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US4286045A Expired / Lapsed US ⏱️ 0.0 years remaining

Image forming materials and image forming process

Assignee: Fujifilm Holdings Corp
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Filing: 1979-11-15
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Granted: 1981-08-25
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Expires: 1999-11-15
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Abstract

Abstract An image forming material comprising a support having thereon a layer composed of a Ge-S composition or a Ge-S-X composition wherein X represents at least one element selected from the group consisting of Al, Si, Mg, Ti, V, Mn, Co, Ni, Sn, Zn, Pd, In, Se, Te, Fe, I, P and O which undergoes a structural change capable of being detected optically, electrically or chemically upon exposure imagewise to light wherein the Ge-S or Ge-S-X composition layer has a thickness of at least about 300 A and contains therein at least one element selected from the group consisting of Ag, Cu and Pb in an amount of more than 2 atoms of Ag, Cu and/or Pb based on 100 atoms of the Ge-S composition or the Ge-S-X composition.

Inventors

  • 👤 Akira Nahara
  • 👤 Yoshihiro Ono
  • 👤 Tomizo Namiki
  • 👤 Shigeo Harada
  • 👤 Yuzo Mizobuchi
  • 👤 Tomoaki Ikeda

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-05 17:35
CPC Classifications
G; G03; G03C; G03C1/00; G03C1/705

