US4247781A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Cooled target disc for high current ion implantation method and apparatus
Assignee: International Business Machines Corp
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Filing: 1979-06-29
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Granted: 1981-01-27
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Expires: 1999-06-29
Abstract
Abstract A rotating target ion bombard or implant apparatus with an arrangement for cooling the target. The cooling arrangement utilizes a pattern of air openings or passages and air fins. The pattern of air openings are positioned concentric to the disc hub and act to separate the hub region of the disc from the outer target or work region. The air openings function to both reduce the conductive cross-section between the hub region and outer work region of the disc and permit air to pass from the implant or bombard side to the back surface thereof. The air fins are provided on the back surface of the disc to draw air through the openings when rotating. Cooling is achieved by rotating in atmosphere during the load/unload cycle of operation. Reduction of the conductive cross-section between work region and hub region reduces heat transfer to the ferrofluidic feedthrough means coupled to the hub region thereby increasing the ferrofluidic feedthrough means lifetime.
Inventors
- 👤 Erich H. Bayer
- 👤 John R. Kranik
- 👤 Wolfgang F. Mueller
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 01:38
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/30; H10P72/33; H10P72/3306; C; C23; C23C; C23C14/00; C23C14/22; C23C14/48; C23C14/50; C23C14/505; C23C14/54; C23C14/541; H01; H01J; H01J37/00; H01J37/30; H01J37/317; H01J37/3171; H10P72/04; H10P72/0402; H10P72/0418; H10P72/0421; H10P72/3308
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
128 words
Cooled target apparatus for holding workpieces for ion bombardment and implantation comprising: a disc having a target surface and back surface and having an inner hub region and an outer target surface region with said inner hub region and outer target region being divided by a pattern of holes generally concentric to the hub region for reducing the conductive cross-section between hub region and target region and for allowing fluid to pass from the target surface side of said disc to the back surface side thereof, said back surface side of said disc including a pattern of fins extending from said inner hub region outwardly toward the periphery of said disc so as to cause said fluid to be drawn through said holes when said disc is rotating.
Claim 2
Dependent Claim
128 words
Cooled target apparatus for holding workpieces for ion bombardment and implantation comprising: a disc having a target surface and back surface and having an inner hub region and an outer target surface region with said inner hub region and outer target region being divided by a pattern of holes generally concentric to the hub region for reducing the conductive cross-section between hub region and target region and for allowing fluid to pass from the target surface side of said disc to the back surface side thereof, said back surface side of said disc including a pattern of fins extending from said inner hub region outwardly toward the periphery of said disc so as to cause said fluid to be drawn through said holes when said disc is rotating.
Claim 3
Dependent Claim
30 words
The apparatus as set forth in claim 1 wherein the said target surface of said disc includes a pattern of recesses for holding said workpieces for ion bombardment and implantation.
Claim 4
Dependent Claim
151 words
In an ion beam bombardment and implantation apparatus having at least one ion source for providing an ion beam to workpieces mounted within the work area of a target disc, the improvement comprising a target disc including a work surface side and a back surface side and having an inner hub region and an outer target region with said inner hub region and outer target region being divided by a pattern of holes generally surrounding the hub region for reducing the conductive cross-section between hub region and target region and for allowing fluid to pass from the work surface side of said disc to the back surface side, said back surface side of said disc further including a pattern of fins extending generally from said hub region outwardly toward the periphery of said disc so as to cause said fluid to be drawn through said holes when said disc is rotating.
Claim 5
Dependent Claim
151 words
In an ion beam bombardment and implantation apparatus having at least one ion source for providing an ion beam to workpieces mounted within the work area of a target disc, the improvement comprising a target disc including a work surface side and a back surface side and having an inner hub region and an outer target region with said inner hub region and outer target region being divided by a pattern of holes generally surrounding the hub region for reducing the conductive cross-section between hub region and target region and for allowing fluid to pass from the work surface side of said disc to the back surface side, said back surface side of said disc further including a pattern of fins extending generally from said hub region outwardly toward the periphery of said disc so as to cause said fluid to be drawn through said holes when said disc is rotating.
Claim 6
Dependent Claim
27 words
The apparatus as set forth in claim 3 wherein said workpieces are respectively mounted within said work area via a pattern of recesses in said target disc.
Claim 7
Dependent Claim
77 words
A process for cooling the target of an ion bombardment and implantation apparatus to prevent progressive thermal buildup in said target with each processing cycle of operation comprising: rotating said target in atmosphere after each ion bombardment and implantation operation to cause air to be drawn through air openings in said target through the action of a pattern of air fins and be directed over the surfaces thereof to cause said target to be rapidly cooled thereby.
