Process of producing stripe filter

Claim 2

A process for producing a parallel type of stripe filter which comprises the steps of: (a) processing a metal layer (I) formed on the surface of a transparent base plate into predetermined parallel stripes, (b) forming a dichroic layer (I) having pre-determined spectral characteristics on the whole surface of the resulting structure by vapor deposition, (c) forming a metal layer (II) on said dichroic layer (I) by vapor deposition, (d) dissolving said metal layer (I) in the stripe configuration with an etching solution to remove that layer together with the overlying dichroid layer (I) and metal layer (II) deposited thereon, (e) forming a dichroic layer (II) having spectral characteristics different from those of said dichroic layer (I) on the whole surface of the resulting structure by vapor deposition, and (f) dissolving said metal layer (II) with an etching solution to remove that layer together with the dichroic layer (II) deposited thereon, the etching solution used for dissolving said metal layer (II) being different from that used for dissolving said metal layer (I).

Claim 3

A process for producing a parallel type of stripe filter which comprises the steps of: (a) processing a metal layer (I) formed on the surface of a transparent base plate into predetermined parallel stripes, (b) forming a dichroic layer (I) having predetermined spectral characteristics on the whole surface of the resulting structure by vapor deposition, (c) forming a metal layer (II) on said dichroic layer (I) by vapor deposition, (d) dissolving said metal layer (I) in the stripe configuration with an etching solution to remove that layer together with the overlying dichroid layer (I) and metal layer (II) deposited thereon, (e) forming a metal layer (III) on the whole surface of the resulting structure by vapor deposition, (f) forming a photoresist layer on said metal layer (III), and subjecting the resulting structure to exposure, development and etching treatment to remove pre-determined areas in a stripe configuration, of said metal layer (III) directly in contact with said transparent base plate, (g) forming a dichroic layer (II) having spectral characteristic different from those of said dichroic layer (I) on the whole surface of the resulting structure by vapor deposition, (h) forming a metal layer (IV) on the whole surface of said dichroic layer (II) by vapor deposition, (i) dissolving said metal layer (III) with an etching solution to remove that layer together with the overlying dichroic layer (II) and metal layer (IV) deposited thereon, (j) forming a dichroic layer (III) having spectral characteristics different from those of said dichroic layers (I) and (II) on the whole surface of the resulting structure by vapor deposition, and (k) dissolving said metal layers (II) and (IV) with etching solution to remove those layers together with the dichroic layer (III) deposited thereon, the etching solution used for dissolving said metal layer (II) being different from that used for dissolving said metal layer (I), the etching solution used for dissolving said metal layer (III) being different from at least that used for dissolving the metal layer (II), and the etching solution used for dissolving said metal layer (IV) being different from at least that used for dissolving said metal layer (III).

Claim 4

A process for producing a parallel type of stripe filter which comprises the steps of: (a) processing a metal layer (I) formed on the surface of a transparent base plate into predetermined parallel stripes, (b) forming a dichroic layer (I) having predetermined spectral characteristics on the whole surface of the resulting structure by vapor deposition, (c) forming a metal layer (II) on said dichroic layer (I) by vapor deposition, (d) dissolving said metal layer (I) in the stripe configuration with an etching solution to remove that layer together with the overlying dichroid layer (I) and metal layer (II) deposited thereon, (e) forming a metal layer (III) on the whole surface of the resulting structure by vapor deposition, (f) forming a photoresist layer on said metal layer (III), and subjecting the resulting structure to exposure, development and etching treatment to remove pre-determined areas in a stripe configuration, of said metal layer (III) directly in contact with said transparent base plate, (g) forming a dichroic layer (II) having spectral characteristic different from those of said dichroic layer (I) on the whole surface of the resulting structure by vapor deposition, (h) forming a metal layer (IV) on the whole surface of said dichroic layer (II) by vapor deposition, (i) dissolving said metal layer (III) with an etching solution to remove that layer together with the overlying dichroic layer (II) and metal layer (IV) deposited thereon, (j) forming a dichroic layer (III) having spectral characteristics different from those of said dichroic layers (I) and (II) on the whole surface of the resulting structure by vapor deposition, and (k) dissolving said metal layers (II) and (IV) with etching solution to remove those layers together with the dichroic layer (III) deposited thereon, the etching solution used for dissolving said metal layer (II) being different from that used for dissolving said metal layer (I), the etching solution used for dissolving said metal layer (III) being different from at least that used for dissolving the metal layer (II), and the etching solution used for dissolving said metal layer (IV) being different from at least that used for dissolving said metal layer (III).

