Optically testing the lateral dimensions of a pattern

Claim 2

Apparatus for optically testing the lateral dimensions of a diffraction grating pattern of material disposed on a substrate, said diffraction pattern comprised of a planar array of spaced strips of material having a strip width w and periodicity d, comprising: means for exposing said diffraction pattern to a beam of monochromatic light to diffract said beam into diffracted beams of various orders; detector means including detectors for measuring the intensity of two of the diffracted beams to obtain two intensity signals (I 1 and I 2 ) and means responsive to said intensity signals for determining the width w of said strips.

Claim 3

Apparatus according to claim 1 wherein said one diffracted beam intensity (I 1 ) is the first order beam intensity, and the other diffracted beam intensity (I 2 ) is the second order beam intensity, said diffraction grating is a rectangular relief pattern, and wherein said width determining means includes means for determining the width W of said strips according to the relation W=(d/π)cos -1 √I 2 /I 1 .

Claim 4

Apparatus according to claim 2 wherein said beam of light is exposed to said diffraction pattern uniformly at an acute angle θ to the plane of said relief pattern.

Claim 5

Apparatus according to claim 3 wherein said beam angle θ is equal to Brewster's angle, defined by tan θ=n, where n is the refractive index of the material forming said pattern.

Claim 6

Apparatus according to claim 2 wherein said beam of light is a laser beam, said beam being a He-Ne laser.

Claim 7

Apparatus according to claim 1 wherein said detector means further includes a detector to measure the intensity of the zero order beam intensity, and further including adjustable mirror means for positioning said light, and means responsive to said zero order beam intensity for adjusting said mirror means so that said zero, first, and second order beams are positioned to a desired location to impinge on said first order and second order detectors.

Claim 8

Apparatus according to claim 6 wherein said zero order detector is a quadrant detector.

Claim 9

Apparatus for optically testing the lateral dimensions of a pattern of material disposed on a substrate comprising: means for applying said material to both said substrate and a test surface; means for selectively removing said material from both said substrate and said test surface simultaneously to form, respectively, said pattern on said substrate and a diffraction grating on said test surface including spaced strips of said material having a strip width W and a periodicity d; means for exposing said diffraction grating to a beam of monochromatic light, whereby said diffraction grating and said test surface therebeneath function as a relief pattern, diffracting said beam of monochromatic light into diffracted beams of various orders; means for measuring the intensity of two of the diffracted beams (I 1 and I 2 ) to obtain two intensity signals; means for transmitting said intensity signals (I 1 and I 2 ) to processing means for determining the strip width W; and comparing said strip width W with a pre-established value to obtain a difference signal, whereby the magnitude of said difference signal is a measure for the lateral dimensional tolerance of said pattern.

Claim 10

Apparatus for optically testing the lateral dimensions of a pattern of material disposed on a substrate comprising: means for applying said material to both said substrate and a test surface; means for selectively removing said material from both said substrate and said test surface simultaneously to form, respectively, said pattern on said substrate and a diffraction grating on said test surface including spaced strips of said material having a strip width W and a periodicity d; means for exposing said diffraction grating to a beam of monochromatic light, whereby said diffraction grating and said test surface therebeneath function as a relief pattern, diffracting said beam of monochromatic light into diffracted beams of various orders; means for measuring the intensity of two of the diffracted beams (I 1 and I 2 ) to obtain two intensity signals; means for transmitting said intensity signals (I 1 and I 2 ) to processing means for determining the strip width W; and comparing said strip width W with a pre-established value to obtain a difference signal, whereby the magnitude of said difference signal is a measure for the lateral dimensional tolerance of said pattern.

Claim 11

The apparatus as recited in claim 8 wherein one diffracted beam intensity (I 1 ) is the first order beam itensity, wherein the other diffracted beam intensity (I 2 ) is the second order beam intensity, wherein said diffraction grating is a rectangular relief pattern, and wherein said processing means for determining said strip width W utilizes the approximation W=(d/π)cos -1 √I 2 /I 1 .

Claim 12

The apparatus as recited in claim 9 wherein said material is selected from the group consisting of photoresist, silicon dioxide, silicon nitride, polycrystalline silicon and metal.

Claim 13

The apparatus as recited in claim 10 wherein said test surface comprises a knock-out section of said substrate.

Claim 14

The apparatus as recited in claim 11 wherein, said exposure means includes means for directing said beam of monochromatic light to strike said rectangular relief pattern uniformly at an angle acute to the plane of said relief pattern.

Claim 15

The apparatus as recited in claim 9 wherein said exposure means includes means for directing said beam of monochromatic light to strike said rectangular relief pattern uniformly at an angle of incidence θ I equal to Brewster's angle, defined by the relationship TAN θ I =n, where n is the refractive index of said material.

Claim 16

The apparatus as recited in claim 8 wherein said measuring means includes photodetectors placed respectively at angular positions to receive said first order and said second order beams.

Claim 17

The apparatus as recited in claim 14 wherein said photodetectors are silicon PIN diodes.

Claim 18

The apparatus as recited in claim 8 wherein said beam of monochromatic light is a laser beam.

Claim 19

The apparatus as recited in claim 8 wherein said substrate is a silicon wafer, wherein said strip width W is about 5 micrometers and wherein said periodicity d is about 20 micrometers.