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US4190446A Expired / Lapsed US ⏱️ 0.0 years remaining

Photocrosslinkable, high-temperature-resistant polymers and their use in color imaging devices

Assignee: Eastman Kodak Co
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Filing: 1978-09-06
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Granted: 1980-02-26
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Expires: 1998-09-06
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Abstract

Abstract Photocrosslinkable, organic solvent-soluble polymers having a Tg greater than 200° C. are disclosed. The polymers contain sufficient radiation-sensitive crosslinkable units to render the polymers insoluble in organic solvents on exposure to radiation to which the crosslinkable units are sensitive. Also disclosed are supports, particularly supports having a radiation-sensitive surface, having thereon a layer of the described photocrosslinkable polymers. The polymers are capable of receiving heat-transferable dyes and are useful in forming color filter arrays for solid-state imaging devices. A particularly convenient method of forming solid-state color imaging devices having a layer containing an array of color filters is also disclosed.

Inventors

  • 👤 Thomas W. Martin
  • 👤 Mohammad A. Sandhu
  • 👤 Dennis J. Savage

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-02 14:15
CPC Classifications
C; C08; C08G; C08G63/00; C08G63/02; C08G63/12; C08G63/52; C08G63/54; C08G63/553; C08G63/68; C08G63/682; C08G65/00; C08G69/00; C08G69/02; C08G75/00; C08G75/24; G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; G03F7/0384

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 225 words
A method of producing a color imaging device, said device comprising: (a) a semiconductive wafer having a surface comprising: (i) an array of charge-handling semiconductive photosensors and (ii) bonding pad areas and (b) a layer of a polymer superimposed with said surface, wherein said polymer layer: (i) contains a planar array of filter elements in microregistration with said array of photosensors, wherein each of said elements contains a heat-transferable dye and (ii) has window areas which correspond with said bonding pad areas, said method comprising the steps of: (1) coating said surface with a layer of a polymer which is a photocrosslinkable organic solvent-soluble condensation polymer having at least two recurring units and a Tg greater than 200° C., wherein said polymer contains sufficient ethylenically unsaturated, cross-linkable units to render said polymer insoluble in organic solvents on exposure to radiation to which said crosslinkable units are sensitive, (2) exposing said polymer layer to a pattern of radiation which represents the negative of said bonding pad areas so as to crosslink said polymer layer except in areas corresponding to said bonding pad areas, (3) contacting said polymer layer with an organic solvent so as to remove said polymer layer in areas corresponding to said bonding pad areas, and (4) transferring dye into said polymer layer so as to form filter elements in microregistration with said photosensors.
Claim 2
Independent Claim 225 words
A method of producing a color imaging device, said device comprising: (a) a semiconductive wafer having a surface comprising: (i) an array of charge-handling semiconductive photosensors and (ii) bonding pad areas and (b) a layer of a polymer superimposed with said surface, wherein said polymer layer: (i) contains a planar array of filter elements in microregistration with said array of photosensors, wherein each of said elements contains a heat-transferable dye and (ii) has window areas which correspond with said bonding pad areas, said method comprising the steps of: (1) coating said surface with a layer of a polymer which is a photocrosslinkable organic solvent-soluble condensation polymer having at least two recurring units and a Tg greater than 200° C., wherein said polymer contains sufficient ethylenically unsaturated, cross-linkable units to render said polymer insoluble in organic solvents on exposure to radiation to which said crosslinkable units are sensitive, (2) exposing said polymer layer to a pattern of radiation which represents the negative of said bonding pad areas so as to crosslink said polymer layer except in areas corresponding to said bonding pad areas, (3) contacting said polymer layer with an organic solvent so as to remove said polymer layer in areas corresponding to said bonding pad areas, and (4) transferring dye into said polymer layer so as to form filter elements in microregistration with said photosensors.
Claim 3
Dependent Claim 40 words
The method according to claim 1 which comprises the additional step of heating the coated wafer at a temperature and for a time sufficient to remove substantially all of the solvent used in coating step (1) and contacting step (3).
Claim 4
Dependent Claim 24 words
The method according to claim 1 which comprises the additional step of coating said wafer with a photocrosslinkable subbing before said coating step (1).
Claim 5
Dependent Claim 89 words
The method according to claim 1 wherein said polymer is a polyester having a Tg greater than 200° C. and represented by the formula: ##STR16## wherein: the value of n is from 10-100 and of m is from 0-100; each of R 1 -R 16 is independently selected from the group consisting of hydrogen, halogen, cyano, alkyl and alkoxy; Y represents sulfonyl, oxy, alkylene of 1-4 carbon atoms, alkylidene or cycloalkylidene; and Ar is selected from the group consisting of m-phenylene, p-phenylene, 4,4'-sulfonyldibenzoate, 1,2,3,4-tetrahydro-2,6-naphthalenedicarboxylate, 4,4'-isopropylidenedibenzoate, 1,4-biphenylenedicarboxylate, 2,6-naphthalenedicarboxylate and 1,1,3-trimethyl-3-phenylindan-5,5'-dicarboxylate.
Claim 6
Dependent Claim 22 words
The method according to claim 1 wherein said dye is transferred into said polymer layer in step (4) through a developed photoresist.
Claim 7
Dependent Claim 38 words
The method according to claim 5 wherein said dye is transferred by placing dye-coated support in contact with said developed photoresist and heating the resulting laminate at a temperature and for a time sufficient to transfer said dye.

References Cited (Backward Citations)

US2681857A Cited
US2750524A Cited
US4081277A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1983-02-25 1983-08-27 1984-02-26 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1987-02-25 1987-08-27 1988-02-26 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1991-02-25 1991-08-27 1992-02-26 $7700.00 Window Closed / Lapsed

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