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US4158717A Expired / Lapsed US ⏱️ 0.0 years remaining

Silicon nitride film and method of deposition

Assignee: Novellus Systems Inc
•
Filing: 1977-02-14
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Granted: 1979-06-19
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Expires: 1997-02-14
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Abstract

Abstract A dense film of silicon nitride is deposited by a plasma discharge in a vapor of azidotrimethylsilane (AZS) (CH 3 ) 3 SiN 3 . AZS is less reactive and easier to handle than the previously used silane SiH 4 . The resulting film is more stable chemically than the silicon nitride produced by other processes. It is useful for protective and anti-reflective coatings, for insulating, and for masking, particularly on semiconductive devices.

Inventors

  • 👤 Norvell J. Nelson

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-03 21:18
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/69; H10P14/694; H10P14/6943; H10P14/69433; C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/34; C23C16/345; C23C16/44; C23C16/50; C23C16/505; C23C16/507; H10F; H10F77/00; H10F77/30; H10F77/306; H10F77/311; H10F77/315; H10P14/66; H10P14/668; H10P14/6681; H10P14/6687; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6334; H10P14/6336; Y; Y02; Y02E; Y02E10/00; Y02E10/50

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 41 words
A method for depositing a film comprising silicon nitride, said method comprising the steps of: exposing a substrate to a vapor of azidotrimethylsilane, and creating a plasma discharge in said vapor to deposit said film comprising silicon nitride on said substrate.
Claim 2
Independent Claim 41 words
A method for depositing a film comprising silicon nitride, said method comprising the steps of: exposing a substrate to a vapor of azidotrimethylsilane, and creating a plasma discharge in said vapor to deposit said film comprising silicon nitride on said substrate.
Claim 3
Dependent Claim 15 words
On a substrate a film comprising silicon nitride deposited by the method of claim 1.

References Cited (Backward Citations)

US3424661A Cited
US3637423A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1982-06-18 1982-12-18 1983-06-19 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1986-06-18 1986-12-18 1987-06-19 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1990-06-18 1990-12-18 1991-06-19 $7700.00 Window Closed / Lapsed

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