Claims Analysis

Total Claims: 30
Claim 1
Independent Claim 160 words
In an image forming material comprising a support having thereon a layer composed of a Ge-S composition or a Ge-S-X composition, wherein X represents at least one element selected from the group consisting of Al, Si, Mg, Ti, V, Mn, Co, Ni, Sn, Zn, Pd, Se, Te, Fe, I, P and O, which undergoes a structural change capable of being detected optically, electrically or chemically upon exposure imagewise to light, wherein the improvement comprises: said Ge-S or Ge-S-X composition layer is continuous and has a thickness of at least 300 A, and said Ge-S composition or said Ge-S-X composition contains at least one element selected from the group consisting of Ag and Cu in an amount of more than two atoms of Ag and/or Cu based on 100 atoms of the Ge-S composition or the Ge-S-X composition, wherein the amount is sufficient to improve the moisture stability of the composition and the Ag and/or Cu is dispersed in the composition.
Claim 2
Dependent Claim 160 words
In an image forming material comprising a support having thereon a layer composed of a Ge-S composition or a Ge-S-X composition, wherein X represents at least one element selected from the group consisting of Al, Si, Mg, Ti, V, Mn, Co, Ni, Sn, Zn, Pd, Se, Te, Fe, I, P and O, which undergoes a structural change capable of being detected optically, electrically or chemically upon exposure imagewise to light, wherein the improvement comprises: said Ge-S or Ge-S-X composition layer is continuous and has a thickness of at least 300 A, and said Ge-S composition or said Ge-S-X composition contains at least one element selected from the group consisting of Ag and Cu in an amount of more than two atoms of Ag and/or Cu based on 100 atoms of the Ge-S composition or the Ge-S-X composition, wherein the amount is sufficient to improve the moisture stability of the composition and the Ag and/or Cu is dispersed in the composition.
Claim 3
Dependent Claim 65 words
The image forming material as set forth in claim 1, wherein said material additionally contains an organic compound in a state of contacting said Ge-S composition or said Ge-S-X composition layer, said organic compound being a compound conventionally used in silver halide photographic chemistry as an antifogging agent, a sensitizing agent, a desensitizing agent, a developing agent, a dye, a pigment or a photochromic compound.
Claim 4
Dependent Claim 35 words
The image forming material as set forth in claim 2, wherein the amount of the Ag and/or Cu is 5 or more atoms based on 100 atoms of the Ge-S composition or the Ge-S-X composition.
Claim 5
Dependent Claim 73 words
The image forming material as set forth in claim 2, wherein the amount of the Ag and/or Cu in the Ge-S composition having the formula GeS.sub.α is up to about ##EQU5## and in the Ge-S-X composition having the formula GeS.sub.α X.sub.β is up to about ##EQU6## wherein in the above α is the atomic ratio of sulfur atoms to germanium atoms and β is the atomic ratio of X atoms to germanium atoms.
Claim 6
Dependent Claim 32 words
The image forming material as set forth in claim 4, wherein said Ag and/or Cu is present in an amount of about 80% of said amount as set forth in claim 4.
Claim 7
Dependent Claim 43 words
The image forming material as set forth in claim 5, wherein the amount of Ag is up to 10 atoms and the amount of Cu is up to 10 atoms, each based on 100 atoms of the Ge-S composition or the Ge-S-X composition.
Claim 8
Dependent Claim 30 words
The image forming material as set forth in claim 2, wherein the atomic ratio of the Ge to the S on the Ge-S composition or the Ge-S-X composition is 1≦S/Ge<16.
Claim 9
Dependent Claim 27 words
The image forming material as set forth in claim 2, wherein X is an element selected from the group consisting of Al, Si, I, P and O.
Claim 10
Dependent Claim 50 words
The image forming material as set forth in claim 2, wherein said organic compound is a compound having at least one of a --SH moiety, a C═S moiety, a --(S) n -- moiety where n is 1 to 6, a --SO 2 H moiety or a --SO 3 H moiety.
Claim 11
Dependent Claim 28 words
The image forming material as set forth in claim 2, wherein said organic compound is selected from the group consisting of Methylene Blue, Crystal Violet and Rhodamine B.
Claim 12
Dependent Claim 296 words
The image forming material as set forth in claim 9, wherein said organic compound is selected from the group consisting of (1) thioureas represented by the following formula: ##STR31## wherein R 1 , R 2 , R 3 and R 4 each represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, a hydroxyalkyl group having 1 to 5 carbon atoms or a phenyl group, or wherein R 1 and R 2 or R 3 and R 4 may be bonded to form a 5-membered heterocyclic ring; (2) thiosemicarbazides and thiocarbazides represented by the following formulae: ##STR32## wherein R 1 , R 2 , R 3 and R 4 each represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a phenyl group, or derivatives thereof; (3) dithiocarbamic acids represented by the following formula: ##STR33## wherein R 1 and R 2 each represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, an aralkyl group having 7 to 9 carbon atoms or a phenyl group; M represents a hydrogen atom or a n-valent metal ion; and n represents 1 or 2; (4) thiobenzophenones represented by the following formula: ##STR34## wherein R 1 and R 2 each represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms; an alkoxy group having 1 to 5 carbon atoms, a dialkylamino group having 1 to 5 carbon atoms in each of the alkyl moieties thereof, a chlorine atom, a bromine atom or an iodine atom; (5) dithiolan; (6) a thiazole or a benzothiazole; (7) a thiadiazole; (8) a pyrrole or a benzopyrrole; (9) an imidazole or a benzimidazole; (10) an imidazoline; (11) a triazole or a benzotriazole; (12) a tetrazole; (13) a pyrimidine; and (14) a tetrazaindene.
Claim 13
Dependent Claim 51 words
The image forming material as set forth in claim 2, wherein said organic compound is selected from the group consisting of 1-phenyl-5-mercaptotetrazole, 3-methyl-4-phenyl-5-mercapto-1,2,4-triazole, 3,4-dimethyl-5-mercapto-1,2,4-triazole, 3-(p-caproamidophenyl)4-ethyl-5-mercapto-1,2,4-triazole, 3-n-undecyl-4-phenyl-5-mercapto-1,2,4-triazole, 1,5-dimercapto-3,7-diphenyl(1,2,4)triazolo(1,2,2) (1,2,4)triazole, 1-phenyl-2-mercaptoimidazole, 2-hexadecylthioimidazoline hydrobromide, 2-thioxo-4-oxothiazolidine, 2,5-dimercapto-1,3,4-thiadiazole, bismuthiol II, 2-ethylthio-4-methyl-6-hydroxypyrimidine, 2-mercapto-4-hydroxy-6-methyl pyrimidine, N,N,N',N'-tetramethyl-4,4'-diaminothiobenzophenone, sodium diethyldithiocarbamate, silver diethyldithiocarbamate, N,N,N',N'-tetramethyl-p-phenylene-diamine hydrochloride, monoethylurea, dimethylolthiourea, 4-phenylthiosemicarbazide, 2,5-di-(1,1-dimethylbutyl)hydroquinone and 1-(m-caproamidophenyl)-5-mercaptotetrazole.
