Abstract The method resides in that silicon tetrafluoride is subjected to water hydrolysis in the presence of sulphuric acid, the reactants being in an aerosol state. Hydrolysis is performed at a volume ratio of silicon tetrafluoride to sulphuric acid equal to 40:1-80:1, concentration of sulphuric acid within the range of 45-73 wt. %, and the rate of silicon tetrafluoride flow in the reaction zone of 0.2-4.0 m/sec. The process is run at room temperature and atmospheric pressure. As a result of hydrolysis, silicon dioxide and fluorine-containing sulphuric acid solution are obtained, hydrogen fluoride being extracted from the solution upon heating. The proposed invention makes possible an effective use of silicon tetrafluoride with maximum conversion of the components thereof into end products, separation of the end products taking place simultaneously with the formation thereof. The yield of the products reaches 92-95 wt. % of their content in the initial raw material.
A method of producing hydrogen fluoride and silicon dioxide, comprising the steps of subjecting silicon tetrafluoride to water hydrolysis at a temperature from minus 10° to plus 60° C. in the presence of an aqueous sulphuric acid solution in aerosol form by continuously passing gaseous SiF 4 at a flow rate of 0.2 to 4.0 m/sec into a hydrolysis zone containing said aerosol sulphuric acid solution having a concentration of from 45 to 73 wt. % sulphuric acid wherein the volume ratio of the gaseous SiF 4 to the sulphuric acid is 40:1 to 80:1 to form silicon dioxide and HF; simultaneously separating and withdrawing the silicon dioxide in an aerosol state as a first hydrolysis product and a silicon dioxide-free HF-containing sulphuric acid solution in liquid state and heating said HF-containing sulphuric acid solution at a temperature from 60° to 220° C. to produce hydrogen fluoride as a second hydrolysis product and a sulphuric acid solution which is recirculated to the hydrolysis step.
Claim 2
Independent Claim
164 words
A method of producing hydrogen fluoride and silicon dioxide, comprising the steps of subjecting silicon tetrafluoride to water hydrolysis at a temperature from minus 10° to plus 60° C. in the presence of an aqueous sulphuric acid solution in aerosol form by continuously passing gaseous SiF 4 at a flow rate of 0.2 to 4.0 m/sec into a hydrolysis zone containing said aerosol sulphuric acid solution having a concentration of from 45 to 73 wt. % sulphuric acid wherein the volume ratio of the gaseous SiF 4 to the sulphuric acid is 40:1 to 80:1 to form silicon dioxide and HF; simultaneously separating and withdrawing the silicon dioxide in an aerosol state as a first hydrolysis product and a silicon dioxide-free HF-containing sulphuric acid solution in liquid state and heating said HF-containing sulphuric acid solution at a temperature from 60° to 220° C. to produce hydrogen fluoride as a second hydrolysis product and a sulphuric acid solution which is recirculated to the hydrolysis step.
Claim 3
Dependent Claim
26 words
A method as claimed in claim 1, wherein the silicon tetrafluoride hydrolysis is run at a rate of silicon tetrafluoride flow from 0.7 to 0.9 m/sec.
Claim 4
Dependent Claim
22 words
A method as claimed in claim 1, wherein the silicon tetrafluoride hydrolysis is run at a temperature from +20° to +30° C.
Claim 5
Dependent Claim
17 words
A method as claimed in claim 1, wherein the silicon tetrafluoride hydrolysis is performed under atmospheric pressure.