Conditioning of polyamides for electroless plating

Claim 2

In a process for preparing the surface of a polyamide substrate for electroless plating which includes the step of etching the polyamide substrate with an aqueous acid etch solution comprising at least one organic acid containing from 2 to about 10 carbon atoms in the molecule and present in the aqueous solution in a concentration of at least about 3 percent by weight of the solution and sufficient to render the polyamide substrate directly receptive to an electroless plating catalyst and depositing a metal electroless plating catalyst on the surface of the etched polyamide substrate, the improvement which comprises including in the aqueous acid etch solution from about 1 to about 10 percent by weight of solution of at least one inorganic acid which is nondeleteriously reactive with respect to said organic acid.

Claim 3

A process as claimed in claim 1 in which the inorganic acid is present in a concentration of from about 1 to about 5 percent by weight of the aqueous acid etch solution.

Claim 4

A process as claimed in claim 1 in which the inorganic acid is a mineral acid selected from the group consisting of sulfuric acid, nitric acid, hydrochloric acid and mixtures thereof.

Claim 5

A process as claimed in claim 1 in which the polyamide is a filled polyamide.

Claim 6

A process for preparing the surface of polyamide substrates for electroless plating which comprises: (a) forming a conditioned polyamide substrate for etching by contacting the polyamide substrate with an aqueous alkaline conditioning solution having a pH of at least about 10 and maintained at a temperature of from about 150° F. to the lesser of the boiling point of the solution and the softening temperature of the polyamide substrate for a time sufficient to render the substrate receptive to etch by an organic acid; and (b) etching the conditioned polyamide substrate by contacting the conditioned polyamide substrate with an aqueous acid etch solution comprising at least one water-soluble organic acid containing from 2 to about 10 carbon atoms in the molecule and present in the aqueous solution in a concentration of at least about 3 percent by weight of the solution and from about 1 to about 10 percent by weight of an acid which is at least one inorganic acid which is nondeleteriously reactive with said inorganic acid and in which the acid concentration is sufficient to render the conditioned polyamide substrate substantially uniformly and directly receptive to a metal electroless plating catalyst.

Claim 7

A process for preparing the surface of polyamide substrates for electroless plating which comprises: (a) forming a conditioned polyamide substrate for etching by contacting the polyamide substrate with an aqueous alkaline conditioning solution having a pH of at least about 10 and maintained at a temperature of from about 150° F. to the lesser of the boiling point of the solution and the softening temperature of the polyamide substrate for a time sufficient to render the substrate receptive to etch by an organic acid; and (b) etching the conditioned polyamide substrate by contacting the conditioned polyamide substrate with an aqueous acid etch solution comprising at least one water-soluble organic acid containing from 2 to about 10 carbon atoms in the molecule and present in the aqueous solution in a concentration of at least about 3 percent by weight of the solution and from about 1 to about 10 percent by weight of an acid which is at least one inorganic acid which is nondeleteriously reactive with said inorganic acid and in which the acid concentration is sufficient to render the conditioned polyamide substrate substantially uniformly and directly receptive to a metal electroless plating catalyst.

Claim 8

A process as claimed in claim 5 in which the concentration of the inorganic acid is from about 1 to about 5 percent by weight of solution.

Claim 9

A process as claimed in claim 5 in which the inorganic acid is a mineral acid selected from the group consisting of sulfuric acid, nitric acid, hydrochloric acid and mixtures thereof.

Claim 10

A process as claimed in claim 5 in which the polyamide is a filled polyamide.

Claim 11

A process for preparing the surface of polyamide substrates for electroless plating which comprises: (a) forming a conditioned polyamide substrate for etching by contacting the polyamide substrate with an aqueous alkaline conditioning solution of at least one alkali metal hydroxide in which the alkali metal hydroxide concentration of the aqueous alkaline conditioning solution is from about 2 percent by weight of the solution to solution saturation and maintained at a temperature of from about 150° F. to the lesser of the boiling point of the solution and the softening temperature of the polyamide surface for a time sufficient to render the polyamide substrate receptive to etch by an acetic acid compound; and (b) etching the conditioned polyamide substrate by contacting the conditioned polyamide substrate with an aqueous acid etch solution comprising at least one acetic acid compound having the formula: ##STR3## wherein each X is independently selected from the group consisting of hydrogen, hydroxyl and halogen and from about 1 to about 10 percent by weight of an acid which is at least one inorganic acid which is nondeleteriously reactive with said acetic acid compound and in which the acid concentration is sufficient to render the conditioned polyamide substrate substantially uniformly and directly receptive to a metal electroless plating catalyst.