Claim 14
Dependent Claim 45 words
The image forming material as set forth in claim 1, wherein said improvement comprises said Ge-S composition or said Ge-S-X composition containing Ag in an amount of more than two atoms of Ag based on 100 atoms of the Ge-S composition or the Ge-S-X composition.
Claim 15
Dependent Claim 44 words
The image forming material as set forth in claim 1, wherein said improvement comprises said Ge-S composition or said Ge-S-X composition containing Cu in an amount of more than two atoms of Cu based on 100 atoms of said Ge-S or said Ge-S-X composition.
Claim 16
Dependent Claim 31 words
A method for forming visible images having different hydrophilicity or hydrophobicity in the exposed areas than in the non-exposed areas which comprises exposing the image-forming material of claim 1 to light.
Claim 17
Dependent Claim 57 words
The method set forth in claim 15, wherein said image forming material additionally contains an organic compound conventionally used in silver photographic chemistry as an antifogging agent, a sensitizing agent, a desensitizing agent, a developing agent, a dye, a pigment, or a photochromic compound in a state of contacting said Ge-S composition or said Ge-S-X composition layer.
Claim 18
Dependent Claim 31 words
The method as set forth in claim 15, where in addition to exposing said material to light, said material is physically developed to thereby produce visible images having a high contrast.
Claim 19
Dependent Claim 40 words
The image forming material as set forth in claim 1, wherein said layer composed of a Ge-S composition or a Ge-S-X composition is provided by simultaneous deposition of Ag and/or Cu and the Ge-S or Ge-S-X composition onto the support.
Claim 20
Dependent Claim 51 words
The image forming material as set forth in claim 18, wherein said layer is provided by a vacuum deposition process, a flash evaporation process, an electron beam deposition process, a sputtering process, an ion plating process, an electrodeposition process, an electrophoresis process, a gas phase deposition process or a spraying process.
Claim 21
Dependent Claim 20 words
The image forming material as set forth in claim 18, wherein said layer is provided by a vacuum deposition process.
Claim 22
Dependent Claim 21 words
The image forming material as set forth in claim 18, wherein said layer is provided by an electron beam deposition process.
Claim 23
Independent Claim 137 words
A method for producing an image forming material, which comprises simultaneously depositing (i) at least one element selected from the group consisting of Ag and Cu, and (ii) a Ge-S composition or a Ge-S-X composition, on a support to form a layer, wherein X represents at least one element selected from the group consisting of Al, Si, Mg, Ti, V, Mn, Co, Ni, Sn, Zn, Pd, Se, Te, Fe, I, P and O, wherein said composition undergoes a structural change capable of being detected optically, electrically or chemically upon imagewise exposure to light, said Ge-S or Ge-S-X composition layer is continuous and has a thickness of at least 300 A, and said layer contains Ag and/or Cu dispersed therein in an amount of more than two atoms based on 100 atoms of the Ge-S or Ge-S-X composition.
Claim 24
Independent Claim 137 words
A method for producing an image forming material, which comprises simultaneously depositing (i) at least one element selected from the group consisting of Ag and Cu, and (ii) a Ge-S composition or a Ge-S-X composition, on a support to form a layer, wherein X represents at least one element selected from the group consisting of Al, Si, Mg, Ti, V, Mn, Co, Ni, Sn, Zn, Pd, Se, Te, Fe, I, P and O, wherein said composition undergoes a structural change capable of being detected optically, electrically or chemically upon imagewise exposure to light, said Ge-S or Ge-S-X composition layer is continuous and has a thickness of at least 300 A, and said layer contains Ag and/or Cu dispersed therein in an amount of more than two atoms based on 100 atoms of the Ge-S or Ge-S-X composition.
Claim 25
Dependent Claim 55 words
The method for producing an image forming material as set forth in claim 22, wherein said layer is formed by a vacuum deposition process, a flash evaporation process, an electron beam deposition process, a sputtering process, an ion plating process, an electrodeposition process, an electrophoresis process, a gas phase deoposition process or a spraying process.
Claim 26
Dependent Claim 24 words
The method for producing an image forming material as set forth in claim 22, wherein said layer is formed by a vacuum deposition process.
Claim 27
Dependent Claim 25 words
The method for producing an image forming material as set forth in claim 22, wherein said layer is formed by an electron beam deposition process.
Claim 28
Dependent Claim 68 words
The method for producing an image-forming material as set forth in claim 22, wherein said material additionally contains an organic compound in a state of contacting said Ge-S composition or said Ge-S-X composition layer, said organic compound being a compound conventionally used in silver halide photographic chemistry as an antifogging agent, a sensitizing agent, a desentizing agent, a developing agent, a dye, a pigment or a photochromic compound.
Claim 29
Dependent Claim 38 words
The method for producing an image-forming material as set forth in claim 22, wherein the amount of the Ag and/or Cu is 5 or more atoms based on 100 atoms of the Ge-S composition or the Ge-S-X composition.
Claim 30
Dependent Claim 77 words
The method for producing an image forming material as set forth in claim 22, wherein the amount of the Ag and/or Cu in the Ge-S composition having the formula GeS.sub.α is up to about ##EQU7## and in the Ge-S-X composition having the formula GeS.sub.α X.sub.β is up to about ##EQU8## wherein in the above α is the atomic ratio of sulfur atoms to germanium atoms and β is the atomic ratio of X atoms to germanium atoms.

References Cited (Backward Citations)

US3707372A Cited
US3660086A Cited
US3907566A Cited
US3852067A Cited
US3996057A Cited
JPS50827A Cited
US3966470A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1984-08-24 1985-02-23 1985-08-25 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1988-08-24 1989-02-23 1989-08-25 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1992-08-24 1993-02-23 1993-08-25 $7700.00 Window Closed / Lapsed

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