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US4225875A Expired / Lapsed US ⏱️ 0.0 years remaining

Short channel MOS devices and the method of manufacturing same

Assignee: RCA Corp
•
Filing: 1978-04-19
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Granted: 1980-09-30
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Expires: 1998-04-19
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Abstract

Abstract A short channel MOS transistor and the method for fabricating same is described wherein the dopant concentrations of the source and drain regions are maintained at different levels of conductivity modifiers. The method described teaches first doping the source region while maintaining the drain region masked and then doping both the source and drain regions.

Inventors

  • 👤 Alfred C. Ipri

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 05:14
CPC Classifications
H; H10; H10D; H10D62/00; H10D62/10; H10D62/13; H10D62/149; H10D62/151; H10D30/00; H10D30/01; H10D30/021; H10D30/031; H10D30/0312; H10D30/0314; H10D30/0321; H10D30/0323; H10D30/0327; H10D30/60; H10D30/67; H10D30/6704; H10D30/6713; H10D30/6715; H10D30/6717; H10D30/6729; H10D30/673

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 154 words
In an improved semiconductor device having a body of semiconductor material of a first conductivity type; first and second regions of an opposite conductivity type sharing a common boundary surface on the body of semiconductor material; a channel region of the first conductivity type, intermediate the first and second regions and sharing the common boundary surface; a layer of gate insulator positioned over the channel region; and a layer of conductive material positioned solely over the channel region on the layer of gate insulator, the layer of conductive material and gate insulator defining a gate member; the improvement comprising; discrete ohmic connections to the gate member, the first region and the second region; the first and second opposite conductivity regions having the same type of conductivity modifiers therein; and the first opposite conductivity region having a concentration of conductivity modifiers therein about two orders of magnitude higher than the second opposite conductivity type region.
Claim 2
Dependent Claim 154 words
In an improved semiconductor device having a body of semiconductor material of a first conductivity type; first and second regions of an opposite conductivity type sharing a common boundary surface on the body of semiconductor material; a channel region of the first conductivity type, intermediate the first and second regions and sharing the common boundary surface; a layer of gate insulator positioned over the channel region; and a layer of conductive material positioned solely over the channel region on the layer of gate insulator, the layer of conductive material and gate insulator defining a gate member; the improvement comprising; discrete ohmic connections to the gate member, the first region and the second region; the first and second opposite conductivity regions having the same type of conductivity modifiers therein; and the first opposite conductivity region having a concentration of conductivity modifiers therein about two orders of magnitude higher than the second opposite conductivity type region.
Claim 3
Dependent Claim 19 words
The improved semiconductor of claim 1, wherein: the first and second opposite conductivity regions are source and drain regions.
Claim 4
Dependent Claim 33 words
The improved semiconductor of claim 1, wherein: the body of semiconductor material is deposited on an insulative substrate, the substrate being selected from the group consisting of sapphire, spinel and monocrystalline beryllium oxide.
Claim 5
Dependent Claim 19 words
The improved semiconductor of claim 3, wherein: the first and second opposite conductivity regions are source and drain regions.
Claim 6
Dependent Claim 29 words
The improved semiconductor of claim 4 wherein the concentration of conductivity modifiers in the source region is about two orders of magnitude higher than that of the drain region.

References Cited (Backward Citations)

US4124933A Cited
US4089712A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1983-09-30 1984-03-31 1984-09-30 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1987-09-30 1988-03-31 1988-09-30 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1991-09-30 1992-03-31 1992-09-30 $7700.00 Window Closed / Lapsed

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