Claim 12

A process for preparing the surface of polyamide substrates for electroless plating which comprises: (a) forming a conditioned polyamide substrate for etching by contacting the polyamide substrate with an aqueous alkaline conditioning solution of at least one alkali metal hydroxide in which the alkali metal hydroxide concentration of the aqueous alkaline conditioning solution is from about 2 percent by weight of the solution to solution saturation and maintained at a temperature of from about 150° F. to the lesser of the boiling point of the solution and the softening temperature of the polyamide surface for a time sufficient to render the polyamide substrate receptive to etch by an acetic acid compound; and (b) etching the conditioned polyamide substrate by contacting the conditioned polyamide substrate with an aqueous acid etch solution comprising at least one acetic acid compound having the formula: ##STR3## wherein each X is independently selected from the group consisting of hydrogen, hydroxyl and halogen and from about 1 to about 10 percent by weight of an acid which is at least one inorganic acid which is nondeleteriously reactive with said acetic acid compound and in which the acid concentration is sufficient to render the conditioned polyamide substrate substantially uniformly and directly receptive to a metal electroless plating catalyst.

Claim 13

A process as claimed in claim 9 in which the inorganic acid is present in a concentration of from about 1 to about 5 percent by weight of solution.

Claim 14

A process as claimed in claim 9 in which the inorganic acid is a mineral acid selected from the group consisting of sulfuric acid, nitric acid, hydrochloric acid and mixtures thereof.

Claim 15

A process as claimed in claim 9 in which the polyamide is a filled polyamide.

Claim 16

A process as claimed in claim 9 in which the acetic acid compound is trichloroacetic acid.

Claim 17

A process as claimed in claim 9 in which the acetic acid compound is dichloroacetic acid.

Claim 18

A process as claimed in claim 9 in which the acetic acid compound is acetic acid.

Claim 19

A process for preparing the surface of polyamide substrates for electroless plating which comprises: (a) forming a conditioned polyamide substrate by contacting the polyamide substrate with an aqueous alkaline conditioning solution of at least one alkali metal hydroxide in which the total alkali metal hydroxide concentration is from about 10 percent by weight of the solution to solution saturation and maintained at a temperature of from about 150° F. to the lesser of the boiling point of the solution and the softening temperature of the polyamide surface for a period of time of from about 0.5 to about 20 minutes; and (b) forming an etched polyamide substrate by contacting the conditioned polyamide substrate with an aqeuous acid etch solution comprising from 1 to about 10 percent by weight of a mineral acid selected from the group consisting of hydrochloric acid, sulfuric acid, nitric acid and mixtures thereof, and at least one acetic acid compound selected from the group consisting of trichloroacetic acid, dichloroacetic acid and acetic acid in which the acid concentration is sufficient to render the conditioned polyamide substrate substantially uniformly and directly receptive to a metal electroless plating catalyst.

Claim 20

A process for preparing the surface of polyamide substrates for electroless plating which comprises: (a) forming a conditioned polyamide substrate by contacting the polyamide substrate with an aqueous alkaline conditioning solution of at least one alkali metal hydroxide in which the total alkali metal hydroxide concentration is from about 10 percent by weight of the solution to solution saturation and maintained at a temperature of from about 150° F. to the lesser of the boiling point of the solution and the softening temperature of the polyamide surface for a period of time of from about 0.5 to about 20 minutes; and (b) forming an etched polyamide substrate by contacting the conditioned polyamide substrate with an aqeuous acid etch solution comprising from 1 to about 10 percent by weight of a mineral acid selected from the group consisting of hydrochloric acid, sulfuric acid, nitric acid and mixtures thereof, and at least one acetic acid compound selected from the group consisting of trichloroacetic acid, dichloroacetic acid and acetic acid in which the acid concentration is sufficient to render the conditioned polyamide substrate substantially uniformly and directly receptive to a metal electroless plating catalyst.

Claim 21

A process as claimed in claim 16 in which the mineral acid concentration is from about 1 to about 5 percent by weight of solution.

Claim 22

A process as claimed in claim 16 in which the polyamide substrate is formed of a filled polyamide.

Claim 23

A process as claimed in claim 16 in which the total alkali metal hydroxide content of the aqueous alkaline conditioning solution is from 10 to about 50 percent by weight of the solution.

Claim 24

A process as claimed in claim 16 in which the aqueous alkaline conditioning solution is maintained at a temperature of from about 170° F. to about 200° F.

Claim 25

A process as claimed in claim 16 in which the total acetic acid compound concentration of the aqueous acid etch solution is from about 5 percent by weight of solution to solution saturation.

