US4229560A
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Thermostable nitrogen containing heterocyclic polymers and process for producing
Assignee: Individual
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Filing: 1978-05-30
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Granted: 1980-10-21
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Expires: 1998-05-30
Abstract
Abstract A thermostable heterocyclic polymer constituted by monomer units of the general formula ##STR1## where R 1 and R 2 denote an organic radical having from 2 to 1000 carbon atoms; a radical having 2 to 1000 carbon atoms, containing: 1 to 1000 atoms of Si, and/or 1 to 1000 atoms of F, and/or 1 to 1000 atoms of Cl, and/or 1 to 1000 atoms of Br, and/or 1 to 1000 atoms of N, and/or 1 to 1000 atoms of S, and/or 1 to 1000 atoms of P, and/or 1 to 1000 atoms of B, and/or 1 to 1000 atoms of O, R 1 and R 2 being either the same or different; R 3 ═NH, CH 2 ; R 4 is a radical which, with R 3 ═NH, may be ##STR2## while with R 3 ═CH 2 said radical may be ##STR3##
Inventors
- 👤 Alexei Y. Chernikhov
- 👤 Mikhail N. Yakovlev
- 👤 Valentina B. Lysova
- 👤 Evgeny L. Gefter
- 👤 Nina N. Shmagina
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 20:21
CPC Classifications
C; C08; C08G; C08G73/00; C08G73/06; C08G73/22; C08G73/0622; C08G73/0633; C08G73/0666; C08G73/0672; C08G73/0683; C08G73/0688; C08G73/0694; C08G73/18; C08G75/00; C08G75/32
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
140 words
A thermostable heterocyclic polymer, consisting essentially of units having the general formula ##STR122## where R 1 and R 2 denote an organic radical selected from the group consisting of radicals which incorporate from 2 to 1000 carbon atoms and; a radical selected from the group consisting of radicals which have from 2 to 1000 carbon atoms; said radical containing at least one of the following elements: Si, F, Cl, Br, N, S, P, B, O, each of said elements being present in an amount of from 1 to 1000 atoms; R 3 is a radical selected from the group consisting of NH and, CH 2 ; R 4 is a radical which (with R 3 ═NH) is selected from the group, consisting of ##STR123## while with R 3 ═CH 2 said radical is selected from the group consisting of ##STR124##
Claim 2
Dependent Claim
140 words
A thermostable heterocyclic polymer, consisting essentially of units having the general formula ##STR122## where R 1 and R 2 denote an organic radical selected from the group consisting of radicals which incorporate from 2 to 1000 carbon atoms and; a radical selected from the group consisting of radicals which have from 2 to 1000 carbon atoms; said radical containing at least one of the following elements: Si, F, Cl, Br, N, S, P, B, O, each of said elements being present in an amount of from 1 to 1000 atoms; R 3 is a radical selected from the group consisting of NH and, CH 2 ; R 4 is a radical which (with R 3 ═NH) is selected from the group, consisting of ##STR123## while with R 3 ═CH 2 said radical is selected from the group consisting of ##STR124##
Claim 3
Dependent Claim
494 words
A process for producing thermostable heterocyclic polymers, consisting essentially of units of the general formula ##STR125## where R 1 and R 2 stand for an organic radical selected from the group consisting of radicals which have from 2 to 1000 carbon atoms and; a radical selected from the group consisting of radicals which have from 2 to 1000 carbon atoms; said radical containing at least one of the following elements: Si, F, Cl, Br, N, S, P, B, O, each of said elements being present in an amount of from 1 to 1000 atoms; R 3 is a radical selected from the group consisting of NH, and CH 2 ; R 4 is a radical which (with R 3 ═NH) is selected from the group consisting of ##STR126## ##STR127## while with R 3 ═CH 2 said radical is selected from the group consisting of ##STR128## which comprises effecting interaction at a temperature of from 90° to 400° C. between the compounds having the general formula X.sub.n --R.sup.1 --Y.sub.m where X is a radical selected from the group consisting of CN and CCH; Y is a radical selected from the group consisting of NH 2 , OH, SH, NCO, NSO, NCS, and X being in the alpha-, beta-, ortho- or peri-position with respect to Y; N>1; m>1; R 1 is an organic radical selected from the group consisting of radicals which have from 2 to 1000carbon atoms; said radical contains at least one of the following elements: Si, F, Cl, Br, N, S, P, B, O, each of said elements being present in an amount of from 1 to 1000 atoms, with polyfunctional compounds of the general formula R.sup.2 --Zp, where R 2 is an organic radical selected from the group consisting of radicals which have from 2 to 1000 carbon atoms; and a radical selected from the group consisting of radicals which have from 2 to 1000 carbon atoms; said radical contains at least one of the following elements: Si, F, Cl, Br, N, S, P, B, O, each of said elements being present in an amount of from 1 to 1000 atoms; Z is a radical selected from the group consisting of NH 2 , OH, SH, NCO, NCS, and NSO; with X═CN and Y being a radical selected from the group consisting of NH 2 and OH, Z is a radical selected from the group consisting of NSO and NCS; with X═CN and Y═SH, Z is radical selected from the group consisting of NCO, NSO and NCS; with X being selected from the group consisting of CN and CCH, and Y being selected from the group consisting of NCO, NSO and NCS, Z is a radical selected from the group consisting of NH 2 , OH and SH; with X═CCH and Y being a radical selected from the group consisting of NH 2 , OH, and SH, Z is a radical selected from the group consisting of NCO, NCS and NSO; p≧2.
