Photosensitive elastomeric composition and element

Claim 1

A photosensitive elastomeric composition consisting essentially of 30 to 98% by weight of a component (a) comprising at least one thermoplastic elastomeric block copolymer represented by the following general formula: (A--B).sub.n --A, (B--A).sub.n+1 --B, (A--B).sub.n+1 or (A--B).sub.m X wherein A stands for a thermoplastic non-elastomeric polymer block having a glass transition temperature of 25° C. or more and a number average molecular weight of 2,000 to 100,000, B stands for an elastomeric polymer block having a glass transition temperature of 10° C. or less and a number average molecular weight of 25,000 to 1,000,000, X stands for Sn or Si, n is an integer of from 1 to 10, and m is 2 or 4, 1 to 50% by weight of a component (b) comprising at least one ethylenically unsaturated compound represented by the following general formula: ##STR3## wherein R 1 and R 2 , which may be the same or different, stand for a straight chain or branched alkyl group having 2 to 30 carbon atoms, an aryl group which is a phenyl group or a naphthyl group unsubstituted or substituted with one or two straight chain or branched alkyl groups having 1 to 6 carbon atoms or an aralkyl group represented by the formula --CH 2 ) p Ar wherein p is an integer of from 1 to 6 and Ar is a phenyl group unsubstituted or substituted with one or two straight chain or branched alkyl groups having 1 to 3 carbon atoms, and 0.01 to 10% by weight of a component (c) comprising a polymerization initiator.