Abstract Power handling capability and gain of metal-semiconductor field effect devices is adversely affected by a phenomenon variously known as gate-drain avalanche or gate breakdown which occurs at elevated gate-drain voltage. Consequently, it is desirable to design devices so as to maximize gate-drain breakdown voltage V gd consistent with maximum output power capability. According to the invention, such voltage is maximized by a gate-drain configuration which involves approximate equalization of per-unit-area mobile charge in a portion of the active layer under the gate contact and in an adjoining portion between gate and drain contacts. Equalization of charge may be achieved by appropriate doping or appropriate choice of layer thickness, either alone or in combination. In particular, if dopant concentration per unit volume is essentially equal in the two portions, approximate equalization of conducting channel thickness in the two portions is called for. Devices of the invention are capable of higher gain and output power as is desirable in applications such as, e.g., the amplification of microwaves.
Metal-semiconductor field effect device comprising a substrate, an active layer which is epitaxially deposited on said substrate and which is doped with at least one significant free carrier impurity, a metal-semiconductor Schottky barrier gate contact on a first portion of said active layer, a drain contact on a second portion of said active layer, said second portion of said active layer being disposed relative to said first portion of said active layer so as to allow for a third portion of said active layer, said third portion being the portion of said layer which is intermediate to said first portion and said second portion, said third portion here being designated output space, said device being CHARACTERIZED IN THAT per-unit-area concentration of free carriers in said output space is in the range of 0.7 to 1.1 times per-unit-area concentration of free carriers in said first portion.
Claim 2
Dependent Claim
145 words
Metal-semiconductor field effect device comprising a substrate, an active layer which is epitaxially deposited on said substrate and which is doped with at least one significant free carrier impurity, a metal-semiconductor Schottky barrier gate contact on a first portion of said active layer, a drain contact on a second portion of said active layer, said second portion of said active layer being disposed relative to said first portion of said active layer so as to allow for a third portion of said active layer, said third portion being the portion of said layer which is intermediate to said first portion and said second portion, said third portion here being designated output space, said device being CHARACTERIZED IN THAT per-unit-area concentration of free carriers in said output space is in the range of 0.7 to 1.1 times per-unit-area concentration of free carriers in said first portion.
Claim 3
Dependent Claim
56 words
Device of claim 1 in which per-unit-volume concentrations of free carriers in said first portion and said third portion are approximately equal and in which thickness (s) of a conducting channel in said output space is in the range of 0.7 to 1.1 times thickness (s g ) of a conducting channel in said first portion.
Claim 4
Dependent Claim
11 words
Device of claim 1 in which said range is from 0.8-1.0.
Claim 5
Dependent Claim
15 words
Device of claim 1 in which the material of said layer is a III-V compound.
Claim 6
Dependent Claim
11 words
Device of claim 4 in which said compound is gallium arsenide.
Claim 7
Dependent Claim
11 words
Device of claim 1 in which said active layer is n-type.