← Back to Patent Explorer
US4260451A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of reworking substrates, and solutions for use therein

Assignee: International Business Machines Corp
•
Filing: 1980-03-17
•
Granted: 1981-04-07
•
Expires: 2000-03-17
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A solution for dissolving noble metal alloys which include tin, and other metals commonly used in semiconductor package substrates, having significant concentrations of KI, iodine and halogen ions selected from the group consisting of chloride and bromide ions.

Inventors

  • 👤 Arnold F. Schmeckenbecher

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 12:14
CPC Classifications
H; H10; H10W; H10W70/00; H10W70/01; H10W70/05; C; C23; C23F; C23F1/00; C23F1/10; C23F1/14

Claims Analysis

Total Claims: 12
Claim 1
Independent Claim 70 words
A solution for dissolving noble metal alloys which include Sn from substrates in presence of refractory metal which must be retained on the substrate consisting essentially of (1) KI in an amount of at least 0.3 moles/liter, (2) I 2 in an amount of at least 0.195 moles/liter, and (3) halogen ions selected from the group consisting of chloride and bromide ions in an amount of at least 0.3 moles/liter.
Claim 2
Dependent Claim 70 words
A solution for dissolving noble metal alloys which include Sn from substrates in presence of refractory metal which must be retained on the substrate consisting essentially of (1) KI in an amount of at least 0.3 moles/liter, (2) I 2 in an amount of at least 0.195 moles/liter, and (3) halogen ions selected from the group consisting of chloride and bromide ions in an amount of at least 0.3 moles/liter.
Claim 3
Dependent Claim 50 words
The solution of claim 1 wherein said KI is present in an amount in the range of 0.6 to 3.6 moles/liter, said iodine is present in the range of 1.5 to 2.1 moles/liter, and said halogen ions are present in an amount in the range of 0.75 to 4.0 moles/liter.
Claim 4
Dependent Claim 50 words
The solution of claim 1 wherein said KI is present in an amount in the range of 1.5 to 2.1 moles/liter, said iodine is present in the range of 0.98 to 1.36 moles/liter, and said halogen ions are present in an amount in the range of 1.0 to 1.75 moles/liter.
Claim 5
Dependent Claim 12 words
The solution of claim 2 wherein said halogen ions are chloride ions.
Claim 6
Dependent Claim 12 words
The solution of claim 2 wherein said halogen ions are bromide ions.
Claim 7
Dependent Claim 87 words
A re-work method of removing from a substrate features formed of noble metal alloys containing Sn while having features formed of refractory metals intact comprising subjecting the substrate to the action of a solution consisting essentially of (1) KI in an amount in the range of 0.6 to 3.6 moles/liter, (2) Iodine in an amount in the range of 1.5 to 2.1 moles/liter, (3) Halogen ions selected from the group consisting of chloride and bromide ions in an amount in the range of 0.75 to 4.0 moles/liter.
Claim 8
Dependent Claim 87 words
A re-work method of removing from a substrate features formed of noble metal alloys containing Sn while having features formed of refractory metals intact comprising subjecting the substrate to the action of a solution consisting essentially of (1) KI in an amount in the range of 0.6 to 3.6 moles/liter, (2) Iodine in an amount in the range of 1.5 to 2.1 moles/liter, (3) Halogen ions selected from the group consisting of chloride and bromide ions in an amount in the range of 0.75 to 4.0 moles/liter.
Claim 9
Dependent Claim 52 words
The re-work method of claim 6 wherein KI is present in said solution in an amount in the range of 1/5 to 2.1 moles/liter, said iodine in an amount in the range of 0.98 to 1.36 moles/liter, and said halogen ions in an amount in the range of 1.0 to 1.75 moles/liter.
Claim 10
Dependent Claim 13 words
The re-work method of claim 6 wherein said halogen ions are chloride ions.
Claim 11
Dependent Claim 13 words
The re-work method of claim 6 wherein said halogen ions are bromide ions.
Claim 12
Dependent Claim 21 words
The re-work method of claim 6 wherein the temperature of said solution is in the range of 65 to 80° C.

References Cited (Backward Citations)

US3634159A Cited
US4190489A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1984-04-06 1984-10-06 1985-04-07 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1988-04-06 1988-10-06 1989-04-07 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1992-04-06 1992-10-06 1993-04-07 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag