Electrolytic stripping bath and process

Claim 2

An electrolytic stripping bath for stripping metal deposits from a different basis metal comprising an aqueous solution having a pH of about 1 to about 14 and containing a halogen compound in an amount sufficient to activate the bath, a stripping component selected from the group consisting of (a) a bath soluble primary, secondary and/or tertiary amine having a carbon content of C 1 to C 8 , (b) a bath soluble inorganic nitrate and/or organic nitro compound and mixtures of (a) and (b), and an inhibiting agent present in an effective amount to inhibit attack of the basis metal comprising a compound selected from the group consisting of glucoheptonic acid, malic acid, and mixtures thereof as well as the Group IA, IIA and ammonium salts thereof.

Claim 3

The stripping bath as defined in claim 1 further including a carboxylic acid buffering agent present in an amount up to about 60 g/l.

Claim 4

The stripping bath as defined in claim 1 further including a carboxylic acid buffering agent present in an amount of about 20 to about 40 g/l.

Claim 5

The stripping bath as defined in claim 2 wherein the carboxylic acid buffering agent is acetic acid.

Claim 6

The stripping bath as defined in claim 1 in which said inhibiting agent comprises glucoheptonic acid, the Group IA, IIA and ammonium salts thereof present in an amount of about 1 g/l up to saturation.

Claim 7

The stripping bath as defined in claim 5 in which said inhibiting agent is present in an amount of about 5 to about 25 g/l.

Claim 8

The stripping bath as defined in claim 1 in which said inhibiting agent comprises malic acid, the Group IA, IIA and ammonium salts thereof present in an amount of about 1 to about 20 g/l.

Claim 9

The stripping bath as defined in claim 1 in which said inhibiting agent comprises a mixture of at least one of (c) glucoheptonic acid, a Group IA, IIA and ammonium salt thereof; and at least one of (d) malic acid, a Group IA, IIA and ammonium salt thereof in which (c) is present in an amount of about 1 g/l up to saturation and (d) is present in an amount of about 1 g/l to about 40 g/l.

Claim 10

The stripping bath as defined in claim 8 in which the weight ratio of (c) to (d) in the bath ranges from about 1:1 up to about 5:1.

Claim 11

The stripping bath as defined in claim 1 in which said halogen compound comprises a bromine compound present in an amount up to about 40 g/l calculated as sodium bromide.

Claim 12

A process for electrolytically stripping metal deposits such as copper, bright and semi-bright nickel, sulfamate nickel, nickel-phosphorous, cadmium, brass, tin, chromium and iron-nickel alloys from a different basis metal which comprises the steps of immersing an object to be stripped in a stripping bath comprising an aqueous solution having a pH of about 1 to about 14 and containing a halogen compound in an amount sufficient to activate the bath, a stripping component selected from the group consisting of (a) a bath soluble primary, secondary and/or tertiary amine having a carbon content of C 1 to C 8 , (b) a bath soluble inorganic nitrate and/or organic nitro compound and mixtures of (a) and (b); and an inhibiting agent present in an effective amount to inhibit attack of the basis metal comprising a compound selected from the group consisting of glucoheptonic acid, malic acid, and mixtures thereof as well as the Group IA, IIA and ammonium salts thereof; anodically charging the object and passing electric current through the solution to a cathode for a period of time to achieve the desired magnitude of stripping of the metal deposit from the object.

Claim 13

A process for electrolytically stripping metal deposits such as copper, bright and semi-bright nickel, sulfamate nickel, nickel-phosphorous, cadmium, brass, tin, chromium and iron-nickel alloys from a different basis metal which comprises the steps of immersing an object to be stripped in a stripping bath comprising an aqueous solution having a pH of about 1 to about 14 and containing a halogen compound in an amount sufficient to activate the bath, a stripping component selected from the group consisting of (a) a bath soluble primary, secondary and/or tertiary amine having a carbon content of C 1 to C 8 , (b) a bath soluble inorganic nitrate and/or organic nitro compound and mixtures of (a) and (b); and an inhibiting agent present in an effective amount to inhibit attack of the basis metal comprising a compound selected from the group consisting of glucoheptonic acid, malic acid, and mixtures thereof as well as the Group IA, IIA and ammonium salts thereof; anodically charging the object and passing electric current through the solution to a cathode for a period of time to achieve the desired magnitude of stripping of the metal deposit from the object.

Claim 14

The process as defined in claim 11 including the further step of controlling the temperature of said stripping bath within a range of about 60 to about 150° F.

Claim 15

The process as defined in claim 11 in which the step of passing electric current through the solution to a cathode is carried out at a current density ranging from about 25 to about 1500 ASF.

Claim 16

The process as defined in claim 11 including the further step of controlling the pH of said bath between about 5.5 and 7.5.

Claim 17

The process as defined in claim 11 in which said inhibiting agent comprises glucoheptonic acid, the Group IA, IIA and ammonium salts thereof present in an amount of about 1 g/l up to saturation.

Claim 18

The process as defined in claim 15 in which said inhibiting agent is present in an amount of about 5 to about 25 g/l.

Claim 19

The process as defined in claim 11 in which said inhibiting agent comprises malic acid, the Group IA, IIA and ammonium salts thereof present in an amount of about 1 to about 20 g/l.

Claim 20

The process as defined in claim 11 in which said inhibiting agent comprises a mixture of at least one of (c) glucoheptonic acid, a Group IA, IIA and ammonium salt thereof; and at least one of (d) malic acid, a Group IA, IIA and ammonium salt thereof in which (c) is present in an amount of about 1 g/l up to saturation and (d) is present in an amount of about 1 to about 40 g/l.

Claim 21

The process as defined in claim 18 in which the weight ratio of (c) to (d) in the bath ranges from about 1:1 up to about 5.1.

Claim 22

The process as defined in claim 11 wherein the stripping bath also contains a carboxylic acid buffering agent present in an amount up to about 60 g/l.

Claim 23

The process as defined in claim 20 wherein the carboxylic acid buffering agent is acetic acid.