US4152164A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Electroless nickel plating
Assignee: Individual
•
Filing: 1976-10-21
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Granted: 1979-05-01
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Expires: 1996-10-21
Abstract
Abstract This invention relates to electroless metal deposition and more specifically, to a process where a plating solution is brought to equilibrium and thereafter operated with the concentration of plating reactants and by-products maintained substantially constant. The plating solution treated in accordance with the invention is one having evaporative losses of at least one percent per plating cycle. Following the process, a plating solution can be operated indefinitely and yields a metal plate of uniform quality and predictable properties at any time during use of the solution. The invention avoids the known problems of by-product build-up and variable concentration of reactants typically associated with the use of such solutions.
Inventors
- 👤 Michael Gulla
- 👤 Charles R. Shipley, Jr.
- 👤 Howard A. MacKay
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 06:04
CPC Classifications
C; C23; C23C; C23C18/00; C23C18/16; C23C18/1601; C23C18/1617
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
141 words
A replenisher composition for an electroless metal plating solution having evaporative losses of at least 1% per plating cycle in use and containing metal ions, a reducing agent for said metal ions and a complexing agent for said metal ions, said replenisher composition comprising at least two components separately or in admixture, said components being selected from the group of a source of the metal plating ions, a reducing agent, a complexing agent to maintain said ions in solution and a pH adjuster, said components being in a concentration by weight equal to about the amount of the component reacted in the plating solution per plating cycle plus an amount lost by drag-out plus an excess amount, said excess amount being from one one-hundredth to 60 one-hundredths by weight of the amount of the component originally present in said plating solution.
Claim 2
Dependent Claim
141 words
A replenisher composition for an electroless metal plating solution having evaporative losses of at least 1% per plating cycle in use and containing metal ions, a reducing agent for said metal ions and a complexing agent for said metal ions, said replenisher composition comprising at least two components separately or in admixture, said components being selected from the group of a source of the metal plating ions, a reducing agent, a complexing agent to maintain said ions in solution and a pH adjuster, said components being in a concentration by weight equal to about the amount of the component reacted in the plating solution per plating cycle plus an amount lost by drag-out plus an excess amount, said excess amount being from one one-hundredth to 60 one-hundredths by weight of the amount of the component originally present in said plating solution.
Claim 3
Dependent Claim
19 words
The replenisher composition of claim 1 where the excess is from 5 to 25 one-hundredths of the original amount.
Claim 4
Dependent Claim
27 words
The replenisher composition of claim 1 where the plating solution is a nickel-hypophosphite solution and the replenisher contains at least a nickel salt and a hypophosphite salt.
Claim 5
Dependent Claim
30 words
The replenisher composition of claim 1 where the plating solution is a nickel borane solution and the replenisher contains at least a nickel salt and an amine borane reducing agent.
Claim 6
Dependent Claim
22 words
The replenisher composition of claim 1 additionally containing a source of metal ions differing from the metal ions of the plating solution.
Claim 7
Dependent Claim
14 words
The replenisher composition of claim 5 where the additional metal ions are copper ions.
Claim 8
Dependent Claim
14 words
The replenisher composition of claim 5 where the additional metal ions are cuprous ions.
Claim 9
Dependent Claim
13 words
The replenisher composition of claim 5 where the additional ions are cobalt ions.
Claim 10
Dependent Claim
9 words
The replenisher composition of claim 1 in aqueous solution.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1982-04-30 | 1982-10-30 | 1983-05-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1986-04-30 | 1986-10-30 | 1987-05-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1990-04-30 | 1990-10-30 | 1991-05-01 | $7700.00 | Window Closed / Lapsed |