Claim 4
Dependent Claim
494 words
A process for producing thermostable heterocyclic polymers, consisting essentially of units of the general formula ##STR125## where R 1 and R 2 stand for an organic radical selected from the group consisting of radicals which have from 2 to 1000 carbon atoms and; a radical selected from the group consisting of radicals which have from 2 to 1000 carbon atoms; said radical containing at least one of the following elements: Si, F, Cl, Br, N, S, P, B, O, each of said elements being present in an amount of from 1 to 1000 atoms; R 3 is a radical selected from the group consisting of NH, and CH 2 ; R 4 is a radical which (with R 3 ═NH) is selected from the group consisting of ##STR126## ##STR127## while with R 3 ═CH 2 said radical is selected from the group consisting of ##STR128## which comprises effecting interaction at a temperature of from 90° to 400° C. between the compounds having the general formula X.sub.n --R.sup.1 --Y.sub.m where X is a radical selected from the group consisting of CN and CCH; Y is a radical selected from the group consisting of NH 2 , OH, SH, NCO, NSO, NCS, and X being in the alpha-, beta-, ortho- or peri-position with respect to Y; N>1; m>1; R 1 is an organic radical selected from the group consisting of radicals which have from 2 to 1000carbon atoms; said radical contains at least one of the following elements: Si, F, Cl, Br, N, S, P, B, O, each of said elements being present in an amount of from 1 to 1000 atoms, with polyfunctional compounds of the general formula R.sup.2 --Zp, where R 2 is an organic radical selected from the group consisting of radicals which have from 2 to 1000 carbon atoms; and a radical selected from the group consisting of radicals which have from 2 to 1000 carbon atoms; said radical contains at least one of the following elements: Si, F, Cl, Br, N, S, P, B, O, each of said elements being present in an amount of from 1 to 1000 atoms; Z is a radical selected from the group consisting of NH 2 , OH, SH, NCO, NCS, and NSO; with X═CN and Y being a radical selected from the group consisting of NH 2 and OH, Z is a radical selected from the group consisting of NSO and NCS; with X═CN and Y═SH, Z is radical selected from the group consisting of NCO, NSO and NCS; with X being selected from the group consisting of CN and CCH, and Y being selected from the group consisting of NCO, NSO and NCS, Z is a radical selected from the group consisting of NH 2 , OH and SH; with X═CCH and Y being a radical selected from the group consisting of NH 2 , OH, and SH, Z is a radical selected from the group consisting of NCO, NCS and NSO; p≧2.
Claim 5
Dependent Claim
32 words
A process as claimed in claim 2, wherein said compounds, containing groups selected from the nitrile and ethynyl groups, are made to react with said polyfunctional compounds in an inert gas atmosphere.
Claim 6
Dependent Claim
29 words
A process as claimed in claim 2, wherein said compounds, containing groups selected from the nitrile and ethynyl groups are made to react with said polyfunctional compounds under vacuum.
Claim 7
Dependent Claim
33 words
A process as claimed in claim 2, wherein said compounds, containing groups selected from the nitrile and ethynyl groups, are made to react with said polyfunctional compounds in the presence of a solvent.
Claim 8
Dependent Claim
36 words
A process as claimed in claim 5, wherein the solvent employed is selected from the group consisting of acetone, methylethylketone, pyridine, acetonitrile, acrylonitrile, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone-2, tetrahydrofuran, toluene, xylene, chloroform, dimethylsulphoxide, hexamethylphosphortriamide, or a mixture thereof.
Claim 9
Dependent Claim
33 words
A process as claimed in claim 2, wherein said compounds, containing groups selected from the nitrile and ethynyl groups, are made to react with said polyfunctional compounds in the presence of a catalyst.
Claim 10
Dependent Claim
24 words
A process as claimed in claim 7, the catalyst employed is selected from the group consisting of triethylamine, N,N--dimethylaniline, N,N-diethylaniline, ethylacetate and diethyl ether.
References Cited (Backward Citations)
US3657186A
Cited
US3674749A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1983-10-21 | 1984-04-21 | 1984-10-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1987-10-21 | 1988-04-21 | 1988-10-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1991-10-21 | 1992-04-21 | 1992-10-21 | $7700.00 | Window Closed / Lapsed |