US4328079A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for pumping impurities, especially noble gases, from hydrogen or mixtures of hydrogen and its isotopes
Assignee: CYCLOTRON Corp A CORP OF
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Filing: 1980-05-02
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Granted: 1982-05-04
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Expires: 2000-05-02
Abstract
Abstract A method and apparatus which uses sputter cathode material in an ion sputter pump to discriminate between hydrogen or its isotopes and the pumped impurities by virtue of their different permeability or diffusion rates through and solubility in a film of sputtered cathode material. Iron and specific hydride-forming cathode materials are examples.
Inventors
- 👤 Johann Hemmerich
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 15:24
CPC Classifications
G; G21; G21F; G21F9/00; G21F9/02; G21B; G21B1/00; G21B1/11; G21B1/115; Y; Y02; Y02E; Y02E30/00; Y02E30/10
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
104 words
A method for selectively pumping impurities from hydrogen and mixtures of hydrogen and its isotopes, comprising the steps of: confining a mixture of one or more of hydrogen and its isotopes and said impurities in an enclosure-defined evacuated zone; ionizing a portion of the mixture in an electric discharge within the zone; accelerating the ionized portion of the mixture to bombard a sputtering electrode; removing the mixture that migrates to said enclosure by entrapment within a film of dislodged electrode atoms formed upon said enclosure; and permitting hydrogen and its isotopes to diffuse out of said film and to return into the evacuated zone.
Claim 2
Independent Claim
104 words
A method for selectively pumping impurities from hydrogen and mixtures of hydrogen and its isotopes, comprising the steps of: confining a mixture of one or more of hydrogen and its isotopes and said impurities in an enclosure-defined evacuated zone; ionizing a portion of the mixture in an electric discharge within the zone; accelerating the ionized portion of the mixture to bombard a sputtering electrode; removing the mixture that migrates to said enclosure by entrapment within a film of dislodged electrode atoms formed upon said enclosure; and permitting hydrogen and its isotopes to diffuse out of said film and to return into the evacuated zone.
Claim 3
Dependent Claim
14 words
The method of claim 1 wherein the material of the sputtering electrode is iron.
Claim 4
Dependent Claim
18 words
The method of claim 1 wherein the material of the sputtering electrode is one of nickel and copper.
Claim 5
Dependent Claim
24 words
The method of claim 1 wherein entrapment of the impurities and initial entrapment of hydrogen and its isotopes in the film is by burial.
Claim 6
Dependent Claim
36 words
The method of claim 1 further comprising the step of controlling the temperature of the sputtered film to induce diffusion of hydrogen and its isotopes out of said film and to return into said evacuated zone.
Claim 7
Dependent Claim
28 words
The method of claim 4 wherein the material of the sputtering electrode is a hydride-forming material that reversibly chemisorbs hydrogen and its isotopes as a function of temperature.
Claim 8
Dependent Claim
12 words
The method of claim 5 wherein the hydride-forming material is zirconium-aluminum alloy.
Claim 9
Dependent Claim
19 words
The method of claim 1 wherein the impurities are at least one of the noble gases, oxygen and nitrogen.
References Cited (Backward Citations)
US4051063A
Cited
US4094762A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-05-03 | 1985-11-02 | 1986-05-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-05-03 | 1989-11-02 | 1990-05-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-05-03 | 1993-11-02 | 1994-05-04 | $7700.00 | Window Closed / Lapsed |