Deposition method for coating glass and the like

Claim 2

A process for continuous coating of a substrate with a film formed of reactive components of a gas mixture in which properties of the film vary continuously through the thickness of said film, said process comprising the steps of (a) flowing said gas mixture through a flow path defined by a reaction zone for said reactive components, said reaction zone contiguous to and bounded by a surface of the substrate to be coated, (b) moving said substrate surface through said reaction zone in a direction parallel to said flowing gas mixture, (c) depositing, preferentially, a reaction product derived from more reactive components of said mixture on said surface of said substrate exposed earlier to said gas mixture, thereby preferentially depleting said mixture of said more reactive components, (d) depositing, preferentially, a reaction product derived from less reactive components of said mixture on said surface of said substrate exposed later to said depleted gas mixture, thus (e) providing a product in which properties of said film vary continuously in the composition through the thickness of said film, as said substrate emerges from said reaction zone.

Claim 3

A process as in claim 1 in which said substrate is composed of glass.

Claim 4

A process as in claim 1 in which said reaction products are produced by reaction of said gases induced by heat from said substrate.

Claim 5

A procss as in claim 1 in which refractive index varies continuously from bottom to top through said coating.

Claim 6

A process as in claim 4 in which said gas mixture includes volatile silicon and tin compounds and an oxidizing gas.

Claim 7

A process as in claim 5 in which said gas mixture includes at least one partially alkylated polysilane, an organotin vapor, and an oxidizing gas.

Claim 8

A process as in claim 6 in which said gas mixture contains at least one methyldisilane and also tetramethyltin.

Claim 9

A process as in claim 7 in which said gas mixture contains 1,1,2,2 tetramethyldisilane; 1,1,2 trimethyldisilane; 1,2 dimethyldisilane or mixtures thereof.

Claim 10

A process as in claim 2 in which refractive index varies continuously from bottom to top through said coating.

Claim 11

A process as in claim 2 in which said gas mixture includes volatile silicon and tin compounds and an oxidizing gas.

Claim 12

A process as in claim 2 in which said gas mixture includes at least one partially alkylated polysilane, an organotin vapor, and an oxidizing gas.

Claim 13

A process as in claim 2 in which said gas mixture contains at least one methyldisilane and tetramethyltin.

Claim 14

A process as in claim 2 in which said gas mixture contains 1,1,2,2 tetramethyldisilane, HMe 2 SiSiMe 2 H; 1,1,2 trimethyldisilane H 2 MeSiSiMe 2 H; 1,2 dimethyldisilane H 2 MeSiSiMeH 2 or mixtures thereof.

Claim 15

A process as in claim 2 in which said reaction products are produced by reaction of said gases induced by heat from said substrate.

Claim 16

A process as in claim 3 in which refractive index varies continuously from bottom to top through said coating.

Claim 17

A process as defined in claim 10 wherein the proportions of said reactive components are so selected to achieve a coating composition proximate to said substrate of at least 60% SiO 2 and a coating composition most remote from said substrate of at least 95% tin oxide.

Claim 18

A process for forming, on a substrate, a thin coating which has a progressively changing composition from a predominantly first coating composition nearer the substrate to a predominantly second coating composition more remote from the substrate, said process comprising the steps of (1) introducing into a first end of a reactant chamber and out the other end of said chamber a mixture of (a) a first reactant gas from which said first coating is formed, (b) a second reactant gas from which said second coating compound is formed, and (c) a third gas which forms means to react with each of said first and second reactant gases to form said coating compounds, wherein said first reactant gas reacts at a substantially different rate with said third gas, than does said second reactant gas, the different rates of reaction with said third gas forming means to provide a difference in relative concentration of said reactant gases over the substrate as the thin coating is formed and to provide a changing ratio of said first and second coating compounds in said thin coating as said thin coating is formed on said substrate, (2) said introduction of gases being carried out while continuously passing a substrate to be coated through said reaction chamber from said first end of the chamber to said other end of the chamber.

Claim 19

A process for forming, on a substrate, a thin coating which has a progressively changing composition from a predominantly first coating composition nearer the substrate to a predominantly second coating composition more remote from the substrate, said process comprising the steps of (1) introducing into a first end of a reactant chamber and out the other end of said chamber a mixture of (a) a first reactant gas from which said first coating is formed, (b) a second reactant gas from which said second coating compound is formed, and (c) a third gas which forms means to react with each of said first and second reactant gases to form said coating compounds, wherein said first reactant gas reacts at a substantially different rate with said third gas, than does said second reactant gas, the different rates of reaction with said third gas forming means to provide a difference in relative concentration of said reactant gases over the substrate as the thin coating is formed and to provide a changing ratio of said first and second coating compounds in said thin coating as said thin coating is formed on said substrate, (2) said introduction of gases being carried out while continuously passing a substrate to be coated through said reaction chamber from said first end of the chamber to said other end of the chamber.

Claim 20

A process as defined in claim 1, 2, 3, 12, 13, 16 or 17 wherein said reaction products are deposited at such a rate that said change in the coating composition is monotonic resulting in a gradual increase of the refractive index of said coating as the thickness of said coating on said substrate increases.

Claim 21

A process as defined in claim 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 12, 13, 14, 16, or 17 comprising the step of terminating said coating operation with an infra-red reflective overlay of tin oxide and wherein the total coating thickness is from about 0.1 to 1.0 micron thick.

Claim 22

A process as defined in claim 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 12, 13, 14, 16, or 17 wherein said coating is of such a thickness that it forms means to suppress visible iridescence, on the surface of a product of said process, as defined by a maximum Color Index value of about 12.