Purification device

Claim 2

A purification device protected against excessive input flow of a liquid bearing an impurity, comprising: a buffer basin; a supply channel having an emergency discharge weir for discharging liquid into said buffer basin when the level of the liquid in the supply channel exceeds a predetermined value h MAX ; a separator communicating with said supply channel for receiving liquid from it to be purified by said separator; a discharge channel for receiving the liquid after it has been purified by the separator; and, flow rate limiting means communicating in series with the separator between the supply channel and the discharge channel and having a substantially greater flow resistance for flow rates exceeding a predetermined value Q MAX , related to h MAX , than for lesser flow rates; whereby, when the flow through the separator equals or exceeds Q MAX , any further increase of liquid in said supply channel will be deterred by the increased flow resistance from flowing through the separator and will therefore tend to increase the level of liquid in the supply channel causing an increase in flow over said emergency discharge weir.

Claim 3

The purification device of claim 1 wherein said flow rate limiting means further comprises a flow resistance element.

Claim 4

The purification device of claim 2 wherein said flow resistance element further comprises an inverted weir having a lower horizontal edge at a height substantially equal to the height h MAX of the emergency overflow weir of the supply channel.

Claim 5

The purification device of claim 3 wherein said inverted weir has appreciable thickness in the direction of flow.

Claim 6

The purification device of claim 2 wherein said flow resistance element further comprises a plate oriented normal to the flow direction and having an aperture defined in part by two parallel elongated horizontal edges, the height of the upper edge substantially equal to the height of h MAX of the emergency overflow weir of the supply channel.

Claim 7

The purification device of claim 2 wherein said flow resistance element further comprises a tube, both ends of which are normally submerged beneath the surface of the liquid.

Claim 8

The purification device of claim 2 wherein said flow resistance element further comprises a tube, one end of which lies in a horizontal plane located at a level less than h MAX and the other end of which is always submerged beneath the surface of the liquid.

Claim 9

The purification device of claim 1 wherein said flow rate limiting means further comprises a device in which applied energy is used to maintain the rate of flow through said flow rate limiting means at a value not exceeding Q MAX .

Claim 10

The purification device of claim 8 wherein said flow rate limiting means is a constant volume pump.

Claim 11

In a purification device of the type wherein an impurity-bearing liquid in a supply channel passes through a separator which substantially separates the impurities from the liquid, the purified liquid being discharged from the separator into a discharge channel, the supply channel being provided with an emergency overflow weir for discharging excess incoming impurity-bearing liquid into a buffer basin when the level of liquid in the supply channel exceeds a predetermined value h MAX , the improvement comprising: flow rate limiting means connected in series with the separator between the supply channel and the discharge channel and having a substantially greater flow resistance for flow rates exceeding a predetermined value Q MAX , related to h MAX , than for lesser flow rates, whereby when the flow through the separator equals or exceeds Q MAX , any further increase of impurity-bearing liquid in the supply channel will be deterred by the increased flow resistance from flowing through the separator and will therefore tend to increase the level of liquid in the supply channel causing an increase in flow over the emerging overflow weir.

Claim 12

In a purification device of the type wherein an impurity-bearing liquid in a supply channel passes through a separator which substantially separates the impurities from the liquid, the purified liquid being discharged from the separator into a discharge channel, the supply channel being provided with an emergency overflow weir for discharging excess incoming impurity-bearing liquid into a buffer basin when the level of liquid in the supply channel exceeds a predetermined value h MAX , the improvement comprising: flow rate limiting means connected in series with the separator between the supply channel and the discharge channel and having a substantially greater flow resistance for flow rates exceeding a predetermined value Q MAX , related to h MAX , than for lesser flow rates, whereby when the flow through the separator equals or exceeds Q MAX , any further increase of impurity-bearing liquid in the supply channel will be deterred by the increased flow resistance from flowing through the separator and will therefore tend to increase the level of liquid in the supply channel causing an increase in flow over the emerging overflow weir.

Claim 13

The improvement of claim 10 wherein said flow rate limiting means further comprises a flow resistance element.

Claim 14

The improvement of claim 11 wherein said flow resistance element further comprises an inverted weir having a lower horizontal edge at a height substantially equal to the height h MAX of the emergency overflow weir of the supply channel.

Claim 15

The improvement of claim 12 wherein said inverted weir has appreciable thickness in the direction of flow.

Claim 16

The improvement of claim 11 wherein said flow resistance element further comprises a plate oriented normal to the flow direction and having an aperture defined in part by two parallel elongated horizontal edges, the height of the upper edge substantially equal to the height h MAX of the emergency overflow weir of the supply channel.

Claim 17

The improvement of claim 11 wherein said flow resistance element further comprises a tube, both ends of which are normally submerged beneath the surface of the liquid.

Claim 18

The improvement of claim 11 wherein said flow resistance element further comprises a tube, one end of which lies in a horizontal plane located at a level less than h MAX and the other end of which is always submerged beneath the surface of the liquid.

Claim 19

The improvement of claim 10 wherein said flow rate limiting means further comprises a device in which applied energy is used to maintain the rate of flow through said flow rate limiting means at a value not exceeding Q MAX .

Claim 20

The improvement of claim 17 wherein said flow rate limiting means is a constant volume pump.