Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
211 words
A process for the manufacture of a liquid crystal cell wherein each of the carrier plates supports an electrode formed of a conductive coating received in a recess with the thickness of the electrode equal to the depth of the recess so that the electrode is flush with the adjacent insulating layer, said process comprising providing a carrier plate, coating a surface of the carrier plate with a photo resist, exposing and developing the photo resist to remove portions of the photo resist to form a mask which exposes portions of the surface of the carrier plate in a pattern of the electrodes to be applied thereon, deep etching the exposed portions of the surface of the carrier plate to form recesses of a given depth, subsequently applying a layer of electrically conductive material in each etched recess and on the mask to a thickness equal to the depth of the recesses, then removing the remaining mask with the conductive layer disposed thereon so that the conductive layer is disposed in each recess extends flush with the surface of the carrier plate, then applying an additional layer of insulating material on the conductive layer and surface of the carrier plate and subsequently rubbing the insulating material to provide an orientation layer.
Claim 2
Dependent Claim
211 words
A process for the manufacture of a liquid crystal cell wherein each of the carrier plates supports an electrode formed of a conductive coating received in a recess with the thickness of the electrode equal to the depth of the recess so that the electrode is flush with the adjacent insulating layer, said process comprising providing a carrier plate, coating a surface of the carrier plate with a photo resist, exposing and developing the photo resist to remove portions of the photo resist to form a mask which exposes portions of the surface of the carrier plate in a pattern of the electrodes to be applied thereon, deep etching the exposed portions of the surface of the carrier plate to form recesses of a given depth, subsequently applying a layer of electrically conductive material in each etched recess and on the mask to a thickness equal to the depth of the recesses, then removing the remaining mask with the conductive layer disposed thereon so that the conductive layer is disposed in each recess extends flush with the surface of the carrier plate, then applying an additional layer of insulating material on the conductive layer and surface of the carrier plate and subsequently rubbing the insulating material to provide an orientation layer.
Claim 3
Dependent Claim
213 words
A process for the manufacture of a liquid crystal cell wherein each of the carrier plates supports an electrode formed of a conductive coating received in a recess with the thickness of the electrode equal to the depth of the recess so that the electrode is flush with the adjacent insulating layer, said process comprising providing a carrier plate, coating a surface of the carrier plate with a photo resist, exposing and developing the photo resist to remove portions of the photo resist to form a mask which exposes portions of the surface of the carrier plate in a pattern of the electrodes to be applied thereon, deep etching the exposed portions of the surface of the carrier plate to form recesses of a given depth, subsequently applying a layer of electrically conductive material in each etched recess and on the mask to a thickness equal to the depth of the recesses, then removing the remaining mask with the conductive layer disposed thereon so that the conductive layer is disposed in each recess extends flush with the surface of the carrier plate, and then applying an orientation layer on the surface of the carrier plate and conductive layer by obliquely vapor depositing an additional insulative layer onto the carrier plate and the electrodes.
Claim 4
Dependent Claim
213 words
A process for the manufacture of a liquid crystal cell wherein each of the carrier plates supports an electrode formed of a conductive coating received in a recess with the thickness of the electrode equal to the depth of the recess so that the electrode is flush with the adjacent insulating layer, said process comprising providing a carrier plate, coating a surface of the carrier plate with a photo resist, exposing and developing the photo resist to remove portions of the photo resist to form a mask which exposes portions of the surface of the carrier plate in a pattern of the electrodes to be applied thereon, deep etching the exposed portions of the surface of the carrier plate to form recesses of a given depth, subsequently applying a layer of electrically conductive material in each etched recess and on the mask to a thickness equal to the depth of the recesses, then removing the remaining mask with the conductive layer disposed thereon so that the conductive layer is disposed in each recess extends flush with the surface of the carrier plate, and then applying an orientation layer on the surface of the carrier plate and conductive layer by obliquely vapor depositing an additional insulative layer onto the carrier plate and the electrodes.
