← Back to Patent Explorer
US4140989A Expired / Lapsed US ⏱️ 0.0 years remaining

Temperature sensors

Assignee: Bpifrance Financement SA
•
Filing: 1977-04-08
•
Granted: 1979-02-20
•
Expires: 1997-04-08
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A temperature sensor comprises a thin layer of niobium nitride with a dis-ordered structure deposited on a thermally conductive electrically insulating substrate and terminal electrical contacts. The layer of niobium nitride may be deposited by reactive cathodic sputtering on the electrically insulating substrate.

Inventors

  • 👤 Joseph Baixeras
  • 👤 Paul Andro

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 13:12
CPC Classifications
G; G01; G01K; G01K7/00; G01K7/16; G01K7/22; G01K7/223

Claims Analysis

Total Claims: 12
Claim 1
Independent Claim 73 words
A new use for a thin film resistor of a layer of niobium nitride having a disordered structure, comprising placing said resistor in an environment whose temperature is to be measured in a predetermined temperature range while supporting said film by a substrate of a material having a large thermal conductivity and which is electrically insulating within said temperature range to produce a device having a negative temperature coefficient in said temperature range.
Claim 2
Dependent Claim 73 words
A new use for a thin film resistor of a layer of niobium nitride having a disordered structure, comprising placing said resistor in an environment whose temperature is to be measured in a predetermined temperature range while supporting said film by a substrate of a material having a large thermal conductivity and which is electrically insulating within said temperature range to produce a device having a negative temperature coefficient in said temperature range.
Claim 3
Dependent Claim 19 words
A method according to claim 1, wherein said layer has a thickness of from 1,000 Angstroms to 10,000 Angstroms.
Claim 4
Dependent Claim 27 words
A method according to claim 2, wherein said layer is on a substrate of a material selected from the group consisting of sapphire, beryllium oxide and glass.
Claim 5
Dependent Claim 17 words
A method according to claim 2, wherein said layer has ohmic contacts consisting of thin gold layers.
Claim 6
Dependent Claim 79 words
Resistive temperature sensor having a negative temperature coefficient and suitable for use at cryogenic temperatures, comprising: a substrate of sapphire coated with a thin strip of niobium nitride deposited under conditions such as it has a disorganized structure and its resistivity R varies with the temperature substantially according to the relation R = R.sub.o exp. (T/T.sub.o).sup.-1/4 for temperatures below 200 K, R o and T o being predetermined constant values; and ohmic contacts at opposite ends of said strip.
Claim 7
Dependent Claim 79 words
Resistive temperature sensor having a negative temperature coefficient and suitable for use at cryogenic temperatures, comprising: a substrate of sapphire coated with a thin strip of niobium nitride deposited under conditions such as it has a disorganized structure and its resistivity R varies with the temperature substantially according to the relation R = R.sub.o exp. (T/T.sub.o).sup.-1/4 for temperatures below 200 K, R o and T o being predetermined constant values; and ohmic contacts at opposite ends of said strip.
Claim 8
Dependent Claim 17 words
Sensor according to claim 5, wherein said layer of niobium nitride is formed by reactive cathodic sputtering.
Claim 9
Dependent Claim 52 words
A process for preparation of resistive temperature sensor, comprising the steps of: locating an electrically insulating thermally conducting substrate in a nitrogen containing atmosphere; forming a thin layer of niobium nitride having a disorganized structure on said substrate by reactive cathodic sputtering; and forming ohmic contacts at opposite ends of said layer.
Claim 10
Dependent Claim 52 words
A process for preparation of resistive temperature sensor, comprising the steps of: locating an electrically insulating thermally conducting substrate in a nitrogen containing atmosphere; forming a thin layer of niobium nitride having a disorganized structure on said substrate by reactive cathodic sputtering; and forming ohmic contacts at opposite ends of said layer.
Claim 11
Dependent Claim 25 words
A proces according to claim 7, wherein the deposition of niobium nitride is carried out in an atmosphere of argon and nitrogen under low pressure.
Claim 12
Dependent Claim 12 words
The method of claim 1, wherein said temperature range comprises cryogenic temperatures.

References Cited (Backward Citations)

US3256588A Cited
US3395089A Cited
US3537891A Cited
US3736242A Cited
US3714013A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1982-02-19 1982-08-21 1983-02-20 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1986-02-19 1986-08-21 1987-02-20 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1990-02-19 1990-08-21 1991-02-20 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag