US4224897A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Methods of depositing materials on substrates
Assignee: Ricardo AEA Ltd
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Filing: 1978-09-18
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Granted: 1980-09-30
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Expires: 1998-09-18
Abstract
Abstract A vapor deposition process which is carried out in a gaseous environment. The homogeneous nucleation of the vapor species in the gaseous environment is suppressed by heating the gaseous environment.
Inventors
- 👤 Ronald A. Dugdale
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 15:40
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3407; C23C14/24; C23C14/28; C23C14/30
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
215 words
A vapor deposition apparatus for evaporating a material in a gaseous environment and depositing the evaporated material on a substrate, the apparatus comprising, (a) an outer enclosure; (b) an outer enclosure located within the outer enclosure, the outer enclosure and the inner enclosure each maintaining a gaseous environment therein; (c) an inlet for a gas into the inner enclosure; (d) a gas outlet from the inner enclosure to discharge into the outer enclosure; (e) a gas outlet from the outer enclosure; (f) means for supporting a material to be vaporized in the inner enclosure; and (g) means outside the inner enclosure for generating a beam of charged particles and for selectively directing the beam through the inner enclosure at the material supporting means so as to vaporize the material supported thereby, and periodically directing the beam at the outside of a wall of the inner enclosure so as to heat said wall to a temperature such that, in use of the apparatus, the gas in the inner enclosure, at least in the region between the material to be vaporized and a substrate to be coated with the material, is heated by said heated wall to a temperature high enough to suppress homogeneous nucleation of particles of the vaporized material in the gas in said region.
Claim 2
Dependent Claim
215 words
A vapor deposition apparatus for evaporating a material in a gaseous environment and depositing the evaporated material on a substrate, the apparatus comprising, (a) an outer enclosure; (b) an outer enclosure located within the outer enclosure, the outer enclosure and the inner enclosure each maintaining a gaseous environment therein; (c) an inlet for a gas into the inner enclosure; (d) a gas outlet from the inner enclosure to discharge into the outer enclosure; (e) a gas outlet from the outer enclosure; (f) means for supporting a material to be vaporized in the inner enclosure; and (g) means outside the inner enclosure for generating a beam of charged particles and for selectively directing the beam through the inner enclosure at the material supporting means so as to vaporize the material supported thereby, and periodically directing the beam at the outside of a wall of the inner enclosure so as to heat said wall to a temperature such that, in use of the apparatus, the gas in the inner enclosure, at least in the region between the material to be vaporized and a substrate to be coated with the material, is heated by said heated wall to a temperature high enough to suppress homogeneous nucleation of particles of the vaporized material in the gas in said region.
Claim 3
Dependent Claim
94 words
Apparatus according to claim 1 wherein the gas is an ionizable gas maintained at a pressure that will enable a glow discharge to be generated in the gas, and means are provided for generating a glow discharge in the gas comprising an anode, a cathode located in the enclosure, and a power supply means for applying an electrical potential to the anode and cathode in order to ionize the gas, at least part of the cathode being made of the material to be deposited and constituting the source of the material to be deposited.
Claim 4
Dependent Claim
36 words
Apparatus according to claim 2 wherein the cathode is shaped and positioned relative to the anode and the substrate so as to direct secondary electrons emitted by the cathode at the substrate thereby to heat it.
Claim 5
Dependent Claim
40 words
Apparatus according to claim 2 wherein the cathode is a hollow circular cylinder at least the inner surface of which is made of the material to be deposited and the substrate is located concentrically in the bore of the cathode.
Claim 6
Dependent Claim
15 words
Apparatus according to claim 2 wherein the cathode is made of layers of different materials.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1983-09-30 | 1984-03-31 | 1984-09-30 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1987-09-30 | 1988-03-31 | 1988-09-30 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1991-09-30 | 1992-03-31 | 1992-09-30 | $7700.00 | Window Closed / Lapsed |