US4301231A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Negative resist for high energy radiation
Assignee: Toray Industries Inc
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Filing: 1980-02-15
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Granted: 1981-11-17
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Expires: 2000-02-15
Abstract
Abstract Negative resist materials comprising soluble, film-forming polymers with side branches containing vinyl silyl groups are used for pattern generation on exposure to high energy radiation such as electron beams or X-rays.
Inventors
- 👤 Yuji Atarashi
- 👤 Mutsuo Kataoka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 00:20
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0757; G03F7/0758
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
65 words
A resist material capable of forming a negative image by application of radiation, said material comprising an organic polymer with branches at least some of which contain vinyl silyl groups and are represented by the formula ##STR11## wherein R 1 is a divalent organic bonding, R 2 is a monovalent organic group other than vinyl group and n is an integer of 1 to 3.
Claim 2
Dependent Claim
65 words
A resist material capable of forming a negative image by application of radiation, said material comprising an organic polymer with branches at least some of which contain vinyl silyl groups and are represented by the formula ##STR11## wherein R 1 is a divalent organic bonding, R 2 is a monovalent organic group other than vinyl group and n is an integer of 1 to 3.
Claim 3
Dependent Claim
33 words
The resist material as defined in claim 1, in which said polymer contains at least 3×10 -5 equivalent per gram thereof of vinyl silyl group-containing branches as vinyl groups attached to silicon atoms.
Claim 4
Dependent Claim
22 words
The resist material as defined in claim 1, in which the weight average molecular weight of said polymer is at least 2,000.
Claim 5
Dependent Claim
69 words
The resist material as defined in claim 1, in which said R 1 is Z-R 3 where Z, which is bonded to the main polymer chain, is --COO--, --OCO--, --CONH--, --CH 2 OCO-- or --OCH 2 CH 2 OCO--, and R 3 is --CH 2 -- 1-8 , --CH═CH--, --C.tbd.C--, --CH 2 --C.tbd.C--, ##STR12## phenylene, or any of these bondings with hydrogens partially substituted by alkyl or aryl group.
Claim 6
Dependent Claim
32 words
The resist material as defined in claim 1, in which the main polymer chain of said polymer comprises carbonaceous chain, polyether, polyimine, polysulfide, polyamide, polyester, polyurethane, polycarbonate, polyurea, cellulose, amylose, or dextrane.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-11-16 | 1985-05-18 | 1985-11-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-11-16 | 1989-05-18 | 1989-11-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-11-16 | 1993-05-18 | 1993-11-17 | $7700.00 | Window Closed / Lapsed |