Claim 5

A process for producing a parallel type of stripe filter which comprises the steps of: (a) forming metal layers (I) and (II), in that order, on a transparent base plate, and forming a photoresist layer on the whole surface of said metal layer (II), and further subjecting the resulting structure to exposure, development and etching treatment to process said metal layer (II) ito predetermined parallel stripes, (b) forming a photoresist layer on the whole surface of the resulting structure, subjecting the structure having said photoresist layer to exposure, development and etching treatment to remove predetermined areas in a parallel stripe configuration, of said metal layer (I), thereby exposing the surface of said transparent base plate in a stripe configuration, and further removing the remaining photoresist layer, (c) forming a dichroic layer (i) having predetermined spectral characteristics on the whole surface of the resulting structure by vapor deposition, (d) forming a metal layer (III) on the whole surface of said dichroic layer (I) by vapor deposition, (e) dissolving said metal layer (II) with etching solution to remove that layer together with the overlying dichroic layer (I) and metal layer (III) deposited thereon, (f) dissolving the exposed areas of said metal layer (I) with etching solution, (g) forming a dichroic layer (II) having spectral characteristics different from that of said dichroic layer (I) on the whole surface of the resulting structure by vapor deposition, (h) forming a metal layer (IV) on the whole surface of said dichroic layer (II) by vapor deposition, (i) dissolving said metal layer (I) with etching solution to remove that layer together with the overlying dichroic layers (I) and (II), and metal layers (III) and (IV), (j) forming a dichroic layer (III) having spectral characteristics different from those of said dichroic layers (I) and (II) on the whole surface of the resulting structure by vapor deposition, and (k) dissolving said metal layers (III) and (IV) with etching solution to remove that layer together with the overlying dichroic layer (II) and dichroic layer (III) deposited thereon, said etching solution used for dissolving said metal layer (I) being different from that for said metal layer (II), said etching solution used for dissolving said metal layer (III) being different from that used for dissolving said metal layers (I) and (II), and said etching solution for said metal layer (IV) being different from at least that used for dissolving said metal layer (I).

Claim 6

A process for producing a parallel type of stripe filter which comprises the steps of: (a) forming metal layers (I) and (II), in that order, on a transparent base plate, and forming a photoresist layer on the whole surface of said metal layer (II), and further subjecting the resulting structure to exposure, development and etching treatment to process said metal layer (II) ito predetermined parallel stripes, (b) forming a photoresist layer on the whole surface of the resulting structure, subjecting the structure having said photoresist layer to exposure, development and etching treatment to remove predetermined areas in a parallel stripe configuration, of said metal layer (I), thereby exposing the surface of said transparent base plate in a stripe configuration, and further removing the remaining photoresist layer, (c) forming a dichroic layer (i) having predetermined spectral characteristics on the whole surface of the resulting structure by vapor deposition, (d) forming a metal layer (III) on the whole surface of said dichroic layer (I) by vapor deposition, (e) dissolving said metal layer (II) with etching solution to remove that layer together with the overlying dichroic layer (I) and metal layer (III) deposited thereon, (f) dissolving the exposed areas of said metal layer (I) with etching solution, (g) forming a dichroic layer (II) having spectral characteristics different from that of said dichroic layer (I) on the whole surface of the resulting structure by vapor deposition, (h) forming a metal layer (IV) on the whole surface of said dichroic layer (II) by vapor deposition, (i) dissolving said metal layer (I) with etching solution to remove that layer together with the overlying dichroic layers (I) and (II), and metal layers (III) and (IV), (j) forming a dichroic layer (III) having spectral characteristics different from those of said dichroic layers (I) and (II) on the whole surface of the resulting structure by vapor deposition, and (k) dissolving said metal layers (III) and (IV) with etching solution to remove that layer together with the overlying dichroic layer (II) and dichroic layer (III) deposited thereon, said etching solution used for dissolving said metal layer (I) being different from that for said metal layer (II), said etching solution used for dissolving said metal layer (III) being different from that used for dissolving said metal layers (I) and (II), and said etching solution for said metal layer (IV) being different from at least that used for dissolving said metal layer (I).