Method for modifying the surface of polymeric substrate materials by means of electron bombardment in a low pressure gas discharge

Claim 2

In a method for modifying the surface of a polymeric substrate material by means of electron bombardment in a low pressure gas discharge medium including a pair of stationary, spaced apart flat electrodes, the improvement which comprises guiding said substrate material past said electrodes and between and in parallel with said electrodes, negatively biasing said area electrodes against said medium, shielding the sides facing away from said substrate material with a grounded similarly parallel metal sheet, covering said electrodes on the sides facing said substrate material with a conductive material chosen for effecting the desired intensity of the current density, a dark space being formed in front of said area electrodes, said substrate material being situated at a distance from said flat electrodes greater than said dark space disposed in front of said area electrodes.

Claim 3

The method according to claim 1 wherein said material covering said electrodes is silicon dioxide and said discharge gas is argon.

Claim 4

The method according to claim 1 wherein said material covering said electrodes is aluminum and said discharge gas is oxygen.

Claim 5

The method according to claim 1 wherein said discharge gas is a mixture of gases.

Claim 6

The method according to claim 4 wherein said mixture of gases comprises gaseous acrylic acid and argon.

Claim 7

The method according to claim 1 wherein said electrodes are coated with a polymeric material which forms monomeric material during said electron bombardment, said monomeric material in turn is polymerized by said electron bombardment and is grafted onto the surface of said polymeric substrate material.

Claim 8

The method according to claim 1 wherein said electrodes are arranged symmetrically, said substrate material being guided on the resulting symmetrical axis thereof.

Claim 9

The method according to claim 7 wherein one of said area electrodes is disconnected and only one surface of said substrate material is modified.

Claim 10

The method according to claim 7 wherein said substrate material is guided in two layers past said electrodes along said symmetrical axis thereof.

Claim 11

The method according to claim 1 wherein said electrodes are covered with a non-conductive material.

Claim 12

The method according to claim 1 wherein said polymeric substrate material is in the form of a woven textile material formed from polymeric textile fibers.

Claim 13

The method according to claim 1 wherein said polymeric substrate material is in fiber form.

Claim 14

The method according to claim 1 wherein said polymeric substrate material is in sheet form.

Claim 15

The method according to claim 3 wherein said polymeric substrate material is in the form of a woven textile material formed from polymeric textile fibers.

Claim 16

The method according to claim 6 wherein said electrodes are coated with polytetrafluoroethylene polymer material and said discharge gas is argon.

Claim 17

The article produced according to the method of claim 1.

Claim 18

The article produced according to the method of claim 2.

Claim 19

The article produced according to the method of claim 4.

Claim 20

The article produced according to the method of claim 6.

Claim 21

The article produced according to the method of claim 11.

Claim 22

The method of claim 1, wherein the dark space occurs in front of each of the electrodes and the distance between the area electrode and the substrate material on either side thereof is within the range of from 2 to 5 cm with the result that said distance is from 2 to 5 times greater than said dark space.

Claim 23

The method of claim 1, wherein polyethyleneterephthalate textile material is treated under a voltage of the order of magnitude of 1 kilovolt and a capacity density of the order of 1 watt per square cm for a treatment period of the order of 2 seconds.

Claim 24

In a method of modifying the surface of a polymeric substrate material by means of electron bombardment in a low pressure gas discharge medium including a pair of flat, rectilinear, spaced apart electrodes immovably mounted within a vacuum chamber, the improvement comprising: a. negatively biasing the area electrodes against the gas discharge medium; b. shielding both said electrodes on the sides facing away from the substrate material with a grounded metal sheet extending parallel to the path of the substrate material; c. covering both said electrodes on the sides facing said substrate material with a material chosen to effect the desired amount of Gamma secondary electrons and thus in combination with the gas discharge medium the desired intensity of the current density; and d. guiding the substrate material in a path spaced from and parallel to said flat electrodes and between the same at a distance from the electrodes greater than the dark space formed in front of each of said area electrodes.

Claim 25

In a method of modifying the surface of a polymeric substrate material by means of electron bombardment in a low pressure gas discharge medium including a pair of flat, rectilinear, spaced apart electrodes immovably mounted within a vacuum chamber, the improvement comprising: a. negatively biasing the area electrodes against the gas discharge medium; b. shielding both said electrodes on the sides facing away from the substrate material with a grounded metal sheet extending parallel to the path of the substrate material; c. covering both said electrodes on the sides facing said substrate material with a material chosen to effect the desired amount of Gamma secondary electrons and thus in combination with the gas discharge medium the desired intensity of the current density; and d. guiding the substrate material in a path spaced from and parallel to said flat electrodes and between the same at a distance from the electrodes greater than the dark space formed in front of each of said area electrodes.

Claim 26

The method of claim 23, in which the material covering both said electrodes on the sides facing the substrate material is selected from the group consisting of aluminum and silicon dioxide and the gas discharge medium is selected from the group consisting of oxygen and argon, respectively, so as to produce with the combination of aluminum and oxygen a high treatment intensity and so as to produce with the combination of silicon dioxide and argon a low treatment intensity, resulting from an increase and decrease respectively in the desired amount of Gamma secondary electrons.

Claim 27

The method of claim 23, in which the material covering said electrodes on the side facing said substrate material is aluminum and the gas discharge medium is oxygen.

Claim 28

The method of claim 23, in which the material covering said electrodes on the sides facing the substrate material is silicon dioxide, and the gas discharge medium is argon.

Claim 29

In a method of modifying the surface of a polymeric substrate material by means of electron bombardment in a low pressure gas discharge medium within a vacuum chamber and including a pair of stationary, spaced apart flat electrodes between which the material passes, said electrodes being shielded on the side facing away from the line of passage of the substrate material with a grounded metal sheet, said electrodes being covered on the sides facing the line of passage of the substrate material with a material chosen to produce in combination with the gas discharge medium a desired amount of Gamma secondary electrons and thus the desired intensity of current density, said area electrodes being negatively biased against said gas discharge medium, the improvement comprising the step of guiding the substrate material passed said electrodes and between and in parallel therewith at a distance from said electrodes greater than the dark space formed in front of said electrodes.

Claim 30

In a method of modifying the surface of a polymeric substrate material by means of electron bombardment in a low pressure gas discharge medium within a vacuum chamber and including a pair of stationary, spaced apart flat electrodes between which the material passes, said electrodes being shielded on the side facing away from the line of passage of the substrate material with a grounded metal sheet, said electrodes being covered on the sides facing the line of passage of the substrate material with a material chosen to produce in combination with the gas discharge medium a desired amount of Gamma secondary electrons and thus the desired intensity of current density, said area electrodes being negatively biased against said gas discharge medium, the improvement comprising the step of guiding the substrate material passed said electrodes and between and in parallel therewith at a distance from said electrodes greater than the dark space formed in front of said electrodes.