US4262160A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Evaporator feed
Assignee: Jersey Nuclear Avco Isotopes Inc
•
Filing: 1979-07-18
•
Granted: 1981-04-14
•
Expires: 1999-07-18
Abstract
Abstract Apparatus and method for supplying feedstock to a reservoir containing material having a portion which is heated to a molten condition and vaporized by an electron beam. The electron beam is supplied from a heated filament and directed to impact on the vapor source material by electric and magnetic fields. The feedstock is suspended above a portion of the reservoir out of the path of the electron beam. Skip electrons along with some secondary electrons emitted from the surface of the material in the vicinity of the region of electron beam impact, together with radiant heating therefrom, are utilized to melt an exposed portion of the feedstock, allowing it to drip into the reservoir, and replenish the supply of material which is depleted by vaporization. Vaporization is maintained substantially uniform from the region of electron beam impact and splatter of the feedstock is largely avoided.
Inventors
- 👤 Robert H. McKoon
- 👤 P. A. Joel Smith
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 04:18
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/24; C23C14/28; C23C14/30; H; H01; H01J; H01J37/00; H01J37/30; H01J37/305; H01J37/3053
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
150 words
In an electron beam evaporator of the type having a reservoir containing a supply of material to be evaporated and an electron beam which may be directed onto the surface of said material to produce vaporization thereof, a method for replenishing the supply of material in the reservoir comprising the steps of: providing a quantity of said material, in addition to the material in the reservoir, as feedstock; providing a stream of non-primary electrons emitted from the surface of the material in the reservoir from the impingement of the electron beam thereon; and, positioning said feedback so as to intercept said stream of non-primary electrons and outside of said electron beam directed onto the surface of said material; whereby a portion of the feedstock is melted by the stream of non-primary electrons, allowing it to drip into the reservoir, to replenish the supply of material which is depleted by vaporization.
Claim 2
Dependent Claim
150 words
In an electron beam evaporator of the type having a reservoir containing a supply of material to be evaporated and an electron beam which may be directed onto the surface of said material to produce vaporization thereof, a method for replenishing the supply of material in the reservoir comprising the steps of: providing a quantity of said material, in addition to the material in the reservoir, as feedstock; providing a stream of non-primary electrons emitted from the surface of the material in the reservoir from the impingement of the electron beam thereon; and, positioning said feedback so as to intercept said stream of non-primary electrons and outside of said electron beam directed onto the surface of said material; whereby a portion of the feedstock is melted by the stream of non-primary electrons, allowing it to drip into the reservoir, to replenish the supply of material which is depleted by vaporization.
Claim 3
Dependent Claim
45 words
The method of claim 1 further comprising the step of maintaining the feedstock at least partially over the reservoir such that a portion of the feedstock intercepts the trajectories of the electrons in the stream of non-primary electrons, to melt a portion of the feedstock.
Claim 4
Dependent Claim
36 words
The method of claim 1 further including the step of monitoring the level of material in the reservoir and supplying the feedstock to be heated responsively thereto, to maintain the level of material in the reservoir.
Claim 5
Dependent Claim
84 words
In a process for e-beam evaportion, the improvement for feeding material to be evaporated comprising the steps of: applying to a surface of said material an e-beam to produce vaporization of said material from a restricted region of said surface and to generate an electron skip field; melting a portion of feedstock of said material exclusively in said skip field over a portion of said surface removed from said restricted region sufficiently to prevent melting of the feedstock by heat from said restricted region.
Claim 6
Dependent Claim
84 words
In a process for e-beam evaportion, the improvement for feeding material to be evaporated comprising the steps of: applying to a surface of said material an e-beam to produce vaporization of said material from a restricted region of said surface and to generate an electron skip field; melting a portion of feedstock of said material exclusively in said skip field over a portion of said surface removed from said restricted region sufficiently to prevent melting of the feedstock by heat from said restricted region.
Claim 7
Dependent Claim
33 words
The process of claim 4 wherein: a multi-phase region surrounds said restricted region; and said melting step includes the step of melting the portion of said feedstock to drip into said multi-phase region.
