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US4139409A Expired / Lapsed US ⏱️ 0.0 years remaining

Laser engraved metal relief process

Assignee: Optical Engineering Inc
•
Filing: 1978-02-09
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Granted: 1979-02-13
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Expires: 1998-02-09
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Abstract

Abstract Means and method for forming a raised metallic relief wherein a metal foil affixed to a support film is selectively etched, affixed to a wood surface, and then exposed to a scanning concentrated laser beam to vaporize the support film and wood in areas unprotected by the metal sheet. The metal design is left on the wood surface in the form of a raised relief.

Inventors

  • 👤 John A. Macken
  • 👤 Paul N. Palanos

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-23 19:52
CPC Classifications
B; B23; B23K; B23K26/00; B23K26/02; B23K26/06; B23K26/064; B23K26/066; B23K26/0661; B44; B44C; B44C1/00; B44C1/22; B44C1/227; B44C1/228; B44C3/00; B44C3/005; B44C5/00; B44C5/04; B44C5/0415; B44C5/043; C; C23; C23F; C23F1/00; C23F1/02; B23K2101/00; B23K2101/007

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 119 words
A method of forming relieved structures comprising: forming a mask of material for reflecting a laser beam, said mask comprising a metallic layer sandwiched between first and second organic layers; establishing a pattern in said first organic layer to protect said metallic layer; removing portions of said metallic layer not protected by said pattern; bonding said mask to a substrate to form a masked array; scanning said masked array with a laser beam which vaporizes portions of said first and second organic layers not protected by said metallic layer, said laser beam being controlled such that said substrate is vaporized to a desired depth in order to maintain a relieved structure in said substrate as defined by said mask.
Claim 2
Independent Claim 119 words
A method of forming relieved structures comprising: forming a mask of material for reflecting a laser beam, said mask comprising a metallic layer sandwiched between first and second organic layers; establishing a pattern in said first organic layer to protect said metallic layer; removing portions of said metallic layer not protected by said pattern; bonding said mask to a substrate to form a masked array; scanning said masked array with a laser beam which vaporizes portions of said first and second organic layers not protected by said metallic layer, said laser beam being controlled such that said substrate is vaporized to a desired depth in order to maintain a relieved structure in said substrate as defined by said mask.
Claim 3
Dependent Claim 48 words
The method recited in claim 1 wherein: said first organic layer is a photo-resist material and said establishing step includes exposing and developing said photo-resist material to provide said pattern; and said removing step includes etching said metallic layer to dissolve portions thereof not protected by said pattern.
Claim 4
Dependent Claim 30 words
The method recited in claim 2 including the step of; removing said mask from said substrate after the scanning step to provide a relieved structure formed exclusively from said substrate.
Claim 5
Dependent Claim 37 words
The method recited in claim 2 wherein; said bonding step includes providing an adhesive layer between said second organic layer and said substrate, said scanning step vaporizing portions of said adhesive not protected by said metallic layer.
Claim 6
Dependent Claim 37 words
The method recited in claim 2 wherein; said bonding step includes providing an adhesive layer between said first organic layer and said substrate, said scanning step vaporizing portions of said adhesive not protected by said metallic layer.
Claim 7
Dependent Claim 20 words
The method recited in claim 4 including the step of removing said first organic layer prior to the bonding step.
Claim 8
Independent Claim 145 words
A method of forming relieved structures comprising: forming a mask of material for reflecting a laser beam, said mask comprising an organic photo-resist first layer over a metallic second layer, said metallic second layer being bonded to an organic third layer; exposing and developing said photo-resist layer to provide a preselected protective pattern on said metallic layer; etching said metallic layer to dissolve portions thereof not protected by said protective pattern; bonding said third layer of said mask to a substrate to form a masked array; scanning said masked array with a laser beam which vaporizes exposed portions of said protective pattern and said organic third layer, and is reflected by said metallic layer, said laser beam being controlled such that said substrate is vaporized only to a desired depth in order to maintain a relieved structure in said substrate as defined by said mask.
Claim 9
Independent Claim 145 words
A method of forming relieved structures comprising: forming a mask of material for reflecting a laser beam, said mask comprising an organic photo-resist first layer over a metallic second layer, said metallic second layer being bonded to an organic third layer; exposing and developing said photo-resist layer to provide a preselected protective pattern on said metallic layer; etching said metallic layer to dissolve portions thereof not protected by said protective pattern; bonding said third layer of said mask to a substrate to form a masked array; scanning said masked array with a laser beam which vaporizes exposed portions of said protective pattern and said organic third layer, and is reflected by said metallic layer, said laser beam being controlled such that said substrate is vaporized only to a desired depth in order to maintain a relieved structure in said substrate as defined by said mask.
Claim 10
Dependent Claim 38 words
The method recited in claim 7 wherein: said bonding step is achieved by providing an adhesive layer between said third layer and said substrate, said scanning step vaporizing portions of said adhesive not protected by said metallic layer.

References Cited (Backward Citations)

US3455239A Cited
US3549733A Cited
US3832948A Cited
US3742182A Cited
US3884570A Cited
US3867217A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1982-02-12 1982-08-14 1983-02-13 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1986-02-12 1986-08-14 1987-02-13 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1990-02-12 1990-08-14 1991-02-13 $7700.00 Window Closed / Lapsed

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