US4269653A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Aperture stop
Assignee: Toshiba Corp
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Filing: 1979-11-05
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Granted: 1981-05-26
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Expires: 1999-11-05
Abstract
Abstract A method of manufacturing an aperture stop with a rectangular aperture for an electron beam exposure device, comprising the steps of: preparing a single-crystal silicon substrate with one side having a (100) face; providing a mask on said side of the substrate; selectively etching the substrate through the mask from said side to form a projecting portion of rectangular cross section by anisotropic etching; forming an aperture layer by covering said one side of the etched substrate with a high-melting-point metal having good electric conductivity, thereby surrounding said projecting portion; and forming in said aperture layer a rectangular aperture with a cross section corresponding to the cross section of said projecting portion by removing said substrate from the aperture layer.
Inventors
- 👤 Hirotsugu Wada
- 👤 Toshiaki Shinozaki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 19:21
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/20; C; C23; C23F; C23F1/00; C23F1/02; C23F1/04; C25; C25D; C25D1/00; C25D1/08; G02; G02B; G02B5/00; G02B5/005; H; H01; H01J; H01J37/00; H01J37/02; H01J37/04; H01J37/09
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
127 words
A method of manufacturing an aperture stop with a rectangular aperture for an electron beam exposure device, comprising the steps of: (a) preparing a single-crystal silicon substrate with one side having a (100) face; (b) providing a mask on said side of the substrate; (c) selectively etching the substrate through the mask from said side to form a projecting portion of rectangular cross section by anisotropic etching; (d) forming an aperture layer on said one side of the etched substrate surrounding said projecting portion, said layer being comprised of a high-melting-point metal having good electric conductivity; and (e) forming in said aperture layer a rectangular aperture with a cross section corresponding to the cross section of said projecting portion by removing said substrate from the aperture layer.
Claim 2
Independent Claim
127 words
A method of manufacturing an aperture stop with a rectangular aperture for an electron beam exposure device, comprising the steps of: (a) preparing a single-crystal silicon substrate with one side having a (100) face; (b) providing a mask on said side of the substrate; (c) selectively etching the substrate through the mask from said side to form a projecting portion of rectangular cross section by anisotropic etching; (d) forming an aperture layer on said one side of the etched substrate surrounding said projecting portion, said layer being comprised of a high-melting-point metal having good electric conductivity; and (e) forming in said aperture layer a rectangular aperture with a cross section corresponding to the cross section of said projecting portion by removing said substrate from the aperture layer.
Claim 3
Dependent Claim
23 words
The method according to claim 1, wherin said mask comprises a silicon oxide layer which is selectively etched to have a rectangular shape.
Claim 4
Dependent Claim
29 words
The method according to claim 1, wherein said mask comprises a silicon oxide layer located on the substrate and a silicon nitride layer formed on the silicon oxide layer.
Claim 5
Dependent Claim
24 words
The method according to claim 2 or 3, wherein said high-melting-point metal is selected from the group consisting of molybdenum, tungsten, tantalum and titanium.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-05-25 | 1984-11-24 | 1985-05-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-05-25 | 1988-11-24 | 1989-05-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-05-25 | 1992-11-24 | 1993-05-26 | $7700.00 | Window Closed / Lapsed |