US4294871A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for depositing a layer on the inside of cavities of a work piece
Assignee: Siemens AG
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Filing: 1979-08-29
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Granted: 1981-10-13
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Expires: 1999-08-29
Abstract
Abstract Disclosed herein is a process for the chemical deposition of a material layer on the inside of cavities of a work piece by conducting a gas stream in a substantially laminar flow along a heated work piece wherein deposition occurs from the gaseous phase, at a pressure of less than 10 4 Pascal (N/m 2 ).
Inventors
- 👤 Konrad Hieber
- 👤 Manfred Stolz
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 01:35
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45502; C23C16/45504; C23C16/04; C23C16/045
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
162 words
A method for depositing a layer of material of substantially uniform thickness on the inside of cavities of a workpiece having at least two internal cavities of differing inside diameter by chemical deposition from the gaseous phase, comprising heating the parts of said workpiece to be provided with said layer; conducting a gas stream containing the components of the material to be deposited along the surface of said parts in a substantially laminar flow by provision of a flow profiler at least approximately fitted to the shape of the workpiece and precipitation of said material from the gaseous phase at a pressure of less than 10 4 N/m 2 , whereby said flow profiler is designed and fitted to said workpiece so as to cause said gas stream to flow uniformly past the parts of said workpiece and to cause the resistance to flow of said gas stream from each of said individual internal cavities to be of approximately the same magnitude.
Claim 2
Independent Claim
162 words
A method for depositing a layer of material of substantially uniform thickness on the inside of cavities of a workpiece having at least two internal cavities of differing inside diameter by chemical deposition from the gaseous phase, comprising heating the parts of said workpiece to be provided with said layer; conducting a gas stream containing the components of the material to be deposited along the surface of said parts in a substantially laminar flow by provision of a flow profiler at least approximately fitted to the shape of the workpiece and precipitation of said material from the gaseous phase at a pressure of less than 10 4 N/m 2 , whereby said flow profiler is designed and fitted to said workpiece so as to cause said gas stream to flow uniformly past the parts of said workpiece and to cause the resistance to flow of said gas stream from each of said individual internal cavities to be of approximately the same magnitude.
Claim 3
Dependent Claim
28 words
The method according to claim 1 wherein said work piece on which the material layer is to be deposited is maintained in a vessel which can be evacuated.
Claim 4
Dependent Claim
20 words
The method according to claim 1 wherein the heating of the parts of the work piece is by inductive heating.
Claim 5
Dependent Claim
18 words
The method according to claim 3 wherein said heating comprises sequentially heating said work piece in individual zones.
Claim 6
Dependent Claim
38 words
The method according to claim 1 wherein said layer to be deposited is tantalum, said gaseous stream comprises hydrogen and TaCl 5 and the parts of said work piece are heated to a temperature above about 850° C.
Claim 7
Dependent Claim
29 words
The method according to claim 5 wherein the parts of said work piece are heated to a temperature in the range of from about 900° to about 1150° C.
Claim 8
Dependent Claim
22 words
The method according to claim 6 wherein the pressure at which said deposition is conducted is about 3×10 3 N/m 2 .
Claim 9
Dependent Claim
15 words
The method according to claim 1 wherein said material to be deposited is silicon dioxide.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-10-12 | 1985-04-13 | 1985-10-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-10-12 | 1989-04-13 | 1989-10-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-10-12 | 1993-04-13 | 1993-10-13 | $7700.00 | Window Closed / Lapsed |