US4220116A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Reactant gas flow structure for a low pressure chemical vapor deposition system
Assignee: Unisys Corp
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Filing: 1978-10-30
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Granted: 1980-09-02
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Expires: 1998-10-30
Abstract
Abstract A structure for a low-pressure chemical vapor deposition system which achieves greater uniformity of deposition. The structure includes injection means designed to provide more uniform distribution of the reactant gases injected into the system, as well as means to control the gas flow across the surfaces of the respective wafers and then the exhaust of those gases from the system. To this end, plenums which run the length of the deposition chamber beneath or to the side of the wafers are provided with openings arranged in a non-uniform manner to achieve this uniform injection. Furthermore, the wafer support or boat is provided with means to disperse concentrations of the reactant gases so as to provide more uniformity of the gas flow across the surfaces of the wafers.
Inventors
- 👤 Arthur K. Hochberg
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 09:32
CPC Classifications
C; C30; C30B; C30B25/00; C30B25/02; C30B25/14; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45563; C23C16/45578; C30B25/12; C30B33/00; C30B33/005
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
125 words
In a low pressure chemical vapor deposition system having a chamber, said chamber having an axis, the structure comprising; a wafer support structure to support a crystalline wafer, said structure being mounted in said chamber parallel to said axis; and a plenum mounted in said chamber parallel to said axis and to one side of said wafer support structure, said plenum being provided with aperture means for injecting a reactant gas into said chamber to provide a uniform distribution of said gas along the axis of said chamber; said wafer support structure including a plurality of rods mounted parallel to said axis and surrounding at least a portion of said wafer so as to disperse the reactant gas as it flows across the wafer surface.
Claim 2
Dependent Claim
125 words
In a low pressure chemical vapor deposition system having a chamber, said chamber having an axis, the structure comprising; a wafer support structure to support a crystalline wafer, said structure being mounted in said chamber parallel to said axis; and a plenum mounted in said chamber parallel to said axis and to one side of said wafer support structure, said plenum being provided with aperture means for injecting a reactant gas into said chamber to provide a uniform distribution of said gas along the axis of said chamber; said wafer support structure including a plurality of rods mounted parallel to said axis and surrounding at least a portion of said wafer so as to disperse the reactant gas as it flows across the wafer surface.
Claim 3
Dependent Claim
42 words
A structure according to claim 1 further including: a second plenum mounted in said chamber parallel to said axis and to one side of said wafer support structure and provided with aperture means for injecting a second reactant gas into said chamber.
Claim 4
Dependent Claim
53 words
A structure according to claim 1 further including: means to provide said reactant gas to said plenum from one end thereof; said aperture means including a wedge shaped slot beginning at a zero width toward the end where the gas is entered and uniformly increasing to a maximum width toward the other end.
Claim 5
Dependent Claim
48 words
A structure according to claim 1 further including: means to enter said reactant gas into said plenum from both ends thereof; said aperture means including a double wedge shaped slot beginning at zero width at each end and uniformly increasing to a maximum width in the center thereof.
Claim 6
Dependent Claim
37 words
A structure according to claim 1 wherein: the gas pressure in said chamber is between approximately 100 millitorr and 20 torr and the pressure of the reactant gas in plenum is between 1500 millitorr and 100 torr.
Claim 7
Dependent Claim
30 words
A structure according to claim 5 wherein: said wafer support structure supports said wafer with the wafer edge opposite said plenum between 3 and 10 mils from said chamber surface.
Claim 8
Dependent Claim
18 words
A structure according to claim 5 wherein: said parallel rods are spaced approximately 3 to 6 millimeters apart.
Claim 9
Dependent Claim
66 words
In a low pressure chemical vapor deposition system, the structure comprising: a chamber having an axis; and a plenum mounted in said chamber parallel to said axis and to one side of said chamber said plenum being provided with aperture means for injecting a reactant gas at subatmospheric pressure into said chamber to provide a uniform distribution of said gas along the axis of said chamber.
Claim 10
Dependent Claim
66 words
In a low pressure chemical vapor deposition system, the structure comprising: a chamber having an axis; and a plenum mounted in said chamber parallel to said axis and to one side of said chamber said plenum being provided with aperture means for injecting a reactant gas at subatmospheric pressure into said chamber to provide a uniform distribution of said gas along the axis of said chamber.
Claim 11
Dependent Claim
56 words
A structure according to claim 8 further including: means to provide said reactant gas to said plenum from one end thereof; said aperture means including a wedge shaped slot beginning at the zero width toward the end where the gas is entered into said plenum and uniformly increasing to a maximum width toward the other end.
Claim 12
Dependent Claim
50 words
A structure according to claim 8 further including: means to enter said reactant gas into said plenum from both ends thereof; said aperture means including a double wedge shaped slot beginning at zero width toward each end and uniformly increasing in width to a maximum width in the center thereof.
Claim 13
Dependent Claim
104 words
In a low pressure chemical vapor deposition system, having a chamber, said chamber having an axis, the structure comprising: a wafer support structure to support a crystalline wafer, said structure being mounted in said chamber parallel to said axis; and a plenum mounted in said chamber parallel to said axis and to one side of said wafer support structure to inject a reactant gas into said chamber; said wafer support structure including a plurality of rods mounted parallel to said axis and surrounding at least a portion of said wafer so as to disperse the reactant gas as it flows across the wafer surface.
Claim 14
Dependent Claim
104 words
In a low pressure chemical vapor deposition system, having a chamber, said chamber having an axis, the structure comprising: a wafer support structure to support a crystalline wafer, said structure being mounted in said chamber parallel to said axis; and a plenum mounted in said chamber parallel to said axis and to one side of said wafer support structure to inject a reactant gas into said chamber; said wafer support structure including a plurality of rods mounted parallel to said axis and surrounding at least a portion of said wafer so as to disperse the reactant gas as it flows across the wafer surface.
Claim 15
Dependent Claim
30 words
A structure according to claim 11 wherein: said wafer support structure supports said wafer with the wafer edge opposite said plenum between 3 and 10 mils from said chamber surface.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1983-09-02 | 1984-03-03 | 1984-09-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1987-09-02 | 1988-03-03 | 1988-09-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1991-09-02 | 1992-03-03 | 1992-09-02 | $7700.00 | Window Closed / Lapsed |