pump of claim 1 wherein the baffle members are maintained at substantially the temperature of the first stage.

Claim 9

In a cryogenic pump for removing gaseous species from a chamber: means forming an inlet opening for gaseous communication with the chamber, a first stage extending axially from the inlet opening and having a pumping surface maintained at a first temperature for removing a portion of the gaseous species, a second stage having a pumping surface maintained at a temperature lower than the first temperature for removing an additional portion of the gaseous species, and a baffle member having a frustroconical portion extending outwardly and away from the inlet opening for shielding the pumping surface of the second stage from direct exposure to the inlet opening while permitting substantially unimpeded flow of the gaseous species from the inlet opening to the second stage.

Claim 10

In a cryogenic pump for removing gaseous species from a chamber: means forming an inlet opening for gaseous communication with the chamber, a first stage extending axially from the inlet opening and having a pumping surface maintained at a first temperature for removing a portion of the gaseous species, a second stage having a pumping surface maintained at a temperature lower than the first temperature for removing an additional portion of the gaseous species, and a baffle member having a frustroconical portion extending outwardly and away from the inlet opening for shielding the pumping surface of the second stage from direct exposure to the inlet opening while permitting substantially unimpeded flow of the gaseous species from the inlet opening to the second stage.

Claim 11

In a cryogenic pump for removing gaseous species from a chamber: a first stage having an inlet opening at one end thereof for gaseous commumication with the chamber and a generally cylindrical pumping surface maintained at a first temperature for removing a portion of the gaseous species, a second stage positioned coaxially within the first stage and having a pumping surface maintained at a temperature lower than the first temperature for removing an additional portion of the gaseous species, the pumping surface of the first stage being blackened to prevent reflection of thermal energy from the inlet opening to the pumping surface of the second stage, a first baffle having a first portion positioned axially between the inlet opening and the second stage and a frustroconical portion extending outwardly from the first portion and away from the inlet opening, and a second baffle member of frustroconical shape positioned radially adjacent the second stage and having a greater diameter than the frustroconical portion of the first baffle member, said baffle members being maintained at substantially the temperature of the first stage and shielding the pumping surface of the second stage from direct exposure to the inlet opening while permitting substantially unimpeded flow of the gaseous species from the inlet opening to the second stage.

Claim 12

In a cryogenic pump for removing gaseous species from a chamber: a first stage having an inlet opening at one end thereof for gaseous commumication with the chamber and a generally cylindrical pumping surface maintained at a first temperature for removing a portion of the gaseous species, a second stage positioned coaxially within the first stage and having a pumping surface maintained at a temperature lower than the first temperature for removing an additional portion of the gaseous species, the pumping surface of the first stage being blackened to prevent reflection of thermal energy from the inlet opening to the pumping surface of the second stage, a first baffle having a first portion positioned axially between the inlet opening and the second stage and a frustroconical portion extending outwardly from the first portion and away from the inlet opening, and a second baffle member of frustroconical shape positioned radially adjacent the second stage and having a greater diameter than the frustroconical portion of the first baffle member, said baffle members being maintained at substantially the temperature of the first stage and shielding the pumping surface of the second stage from direct exposure to the inlet opening while permitting substantially unimpeded flow of the gaseous species from the inlet opening to the second stage.

Claim 13

In a cryogenic pump for removing gaseous species from a chamber: a first stage having an inlet opening at one end thereof for gaseous communication with the chamber and a generally cylindrical pumping surface maintained at a first temperature for removing a portion of the gaseous species, a second stage positioned coaxially within the first stage and having a pumping surface maintained at a temperature lower than the first temperature for removing an additional portion of the gaseous species, and a plurality of baffle members, said baffle members being spaced axially apart, said baffle members increasing in radial extent away from the inlet opening, and said baffle members being positioned between the first and second stages for shielding the pumping surface of the second stage from direct exposure to the inlet opening while permitting substantially unimpeded flow of the gaseous species from the inlet opening to the second stage.

Claim 14

In a cryogenic pump for removing gaseous species from a chamber: a first stage having an inlet opening at one end thereof for gaseous communication with the chamber and a generally cylindrical pumping surface maintained at a first temperature for removing a portion of the gaseous species, a second stage positioned coaxially within the first stage and having a pumping surface maintained at a temperature lower than the first temperature for removing an additional portion of the gaseous species, and a plurality of baffle members, said baffle members being spaced axially apart, said baffle members increasing in radial extent away from the inlet opening, and said baffle members being positioned between the first and second stages for shielding the pumping surface of the second stage from direct exposure to the inlet opening while permitting substantially unimpeded flow of the gaseous species from the inlet opening to the second stage.