Claim 8
Dependent Claim
181 words
Apparatus for supplying feedstock to an electron beam evaporator of the type having a reservoir containing a supply of a material to be evaporated and an electron beam source providing a beam of electrons which is directed to impact on the surface of said material to produce vaporization thereof, said apparatus comprising: feedstock; means for producing a stream of non-primary electrons emitted from the surface of the material in the reservoir from the application thereto of the electron beam; means for maintaining at least a portion of the feedstock above the material in the reservoir to exclusively intercept the trajectories of a portion of said stream of non-primary electrons, whereby said stream of electrons produces heating and melting of the feedstock which then drips into the material supply in the reservoir; and the position at which the feedstock is maintained and intercepts said stream of non-primary electrons is sufficiently removed from the region of electron impact on the surface of the material in the reservoir such that the vaporization of the material in the reservoir is substantially uniform throughout such region.
Claim 9
Dependent Claim
181 words
Apparatus for supplying feedstock to an electron beam evaporator of the type having a reservoir containing a supply of a material to be evaporated and an electron beam source providing a beam of electrons which is directed to impact on the surface of said material to produce vaporization thereof, said apparatus comprising: feedstock; means for producing a stream of non-primary electrons emitted from the surface of the material in the reservoir from the application thereto of the electron beam; means for maintaining at least a portion of the feedstock above the material in the reservoir to exclusively intercept the trajectories of a portion of said stream of non-primary electrons, whereby said stream of electrons produces heating and melting of the feedstock which then drips into the material supply in the reservoir; and the position at which the feedstock is maintained and intercepts said stream of non-primary electrons is sufficiently removed from the region of electron impact on the surface of the material in the reservoir such that the vaporization of the material in the reservoir is substantially uniform throughout such region.
Claim 10
Dependent Claim
52 words
The apparatus of claim 6 wherein the feedstock comprises a rod of material of the same type as the supply of material to be evaporated and said apparatus further includes means for removing heat from said rod to confine the melting thereof to the portion of the rod maintained above the resevoir.
Claim 11
Dependent Claim
32 words
The apparatus of claim 7 wherein the means for removing heat from the rod of feedstock comprises a cooled tube at least partially enclosing said rod and providing a heat sink therefor.
Claim 12
Dependent Claim
38 words
The apparatus of claim 8 further including a vacuum chamber surrounding said electron beam evaporator and means exterior to said chamber for pushing the rod of feedstock out of the tube and into the stream of non-primary electrons.
Claim 13
Dependent Claim
22 words
The apparatus of claim 9 further including means for activating said pushing means responsive to the level of material in the reservoir.
Claim 14
Dependent Claim
102 words
A process for feeding evaporant to an electron beam evaporator having a magnetically directed, primary linear electron beam which strikes a supply of said evaporant within a container to cause evaporation along a line of said supply, and produce a non-primary electron beam therefor, the process including the steps of: directing a feedstock of said evaporant into said non-primary electron beam above said supply without contacting said primary electron beam with said feedstock; melting an end portion of said feedstock exclusively with said non-primary electron beam; and limiting the melting of said feedstock to said end portion in said secondary electron beam.
Claim 15
Dependent Claim
102 words
A process for feeding evaporant to an electron beam evaporator having a magnetically directed, primary linear electron beam which strikes a supply of said evaporant within a container to cause evaporation along a line of said supply, and produce a non-primary electron beam therefor, the process including the steps of: directing a feedstock of said evaporant into said non-primary electron beam above said supply without contacting said primary electron beam with said feedstock; melting an end portion of said feedstock exclusively with said non-primary electron beam; and limiting the melting of said feedstock to said end portion in said secondary electron beam.
Claim 16
Dependent Claim
24 words
The process of claim 11 wherein: said supply includes a multi-phase region; and said directing step includes directing said feedstock above said multi-phase zone.
Claim 17
Dependent Claim
20 words
The process of claim 11 wherein: said limiting step includes the step of cooling the feedstock beyond said end portion.
References Cited (Backward Citations)
US4035574A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-04-13 | 1984-10-13 | 1985-04-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-04-13 | 1988-10-13 | 1989-04-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-04-13 | 1992-10-13 | 1993-04-14 | $7700.00 | Window Closed / Lapsed |