Composition and method for gold plating

Claim 2

A gold plating bath comprising an aqueous solution of: A. 15-150 grams per liter of a phosphate electrolyte; B. 15-150 grams per liter of 1-hydroxyethylidene-1,1-diphosphonic acid; C. a metal constitutent selected from the group consisting of (i) the 1-hydroxyethylidene-1,1-diphosphonic acid chelates of nickel and cobalt, and (ii) soluble compounds of indium, arsenic, and thallium, and (iii) mixtures thereof, said constituent providing 0.002-10.0 grams per liter of metal calculated as the metal; D. alkali metal gold cyanide in an amount providing 1-41 grams per liter of gold calculated as the metal; and E. free alkali metal cyanide in an amount equal to at least 2.5 percent by weight of the gold metal and sufficient to prevent precipitation of the metal values, said solution having a pH of 3.0-13.0 and a specific gravity of 4°-30° Baume.

Claim 3

The bath of claim 1 wherein said pH is below 7.0.

Claim 4

The bath of claim 2 wherein said metal constituent is selected from the group consisting of said cobalt and nickel chelates, indium compounds, and mixtures of at least two of said constituents.

Claim 5

The bath of claim 1 wherein said pH is at least 7.0, and wherein said metal constituent is selected from said compounds of arsenic, thallium and mixtures thereof.

Claim 6

The bath of claim 4 wherein said metal constitutent is an arsenic compound.

Claim 7

The bath of claim 1 wherein said phosphate electrolyte is present in the amount of 40-60 grams per liter, said 1-hydroxyethylidene-1,1-diphosphonic acid is present in the amount of 40-75 grams per liter, and said metal constituent provides the metal in the amountof 0.3-3.0 grams per liter.

Claim 8

The bath of claim 1 additionally including about 3.0 to 37.5 grams per liter of triethanolamine borate.

Claim 9

In a method of electroplating hard gold deposits upon a workpiece, the steps comprising: A. immersing a workpiece having an electrically conductive surface in a gold plating bath comprising an aqueous solution of: 1. 15-150 grams per liter of a phosphate electrolyte; 2. 15-150 grams per liter of 1-hydroxyethylidene-1,1-diphosphonic acid; 3. a metal constitutent selected from the group consisting of (i) the 1-hydroxyethylidene-1,1-diphosphonic acid chelates of nickel and cobalt, (ii) soluble compounds of indium, arsenic, and thallium, and (iii) mixtures thereof, said constituent providing 0.002-10.0 grams per liter of metal calculated as the metal; 4. alkali metal gold cyanide in an amount providing 1-41 grams per liter of gold calculated as the metal; and 5. free alkali metal cyanide in an amount equal to at least 2.5 percent by weight of the gold metal and sufficient to prevent precipitation of the metal values, said solution having a pH of 3.0-13.0 and a specific gravity of 4°-30° Baume. B. maintaining the temperature of said bath at about 20°-85° C.; C. applying an electrical potential across said workpiece and an anode to provide a current density of about 0.1-165 amperes per square decimeter at said workpiece to effect the desired thickness for the electrodeposit; and D. removing the electroplated workpiece from said bath.

Claim 10

In a method of electroplating hard gold deposits upon a workpiece, the steps comprising: A. immersing a workpiece having an electrically conductive surface in a gold plating bath comprising an aqueous solution of: 1. 15-150 grams per liter of a phosphate electrolyte; 2. 15-150 grams per liter of 1-hydroxyethylidene-1,1-diphosphonic acid; 3. a metal constitutent selected from the group consisting of (i) the 1-hydroxyethylidene-1,1-diphosphonic acid chelates of nickel and cobalt, (ii) soluble compounds of indium, arsenic, and thallium, and (iii) mixtures thereof, said constituent providing 0.002-10.0 grams per liter of metal calculated as the metal; 4. alkali metal gold cyanide in an amount providing 1-41 grams per liter of gold calculated as the metal; and 5. free alkali metal cyanide in an amount equal to at least 2.5 percent by weight of the gold metal and sufficient to prevent precipitation of the metal values, said solution having a pH of 3.0-13.0 and a specific gravity of 4°-30° Baume. B. maintaining the temperature of said bath at about 20°-85° C.; C. applying an electrical potential across said workpiece and an anode to provide a current density of about 0.1-165 amperes per square decimeter at said workpiece to effect the desired thickness for the electrodeposit; and D. removing the electroplated workpiece from said bath.

Claim 11

The method of claim 8 wherein said pH is below 7.

Claim 12

The method of claim 9 wherein said metal constituent is selected from the group consisting of said cobalt and nickel chelates, indium compounds, and mixtures of at least two of said constituents.

Claim 13

The method of claim 9 wherein said current density is 0.5 to 5.0 amperes per square decimeter.

Claim 14

The method of claim 9 wherein said method is effected with a pulsating current, and wherein the average and peak current densities applied are up to about 16.2 and 162 amperes per square decimeter, respectively.

Claim 15

The method of claim 8 wherein said pH is at least 7.0, and wherein said metal constituent is selected from said compounds of arsenic, thallium and mixtures thereof.

Claim 16

The method of claim 13 wherein said metal constituent is an arsenic compound.

Claim 17

The method of claim 13 wherein the current density is 0.3 to 1.0 amperes per square decimeter.

Claim 18

The method of claim 8 wherein said phosphate electrolyte is present in the amount of 40-60 grams per liter, said 1-hydroxyethylidene-1,1-diphosphonic acid is present in the amount of 40-75 grams per liter, and said metal constituent provides the metal in the amount of 0.3-3.0 grams per liter.

Claim 19

The method of claim 8 additionally including about 3.0 to 37.5 grams per liter of triethanolamine borate.