US4255513A
Expired / Lapsed
US
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Photopolymerizable recording materials
Assignee: Agfa Gevaert NV
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Filing: 1979-08-08
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Granted: 1981-03-10
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Expires: 1999-08-08
Abstract
Abstract A photosensitive material is described which comprises a base and a solid photosensitive layer comprising a photopolymerizable compound and a photopolymerization initiating mixture consisting of an oxime ester, a photopolymerization initiator and a p-dialkylaminobenzene of the formula ##STR1## wherein R 1 and R 2 are lower alkyl, R 3 is hydrogen, alkyl, alkoxy or N(R 1 ) (R 2 ) and X is --CO--, --CS--, CH 2 , or --CH(OH)--.Synergistic photocuring sensitivity is obtained by said oxime ester in admixture with said p-dialkyl aminobenzene compound.
Inventors
- 👤 Urbain L. Laridon
- 👤 August M. Marien
- 👤 Walter F. De Winter
- 👤 Hendrik E. Kokelenberg
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 19:27
CPC Classifications
C; C08; C08F; C08F2/00; C08F2/46; C08F2/48; C08F2/50; G; G03; G03F; G03F7/00; G03F7/004; G03F7/027; G03F7/028; G03F7/031; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/111; Y10S430/114; Y10S430/117; Y10S430/12
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
150 words
A photosensitive element which comprises a base having thereon a solid photosensitive layer wherein said layer comprises as essential materials at least one polymerisable ethylenically unsaturated organic compound and a photopolymerisation initiating mixture consisting essentially of an oxime ester photopolymerisation initiator and a p-dialkylamino benzene corresponding to the general formula (I): ##STR15## wherein: X represents ##STR16## each of R 1 and R 2 , the same or different, represents a lower alkyl group, and R 3 represents a hydrogen atom, an alkyl group, an alkoxy group or a N(R 1 ) (R 2 ) group wherein each of R 1 and R 2 has the above meaning, and wherein the oxime ester and the dialkylaminobenzene are present in a ratio by weight of from about 1:1 and 10:1 and the said mixture with respect to the polymerisable ethylenically unsaturated compound is present at from about 10 and 50% by weight.
Claim 2
Dependent Claim
150 words
A photosensitive element which comprises a base having thereon a solid photosensitive layer wherein said layer comprises as essential materials at least one polymerisable ethylenically unsaturated organic compound and a photopolymerisation initiating mixture consisting essentially of an oxime ester photopolymerisation initiator and a p-dialkylamino benzene corresponding to the general formula (I): ##STR15## wherein: X represents ##STR16## each of R 1 and R 2 , the same or different, represents a lower alkyl group, and R 3 represents a hydrogen atom, an alkyl group, an alkoxy group or a N(R 1 ) (R 2 ) group wherein each of R 1 and R 2 has the above meaning, and wherein the oxime ester and the dialkylaminobenzene are present in a ratio by weight of from about 1:1 and 10:1 and the said mixture with respect to the polymerisable ethylenically unsaturated compound is present at from about 10 and 50% by weight.
Claim 3
Dependent Claim
14 words
A photosensitive material according to claim 1, wherein the dialkylamino benzene is Michler's ketone.
Claim 4
Dependent Claim
118 words
A photosensitive material according to claim 1, wherein the oxime ester photopolymerisation initiator corresponds to one of the general formulae (II) or (III): ##STR17## wherein: R 4 represents an alkyl group of 1 or 2 carbon atoms, an aryl group, an alkaryl group, an aralkyl group, a hydroxy-substituted aralkyl group, or an acyl group, R 5 represents a hydrogen atom, an alkyl group of 1 or 2 carbon atoms, an aryl group or an acyl group, or wherein R 4 and R 5 together represent the atoms necessary to form with the adjacent carbon atom a cycloalkyl group, a phenanthrone group, or an indanone group, R 6 represents an acyl group, and R 7 represents a diacyl group.
Claim 5
Dependent Claim
21 words
A photosensitive material according to claim 3, wherein at least one of R 4 and R 5 is an acyl group.
Claim 6
Dependent Claim
20 words
A photosensitive material according to claim 1, wherein the polymerisable ethylenically unsaturated organic compound is a plurally unsaturated polymerisable compound.
Claim 7
Dependent Claim
16 words
A photosensitive material according to claim 5, wherein the plurally unsaturated polymerisable compound is pentaerythritol triacrylate.
Claim 8
Dependent Claim
17 words
A photosensitive material according to claim 1, wherein the photosensitive layer also comprises a polymeric binding agent.
Claim 9
Dependent Claim
16 words
A photosensitive material according to claim 7, wherein the polymeric binding agent is an alkali-soluble polymer.
Claim 10
Dependent Claim
58 words
A photosensitive material according to claim 8, wherein the alkali-soluble polymer is a copoly(methyl methacrylate-methacrylic acid) wherein the ratio by weight between the methyl methacrylate and the methacrylic acid units varies between about 90:10 and about 75:25 and said copolymer has an intrinsic viscosity measured in tetrahydrofuran at 20° C. comprised between about 0.05 and about 0.20 dl/g.
Claim 11
Dependent Claim
33 words
A photosensitive material according to claim 8, wherein in the photosensitive layer the ratio by weight between the alkali-soluble binding agent and the ethylenically unsaturated polymerisable compound is comprised between 1:2 and 5:1.
Claim 12
Dependent Claim
52 words
A photosensitive material according to claim 8, wherein in the photosensitive layer the oxime ester compound is present in an amount of 5-7.5% by weight, and the dialkylamino benzene is present in an amount of 1.5-2.5% by weight, based on the joint weight of unsaturated polymerisable compound and of alkali-soluble binding agent.
Claim 13
Dependent Claim
20 words
A photosensitive material according to claim 1, wherein the base comprises a highly opaque metal coating on a film support.
Claim 14
Dependent Claim
23 words
A photosensitive material according to claim 12, wherein the base is composed of a polyethylene terephthalate film support provided with a bismuth coating.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-03-09 | 1984-09-08 | 1985-03-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-03-09 | 1988-09-08 | 1989-03-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-03-09 | 1992-09-08 | 1993-03-10 | $7700.00 | Window Closed / Lapsed |