System for accurately tracing with a charged particle beam on film

Claim 1

A system for accurately tracing with a charged particle beam on film, comprising: (a) film gate means for receiving a film sensitive to charged particles, said film gate means having a portion with a predetermined continuous curvature to impart a predetermined continuous curvature to a portion of the film in said film gate means and provide controlled distortion of the film; (b) charged particle emission means for emitting a beam of charged particles, said charged particle emission means being positioned relative to said film gate means for exposing the film to the charged particle beam over at least a portion of said predetermined continuous curvature; and (c) transport means for intermittently moving the film within said film gate means in the direction of the length of the film for exposure to said charged particles when said film is stationary on said film gate.

Claim 2

A system for accurately tracing with a charged particle beam on film, comprising: (a) film gate means for receiving a film sensitive to charged particles, said film gate means having a portion with a predetermined continuous curvature to impart a predetermined continuous curvature to a portion of the film in said film gate means and provide controlled distortion of the film; (b) charged particle emission means for emitting a beam of charged particles, said charged particle emission means being positioned relative to said film gate means for exposing the film to the charged particle beam over at least a portion of said predetermined continuous curvature; and (c) transport means for intermittently moving the film within said film gate means in the direction of the length of the film for exposure to said charged particles when said film is stationary on said film gate.

Claim 7

A system for accurately tracing with a charge particle beam on film as claimed in claims 1, 2, 5 or 3, wherein: said predetermined continuous curvature is convex relative to the direction of the charged particle beam.

Claim 8

A system for accurately tracing with a charged particle beam on film as claimed in claims 1, 2, 5 or 3, wherein: said predetermined continuous curvature is concave relative to the direction of the charged particle beam.

Claim 9

A system for accurately tracing with a charged particle beam on film as claimed in claims 1, 2, 5 or 3, wherein: the charged particle beam is an electron beam.

Claim 13

A system for accurately tracing with a charged particle beam on film, comprising: (a) curved platen means for confining a film sensitive to charged particles from substantial movement in a direction toward said curved platen means, said curved platen means having a platen surface with predetermined continuous curvature to impart a predetermined continuous curvature to a portion of the film in contact with said platen surface and provide controlled distortion of the film; (b) curved frame means for confining a film sensitive to charged particles from substantial movement in a direction toward said curved frame means, said curved frame means having a frame surface parallel with said platen surface, said frame surface being spaced relative to said platen surface such that the film may slide between said frame suface and said platen surface in the direction of its length and width, but is prevented from substantial movement in the direction of its depth; (c) a charged particle emission means for emitting a beam of charged particles positioned relative to said frame means to expose the film to the charged particle beam over at least a portion of said predetermined continuous curvature; and (d) transport means for intermittently moving the film past said frame surface and said platen surface in the direction of the length of the film for exposure to said charged particles when said film is stationary on said platen.

Claim 14

A system for accurately tracing with a charged particle beam on film, comprising: (a) curved platen means for confining a film sensitive to charged particles from substantial movement in a direction toward said curved platen means, said curved platen means having a platen surface with predetermined continuous curvature to impart a predetermined continuous curvature to a portion of the film in contact with said platen surface and provide controlled distortion of the film; (b) curved frame means for confining a film sensitive to charged particles from substantial movement in a direction toward said curved frame means, said curved frame means having a frame surface parallel with said platen surface, said frame surface being spaced relative to said platen surface such that the film may slide between said frame suface and said platen surface in the direction of its length and width, but is prevented from substantial movement in the direction of its depth; (c) a charged particle emission means for emitting a beam of charged particles positioned relative to said frame means to expose the film to the charged particle beam over at least a portion of said predetermined continuous curvature; and (d) transport means for intermittently moving the film past said frame surface and said platen surface in the direction of the length of the film for exposure to said charged particles when said film is stationary on said platen.

Claim 16

A system for accurately tracing with a charged particle beam on film as claimed in claims 12, 13 or 4, wherein: said predetermined continuous curvature is convex relative to the direction of the charged particle beam.

Claim 19

A system for accurately tracing with a charged particle beam on film as claimed in claims 12, 13 or 4 wherein: said predetermined continuous curvature is concave relative to the direction of the charged beam.

Claim 20

A system for accurately tracing with a charged particle beam on film as claimed in claims 17, comprising: tension means for applying predetermined tension to the film in the direction of its length to hold a portion of the film in close proximity to said frame surface.

Claim 21

A system for accurately tracing with a charged particle beam on film as claimed in claims 12, 13, or 4, wherein: the charged particle beam is an electron beam.

Claim 31

A method for accurately tracing with a beam of charged particles on a film sensitive to charged particles, comprising the steps of: (a) imparting a predetermined continuous curvature to a portion of the film to receive an electron beam; (b) generating a beam of charged particles carrying predetermined information; (c) positioning the predetermined continuously curved film portion relative to the beam of charged particles to be impacted thereby; (d) exposing the predetermined continuously curved film to the beam of charged particles; and (e) intermittently moving the film into stationary position for exposure of different portions thereof to a beam of charged particles.

Claim 32

A method for accurately tracing with a beam of charged particles on a film sensitive to charged particles, comprising the steps of: (a) imparting a predetermined continuous curvature to a portion of the film to receive an electron beam; (b) generating a beam of charged particles carrying predetermined information; (c) positioning the predetermined continuously curved film portion relative to the beam of charged particles to be impacted thereby; (d) exposing the predetermined continuously curved film to the beam of charged particles; and (e) intermittently moving the film into stationary position for exposure of different portions thereof to a beam of charged particles.