Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
246 words
A substrate bias generator for generating a potential in a semiconductor substrate, comprising a semiconductor substrate of a first type conductivity including a pair of first and second main faces opposite to each other, a first, a second and a third semiconductor regions of a second type conductivity disposed at predetermined intervals on said first main face of said semiconductor substrate, a first MOSFET disposed on said first main face of said semiconductor substrate and including a source region formed of said first semiconductor region, a drain region formed of said second semiconductor region and a gate electrode, a second MOSFET disposed on said first main face of said semiconductor substrate and including a source region formed of said second semiconductor region, a drain region formed of said third semiconductor region, and a gate electrode, a capacitor disposed on said first main face of said semiconductor substrate through an electrically insulating film, said capacitor including a pair of opposite electrodes and another electrically insulating film interposed between said electrodes, a first electric lead for connecting one of said electrodes of said capacitor to said gate electrode and drain region of said first MOSFET, and a second electric lead for connecting said gate electrode and drain region of said second MOSFET to an electrode connected to said second main face of said semiconductor substrate, said capacitor having a signal applied to the other electrode thereof, said first MOSFET having a source electrode connected to a ground potential.
Claim 2
Dependent Claim
246 words
A substrate bias generator for generating a potential in a semiconductor substrate, comprising a semiconductor substrate of a first type conductivity including a pair of first and second main faces opposite to each other, a first, a second and a third semiconductor regions of a second type conductivity disposed at predetermined intervals on said first main face of said semiconductor substrate, a first MOSFET disposed on said first main face of said semiconductor substrate and including a source region formed of said first semiconductor region, a drain region formed of said second semiconductor region and a gate electrode, a second MOSFET disposed on said first main face of said semiconductor substrate and including a source region formed of said second semiconductor region, a drain region formed of said third semiconductor region, and a gate electrode, a capacitor disposed on said first main face of said semiconductor substrate through an electrically insulating film, said capacitor including a pair of opposite electrodes and another electrically insulating film interposed between said electrodes, a first electric lead for connecting one of said electrodes of said capacitor to said gate electrode and drain region of said first MOSFET, and a second electric lead for connecting said gate electrode and drain region of said second MOSFET to an electrode connected to said second main face of said semiconductor substrate, said capacitor having a signal applied to the other electrode thereof, said first MOSFET having a source electrode connected to a ground potential.
Claim 3
Dependent Claim
68 words
A substrate bias generator as claimed in claim 1 wherein said capacitor includes one electrode disposed on said first main face of said semiconductor substrate through said electrically insulating film and connected to said gate electrode and drain region of said first MOSFET through said first electric lead, and the other electrode disposed on said one electrode through said another electrically insulating film and applied with said signal.
Claim 4
Dependent Claim
69 words
A substrate bias generator as claimed in claim 1 wherein said capacitor includes one electrode disposed on said first main face of said semiconductor substrate through said electrically insulating film and having said signal applied thereto and the other electrode disposed on said one electrode through said another electrically insulating film and connected to said gate electrode and drain region of said first MOSFET through said first electric lead.
Claim 5
Dependent Claim
33 words
A substrate bias generator as claimed in claim 1 wherein said semiconductor substrate has a P type conductivity and each of said first, second and third semiconductor zones has an N type conductivity.
Claim 6
Dependent Claim
33 words
A substrate bias generator as claimed in claim 1 wherein said semiconductor substrate has an N type conductivity and each of said first, second and third semiconductor regions has a P type conductivity.