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US4131524A Expired / Lapsed US ⏱️ 0.0 years remaining

Manufacture of semiconductor devices

Assignee: US Philips Corp
•
Filing: 1971-07-29
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Granted: 1978-12-26
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Expires: 1991-07-29
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Abstract

Abstract A method of manufacturing a semiconductor device comprising the steps of providing a plate-shaped semiconductor body, removing by spark erosion a first portion of the semiconductor body, and then using a selective etching process to remove only a second portion of the semiconductor body.

Inventors

  • 👤 Antonous C. M. Gieles

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 01:36
CPC Classifications
H; H10; H10P; H10P95/00; H10P95/80; H10P50/00; H10P50/60; H10P50/61; H10P50/613; Y; Y10; Y10S; Y10S438/00; Y10S438/977

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 94 words
A method of manufacturing a semiconductor device comprising the steps of providing a plate-shaped semiconductor body of one conductivity type, forming a substantially continuous layer of semiconductor material of opposite conductivity type on a flat side of said body, forming at least one circuit element in said layer, providing electrical contacts to said circuit element, removing by spark erosion a first portion of the semiconductor body opposite said layer and short of said layer and then using a selective etching process to remove a second portion of the semiconductor body down to said layer.
Claim 2
Independent Claim 94 words
A method of manufacturing a semiconductor device comprising the steps of providing a plate-shaped semiconductor body of one conductivity type, forming a substantially continuous layer of semiconductor material of opposite conductivity type on a flat side of said body, forming at least one circuit element in said layer, providing electrical contacts to said circuit element, removing by spark erosion a first portion of the semiconductor body opposite said layer and short of said layer and then using a selective etching process to remove a second portion of the semiconductor body down to said layer.

References Cited (Backward Citations)

US2994811A Cited
US3230763A Cited
US3616345A Cited
US3492513A Cited
US3616348A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1981-12-25 1982-06-26 1982-12-26 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1985-12-25 1986-06-26 1986-12-26 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1989-12-25 1990-06-26 1990-12-26 $7700.00 Window Closed / Lapsed

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