Claim 8
Dependent Claim
77 words
A process for cooling the target of an ion bombardment and implantation apparatus to prevent progressive thermal buildup in said target with each processing cycle of operation comprising: rotating said target in atmosphere after each ion bombardment and implantation operation to cause air to be drawn through air openings in said target through the action of a pattern of air fins and be directed over the surfaces thereof to cause said target to be rapidly cooled thereby.
Claim 9
Dependent Claim
126 words
A process for cooling the target of an ion bombardment and implantation apparatus to prevent large thermal buildup in said target over successive cycles of operation, comprising: removing a heated target from the ion bombardment and implantation confronting position and positioning said target in atmosphere; rotating said heated target in atmosphere to cause air to flow outwardly over the surfaces thereof through the action of a pattern of air fins drawing said air through a pattern of holes around the axis of rotation so as to thereby cause said target to rapidly cool; and repositioning said cooled target with new workpieces to said ion bombardment and implantation position wherein said cooled target functions as a heat sink to said workpieces during ion bombardment and implantation thereof.
Claim 10
Dependent Claim
126 words
A process for cooling the target of an ion bombardment and implantation apparatus to prevent large thermal buildup in said target over successive cycles of operation, comprising: removing a heated target from the ion bombardment and implantation confronting position and positioning said target in atmosphere; rotating said heated target in atmosphere to cause air to flow outwardly over the surfaces thereof through the action of a pattern of air fins drawing said air through a pattern of holes around the axis of rotation so as to thereby cause said target to rapidly cool; and repositioning said cooled target with new workpieces to said ion bombardment and implantation position wherein said cooled target functions as a heat sink to said workpieces during ion bombardment and implantation thereof.
Claim 11
Dependent Claim
32 words
The process as set forth in claim 6 wherein said step of rotating said target in atmosphere occurs prior to unloading from said target processed workpieces and loading thereon said new workpieces.
Claim 12
Dependent Claim
23 words
The process as set forth in claim 7 wherein said step of rotating said target comprises rotating said target at approximately 2,200 rpm's.
Claim 13
Dependent Claim
130 words
Target apparatus for holding workpieces for ion bombardment and implantation comprising: disc means having a target surface and back surface and having an inner hub region and an outer target region with said inner hub region and outer target region being divided by a pattern of air passages generally concentric to the hub region for reducing the conductive cross-section between hub region and target region and for allowing air to pass from the target surface side of said disc means to the back surface side thereof, said disc means further including a pattern of air fins extending generally from said hub region outwardly toward the periphery of said disc means so as to cause air to be drawn through said air passages when said disc means is rotating in atmosphere.
Claim 14
Dependent Claim
130 words
Target apparatus for holding workpieces for ion bombardment and implantation comprising: disc means having a target surface and back surface and having an inner hub region and an outer target region with said inner hub region and outer target region being divided by a pattern of air passages generally concentric to the hub region for reducing the conductive cross-section between hub region and target region and for allowing air to pass from the target surface side of said disc means to the back surface side thereof, said disc means further including a pattern of air fins extending generally from said hub region outwardly toward the periphery of said disc means so as to cause air to be drawn through said air passages when said disc means is rotating in atmosphere.
Claim 15
Dependent Claim
163 words
In an ion bombardment and implantation apparatus for ion bombarding and implanting workpieces supported by a rotating target means, the improvement comprising: disc means for supporting said workpieces having a target surface and back surface and having an inner hub region and an outer target region with said inner hub region and outer target region being divided by a pattern of airholes generally concentric to the hub region for reducing the conductive cross-section between hub region and target region and for allowing air to pass from the target surface side of said disc means to the back surface side thereof, said disc means further having a pattern of air fin means extending generally from said hub region outwardly toward the periphery of said disc means so as to cause air to be drawn through said airholes when said disc means is rotating in atmosphere; control means for positioning said disc means in atmosphere; and means to rotate said disc in atmosphere for cooling.
Claim 16
Dependent Claim
163 words
In an ion bombardment and implantation apparatus for ion bombarding and implanting workpieces supported by a rotating target means, the improvement comprising: disc means for supporting said workpieces having a target surface and back surface and having an inner hub region and an outer target region with said inner hub region and outer target region being divided by a pattern of airholes generally concentric to the hub region for reducing the conductive cross-section between hub region and target region and for allowing air to pass from the target surface side of said disc means to the back surface side thereof, said disc means further having a pattern of air fin means extending generally from said hub region outwardly toward the periphery of said disc means so as to cause air to be drawn through said airholes when said disc means is rotating in atmosphere; control means for positioning said disc means in atmosphere; and means to rotate said disc in atmosphere for cooling.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-01-27 | 1984-07-28 | 1985-01-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-01-27 | 1988-07-28 | 1989-01-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-01-27 | 1992-07-28 | 1993-01-27 | $7700.00 | Window Closed / Lapsed |