Abstract A source of hydrogen ions is disclosed and includes a chamber having at one end a cathode which provides electrons and through which hydrogen gas flows into the chamber. Screen and accelerator grids are provided at the other end of the chamber. A baffle plate is disposed between the cathode and the grids and a cylindrical baffle is disposed coaxially with the cathode at the one end of the chamber. The cylindrical baffle is of greater diameter than the baffle plate to provide discharge impedance and also to protect the cathode from ion flux. An anode electrode draws the electrons away from the cathode. The hollow cathode includes a tubular insert of tungsten impregnated with a low work function material to provide ample electrons. A heater is provided around the hollow cathode to initiate electron emission from the low work function material.
In a hydrogen ion source of the type comprising a chamber with an electron emitting cathode at the closed end thereof, an accelerator grid at the other end and an anode between the cathode and the accelerator grid, a screen grid being disposed between the anode and the accelerator grid, the improvement comprising: a cylindrical metal baffle disposed coaxially around said cathode abutting said closed end; a baffle disc positioned on the axis of said cathode, said disc being of smaller diameter than said cylindrical baffle, said disc being centered in said cylindrical baffle at the end opposite said closed end of the ion source; said cathode comprising a porous tungsten tube impregnated with a low work function material and having an orifice plate at one end inwardly of the closed end of said ion source; means for heating said tungsten tube to cause electron emission comprising heating coils swaged onto the outside of said cathode tube and a plurality of isolated layers of refractory metal foil disposed around the outside of said heating coils to efficiently heat the porous tube; and wherein hydrogen flows from a hydrogen supply through said cathode into said ion source; a set of electromagnets to adjust discharge impedance and ionization efficiency and means for ionizing hydrogen flowing into said hydrogen ion source through said cathode.
Claim 2
Dependent Claim
221 words
In a hydrogen ion source of the type comprising a chamber with an electron emitting cathode at the closed end thereof, an accelerator grid at the other end and an anode between the cathode and the accelerator grid, a screen grid being disposed between the anode and the accelerator grid, the improvement comprising: a cylindrical metal baffle disposed coaxially around said cathode abutting said closed end; a baffle disc positioned on the axis of said cathode, said disc being of smaller diameter than said cylindrical baffle, said disc being centered in said cylindrical baffle at the end opposite said closed end of the ion source; said cathode comprising a porous tungsten tube impregnated with a low work function material and having an orifice plate at one end inwardly of the closed end of said ion source; means for heating said tungsten tube to cause electron emission comprising heating coils swaged onto the outside of said cathode tube and a plurality of isolated layers of refractory metal foil disposed around the outside of said heating coils to efficiently heat the porous tube; and wherein hydrogen flows from a hydrogen supply through said cathode into said ion source; a set of electromagnets to adjust discharge impedance and ionization efficiency and means for ionizing hydrogen flowing into said hydrogen ion source through said cathode.
Claim 3
Dependent Claim
22 words
The ion source of claim 1 wherein said baffle disc is from about 50% to 75% the diameter of said cylindrical baffle.
Claim 4
Dependent Claim
42 words
The ion source of claim 1 wherein said tungsten tube is inside a refractory metal cathode tube with a layer of electrically conductive refractory metal therebetween, said cathode tube having an annular radiation flange at one end and surrounding said orifice plate.
Claim 5
Dependent Claim
16 words
The ion source of claim 1 wherein said low work function material is barium calcium aluminate.
Claim 6
Dependent Claim
36 words
The ion source of claim 1 wherein said cylindrical baffle, said baffle disc and said anode are of refractory metal and are each thermally isolated from the electromagnets by a plurality of layers of radiation shielding.
Claim 7
Dependent Claim
17 words
The ion source of claim 1 wherein said radiation shielding is by separated layers of tantalum foil.