US4243744A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Microwave curing of photoresist films
Assignee: McDonnell Douglas Corp
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Filing: 1978-12-22
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Granted: 1981-01-06
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Expires: 1998-12-22
Abstract
Abstract Microwave curing of photoresist films employed in processing semiconductor wafers provides an alternative to conventional drying techniques. The time of curing may be reduced from about 20 to 25 minutes required for conventional air drying to about 5 minutes employing microwave curing. Further, the photoresist film is the only part of the semiconductor assembly that experiences elevated temperatures. The remainder of the wafer remains near ambient conditions, without experiencing possible deleterious effects as a consequence of the high temperature processing.
Inventors
- 👤 Harry F. Lockwood
- 👤 Thomas F. McGee
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 00:46
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/16; G03F7/168; Y; Y10; Y10S; Y10S430/00; Y10S430/136
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
111 words
A process for curing at least a portion of a photoresist film which comprises: (a) applying a photoresist film having a thickness of about 1.4 microns to a surface of a substrate wherein said surface comprises an oxide layer; (b) curing the film by subjecting the photoresist-coated substrate to microwave radiation of a nominal power of about 400 watts for a period of time ranging about two minutes to about five minutes; (c) subjecting portions of the photoresist film either to electromagnetic radiation of sufficient intensity or to a beam of appropriately energetic electrons to expose portions of the photoresist film; and (d) developing the photoresist film to remove portions thereof.
Claim 2
Dependent Claim
111 words
A process for curing at least a portion of a photoresist film which comprises: (a) applying a photoresist film having a thickness of about 1.4 microns to a surface of a substrate wherein said surface comprises an oxide layer; (b) curing the film by subjecting the photoresist-coated substrate to microwave radiation of a nominal power of about 400 watts for a period of time ranging about two minutes to about five minutes; (c) subjecting portions of the photoresist film either to electromagnetic radiation of sufficient intensity or to a beam of appropriately energetic electrons to expose portions of the photoresist film; and (d) developing the photoresist film to remove portions thereof.
Claim 3
Dependent Claim
41 words
The process of claim 1 in which following development of the photoresist film, the film is post-cured employing microwave radiation at a nominal power of about 400 watts for a time period ranging from about two minutes to about five minutes.
Claim 4
Dependent Claim
37 words
The process of claim 1 wherein said substrate comprises GaAs having an oxide layer on the surface to be coated with photoresist, said oxide layer being either a natural oxide or a layer of SiO 2 .
Claim 5
Dependent Claim
120 words
A process for preventing developer undercutting in photoresist masks for GaAs semiconductor devices, said process comprising: applying a photoresist film having a thickness of about 1.4 microns to a surface of a substrate comprising GaAs which has a surface region of oxide curing the film by subjecting the photoresist-coated substrate to microwave-radiation of a nominal power of about 400 watts for a period of time ranging about two minutes to about five minutes; exposing portions of the photoresist film either to electromagnetic radiation of sufficient intensity or to a beam of appropriately energetic electrons to expose portions of the photoresist film; and developing the photoresist film to remove portions thereof wherein undercutting of the remaining photoresist film is substantially reduced.
Claim 6
Dependent Claim
120 words
A process for preventing developer undercutting in photoresist masks for GaAs semiconductor devices, said process comprising: applying a photoresist film having a thickness of about 1.4 microns to a surface of a substrate comprising GaAs which has a surface region of oxide curing the film by subjecting the photoresist-coated substrate to microwave-radiation of a nominal power of about 400 watts for a period of time ranging about two minutes to about five minutes; exposing portions of the photoresist film either to electromagnetic radiation of sufficient intensity or to a beam of appropriately energetic electrons to expose portions of the photoresist film; and developing the photoresist film to remove portions thereof wherein undercutting of the remaining photoresist film is substantially reduced.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-01-06 | 1984-07-07 | 1985-01-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-01-06 | 1988-07-07 | 1989-01-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-01-06 | 1992-07-07 | 1993-01-06 | $7700.00 | Window Closed / Lapsed |