Claim 26

A process as claimed in claim 16 in which the total acetic acid compound concentration of the aqueous acid etch solution is from about 5 to about 60 percent by weight of the solution.

Claim 27

A process as claimed in claim 16 in which the polyamide substrate is contacted with the aqueous acid etch solution for a period of time of from about 10 seconds to about 15 minutes.

Claim 28

A process for preparing the surface of filled polyamide substrates for electroless plating which comprises: (a) forming a conditioned polyamide substrate by contacting the filled polyamide substrate with an aqueous alkaline conditioning solution of at least one alkali metal hydroxide in which the total alkali metal hydroxide concentration is from about 10 percent by weight of the solution to solution saturation and maintained at a temperature of from about 150° F. to the lesser of the boiling point of the solution and the softening temperature of the polyamide surface for a period of time of from about 10 seconds to about 20 minutes; and (b) forming an etched polyamide substrate by contacting the conditioned polyamide substrate with an aqueous etch solution comprising from about 1 to about 10 percent by weight of mineral acid selected from the group consisting of hydrochloric acid, sulfuric acid, nitric acid and mixtures thereof, and trichloroacetic acid present in concentration from about 5 percent by weight of solution to solution saturation, the total acid concentration being sufficient to render the conditioned filled polyamide substrate uniformly and directly receptive to a metal electroless plating catalyst.

Claim 29

A process for preparing the surface of filled polyamide substrates for electroless plating which comprises: (a) forming a conditioned polyamide substrate by contacting the filled polyamide substrate with an aqueous alkaline conditioning solution of at least one alkali metal hydroxide in which the total alkali metal hydroxide concentration is from about 10 percent by weight of the solution to solution saturation and maintained at a temperature of from about 150° F. to the lesser of the boiling point of the solution and the softening temperature of the polyamide surface for a period of time of from about 10 seconds to about 20 minutes; and (b) forming an etched polyamide substrate by contacting the conditioned polyamide substrate with an aqueous etch solution comprising from about 1 to about 10 percent by weight of mineral acid selected from the group consisting of hydrochloric acid, sulfuric acid, nitric acid and mixtures thereof, and trichloroacetic acid present in concentration from about 5 percent by weight of solution to solution saturation, the total acid concentration being sufficient to render the conditioned filled polyamide substrate uniformly and directly receptive to a metal electroless plating catalyst.

Claim 30

A process as claimed in claim 24 in which the mineral acid concentration is from about 1 to about 5 percent by weight of solution.

Claim 31

A process for preparing the surface of a caprolactam polymer substrate for electroless plating which comprises etching the caprolactam substrate with an aqueous organic acid etch solution comprising at least one organic acid compound containing 2 to 4 carbon atoms in the molecule and soluble in a concentration of at least about 3 percent by weight of solution in combination with from about 1 to about 10 percent by weight of solution of an inorganic acid, said acids present in a concentration sufficient to render the caprolactam substrate uniformly and directly receptive to a metal electroless plating catalyst and depositing a metal electroless plating catalyst on the surface of th etched caprolactam surface.

Claim 32

A process for preparing the surface of a caprolactam polymer substrate for electroless plating which comprises etching the caprolactam substrate with an aqueous organic acid etch solution comprising at least one organic acid compound containing 2 to 4 carbon atoms in the molecule and soluble in a concentration of at least about 3 percent by weight of solution in combination with from about 1 to about 10 percent by weight of solution of an inorganic acid, said acids present in a concentration sufficient to render the caprolactam substrate uniformly and directly receptive to a metal electroless plating catalyst and depositing a metal electroless plating catalyst on the surface of th etched caprolactam surface.

Claim 33

A process as claimed in claim 26 in which the inorganic acid concentration is from about 1 to about 5 percent by weight of solution and in which the organic acid compound concentration is from about 5 to about 60 percent by weight of solution.

Claim 34

A process as claimed in claim 26 in which the organic acid compound is at least one acetic acid compound having the formula: ##STR4## wherein each X is independently selected from the group consisting of hydrogen, hydroxyl and halogen.

Claim 35

A process as claimed in claim 26 in which the organic acid compound is trichloroacetic acid.

Claim 36

A process as claimed in claim 26 in which the inorganic acid is a mineral acid selected from the group consisting of hydrochloric acid, sulfuric acid, nitric acid and mixtures thereof.

Claim 37

A process as claimed in claim 27 in which the inorganic acid is a mineral acid selected from the group consisting of hydrochloric acid, sulfuric acid, nitric acid and mixtures thereof.

Claim 38

A process as claimed in claim 28 in which the inorganic acid is a mineral acid selected from the group consisting of hydrochloric acid, sulfuric acid, nitric acid and mixtures thereof.