Claim 5
Dependent Claim
217 words
A process for manufacturing a liquid crystal cell which has a pair of carrier plates having facing surfaces provided with conductive layers forming electrodes and an insulating layer of material with the thickness of the insulating layer and the electrodes being substantially the same so that the surfaces are flush, said process comprising the steps of providing a carrier plate, coating a surface of each carrier plate with electrically conducting layer of material, coating the electrically conductive layer of material with a layer of photo resist, exposing and developing the photo resist to form a mask in the pattern of the electrodes so that the portions of the conductive layer adjacent the electrodes are free of the mask, removing the exposed portions of the conductive layer to expose portions of the surface of the carrier plate, subsequently applying an insulating layer on the mask and the exposed portions of the surface of the carrier plate, then removing the remaining portions of the mask including the insulating layer disposed thereon so that a surface of the carrier plate has a pattern of electrodes and an insulating layer each of the same depth, then applying an additional layer of insulating material on the insulating layer and electrodes and subsequently rubbing the additional insulating material to provide an orientation layer.
Claim 6
Dependent Claim
217 words
A process for manufacturing a liquid crystal cell which has a pair of carrier plates having facing surfaces provided with conductive layers forming electrodes and an insulating layer of material with the thickness of the insulating layer and the electrodes being substantially the same so that the surfaces are flush, said process comprising the steps of providing a carrier plate, coating a surface of each carrier plate with electrically conducting layer of material, coating the electrically conductive layer of material with a layer of photo resist, exposing and developing the photo resist to form a mask in the pattern of the electrodes so that the portions of the conductive layer adjacent the electrodes are free of the mask, removing the exposed portions of the conductive layer to expose portions of the surface of the carrier plate, subsequently applying an insulating layer on the mask and the exposed portions of the surface of the carrier plate, then removing the remaining portions of the mask including the insulating layer disposed thereon so that a surface of the carrier plate has a pattern of electrodes and an insulating layer each of the same depth, then applying an additional layer of insulating material on the insulating layer and electrodes and subsequently rubbing the additional insulating material to provide an orientation layer.
Claim 7
Dependent Claim
45 words
A process according to claim 3, wherein the step of applying a layer of conductive material applies a layer of tin oxide base and the step of applying the insulating layer applies a layer selected from a group consisting of zirconium oxide and titanium oxide.
Claim 8
Dependent Claim
211 words
A process for manufacturing a liquid crystal cell which has a pair of carrier plates having facing surfaces provided with conductive layers forming electrodes and an insulating layer of material with the thickness of the insulating layer and the electrodes being substantially the same so that the surfaces are flush, said process comprising the steps of providing a carrier plate, coating a surface of each carrier plate with electrically conducting layer of material, coating the electrically conductive layer of material with a layer of photo resist, exposing and developing the photo resist to form a mask in the pattern of the electrodes so that the portions of the conductive layer adjacent the electrodes are free of the mask, removing the exposed portions of the conductive layer to expose portions of the surface of the carrier plate, subsequently applying an insulating layer on the mask and the exposed portions of the surface of the carrier plate, then removing the remaining portions of the mask including the insulating layer disposed thereon so that a surface of the carrier plate has a pattern of electrodes and an insulating layer each of the same depth, and applying an orientation layer by obliquely vapor depositing an additional insulative layer onto the electrodes and the insulating layer.
Claim 9
Dependent Claim
211 words
A process for manufacturing a liquid crystal cell which has a pair of carrier plates having facing surfaces provided with conductive layers forming electrodes and an insulating layer of material with the thickness of the insulating layer and the electrodes being substantially the same so that the surfaces are flush, said process comprising the steps of providing a carrier plate, coating a surface of each carrier plate with electrically conducting layer of material, coating the electrically conductive layer of material with a layer of photo resist, exposing and developing the photo resist to form a mask in the pattern of the electrodes so that the portions of the conductive layer adjacent the electrodes are free of the mask, removing the exposed portions of the conductive layer to expose portions of the surface of the carrier plate, subsequently applying an insulating layer on the mask and the exposed portions of the surface of the carrier plate, then removing the remaining portions of the mask including the insulating layer disposed thereon so that a surface of the carrier plate has a pattern of electrodes and an insulating layer each of the same depth, and applying an orientation layer by obliquely vapor depositing an additional insulative layer onto the electrodes and the insulating layer.
Claim 10
Dependent Claim
37 words
A process according to claim 5, wherein the step of applying an orientation layer applies the orientation layer to cover each surface of the electrodes and the adjacent insulating material formed by the layer of insulating material.
Claim 11
Dependent Claim
45 words
A process according to claim 5, wherein the step of applying a layer of conductive material applies a layer of tin oxide base and the step of applying the insulating layer applies a layer selected from a group consisting of zirconium oxide and titanium oxide.