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US4128845A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor integrated circuit devices having inverted frustum-shape contact layers

Assignee: NTT Inc
•
Filing: 1976-07-19
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Granted: 1978-12-05
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Expires: 1996-07-19
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Abstract

Abstract Inverted frustum shaped polycrystalline semiconductor layers are formed on the emitter and collector regions provided on one surface of a semiconductor substrate, and conductor layers are applied on the upper surfaces of the polycrystalline semiconductor surfaces to form emitter and collector electrodes thus providing a bipolar transistor for the integrated circuit device.

Inventors

  • 👤 Tetsushi Sakai

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 18:59
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/40; H10W20/41; H10W20/44; H10W20/4451; H10D; H10D64/00; H10D64/01; H10D64/011; H10D64/0111; H10D64/0113; H10D64/20; H10D64/23; H10P; H10P32/00; H10P32/10; H10P32/14; H10P32/1408; H10P32/1414; H10P32/17; H10P32/171

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 224 words
A semiconductor integrated circuit device including a bipolar transistor comprising a semiconductor substrate, a collector region, a base region and an emitter region which are spaced apart and formed at one surface of said semiconductor substrate, a plurality of inverted frustum-shape polycrystalline semiconductor contact layers having raised upper larger cross sectional surfaces and lower smaller cross sectional surfaces, one of said inverted frustum-shape polycrystalline semiconductor contact layers being formed on and in direct contact with each of said emitter region and said collector region, respectively, a first insulating film covering the raised side surfaces of said inverted frustum-shaped polycrystalline semiconductor contact layers and overlying the upper surface portions of said substrate which are included substantially within the vertical projection of the raised upper larger cross sectional surfaces of the inverted frustum-shape polycrystalline semiconductor contact layers down upon the upper surface of said substrate, a second insulating film covering the surface portions of said one surface of said substrate other than those areas covered by said first insulating film, the contact layers and said base region, a base electrode formed on said base region below the plane of the raised upper larger cross sectional surfaces of the inverted frustum-shape polycrystalline semiconductor contact layers and an emitter electrode and a collector electrode formed on the upper surfaces of the respective inverted frustum-shape polycrystalline semiconductor contact layers.
Claim 2
Dependent Claim 224 words
A semiconductor integrated circuit device including a bipolar transistor comprising a semiconductor substrate, a collector region, a base region and an emitter region which are spaced apart and formed at one surface of said semiconductor substrate, a plurality of inverted frustum-shape polycrystalline semiconductor contact layers having raised upper larger cross sectional surfaces and lower smaller cross sectional surfaces, one of said inverted frustum-shape polycrystalline semiconductor contact layers being formed on and in direct contact with each of said emitter region and said collector region, respectively, a first insulating film covering the raised side surfaces of said inverted frustum-shaped polycrystalline semiconductor contact layers and overlying the upper surface portions of said substrate which are included substantially within the vertical projection of the raised upper larger cross sectional surfaces of the inverted frustum-shape polycrystalline semiconductor contact layers down upon the upper surface of said substrate, a second insulating film covering the surface portions of said one surface of said substrate other than those areas covered by said first insulating film, the contact layers and said base region, a base electrode formed on said base region below the plane of the raised upper larger cross sectional surfaces of the inverted frustum-shape polycrystalline semiconductor contact layers and an emitter electrode and a collector electrode formed on the upper surfaces of the respective inverted frustum-shape polycrystalline semiconductor contact layers.
Claim 3
Dependent Claim 80 words
A semiconductor integrated circuit device according to claim 1 wherein the inverted frustum-shape polycrystalline semiconductor contact layers each are comprised of two layers, a polycrystalline silicon layer having a high dopant level comprising the lower smaller cross sectional surfaces thereof and a non-doped semiconductor polycrystalline layer comprising the raised upper larger cross sectional surfaces thereof, the two layers having been differentially etched by an etchant to form the inverted frustum-shape and thereafter heated to form a substantially homogeneous contact layer.
Claim 4
Dependent Claim 47 words
A semiconductor integrated circuit device according to claim 1 wherein at least a part of said second insulating film covering the upper surface portions of said substrate immediately surrounding said emitter inverted frustum-shape contact layer extends onto and overlies a peripheral edge portion of said base region.
Claim 5
Dependent Claim 80 words
A semiconductor integrated circuit device according to claim 3 wherein the inverted frustum-shape polycrystalline semiconductor contact layers each are comprised of two layers, a polycrystalline silicon layer having a high dopant level comprising the lower smaller cross sectional surfaces thereof and a non-doped semiconductor polycrystalline layer comprising the raised upper larger cross sectional surfaces thereof, the two layers having been differentially etched by an etchant to form the inverted frustum-shape and thereafter heated to form a substantially homogeneous contact layer.
Claim 6
Dependent Claim 73 words
The semiconductor integrated circuit device according to claim 4 which further comprises at least one additional area of polycrystalline semiconductor layer disposed over at least a portion of said second insulating film and a metal conductor disposed on said additional area of polycrystalline semiconductor layer, a portion of said last-mentioned metal conductor being interrupted by a third insulating film thereby enabling use of said additional area of polycrystalline semiconductor layer as a resistor.
Claim 7
Dependent Claim 73 words
The semiconductor integrated circuit device according to claim 1 which further comprises at least one additional area of polycrystalline semiconductor layer disposed over at least a portion of said second insulating film and a metal conductor disposed on said additional area of polycrystalline semiconductor layer, a portion of said last-mentioned metal conductor being interrupted by a third insulating film thereby enabling use of said additional area of polycrystalline semiconductor layer as a resistor.
Claim 8
Dependent Claim 58 words
The semiconductor integrated circuit device according to claim 1 which further comprises interconnecting conductors connected to said collector and emitter electrodes, and an interconnecting conductor to said base electrode, said interconnecting conductors being spaced from each other by a step-shaped portion of the first insulating film covering the side surfaces of said inverted frustum-shape polycrystalline semiconductor contact layers.
Claim 9
Dependent Claim 87 words
The semiconductor integrated circuit device according to claim 1 which further comprises a first interconnecting conductor disposed on said second insulating film adjacent at least one of said inverted frustum-shape polycrystalline semiconductor contact layers, a third insulating film overlying said one polycrystalline semiconductor contact layer and said first interconnecting conductor, and a second interconnecting conductor overlying said third insulating film and extending through openings in said third insulating layer to contact and interconnect the electrode on said one polycrystalline semiconductor contact layer and said first interconnecting conductor.
Claim 10
Dependent Claim 58 words
The semiconductor integrated circuit device according to claim 1 which further comprises a first interconnecting conductor disposed on said second insulating film adjacent at least one of said inverted frustum-shape polycrystalline semiconductor contact layers, and a second interconnecting conductor directly covering the electrode on said one polycrystalline semiconductor contact layer and said first interconnecting conductor for interconnecting them.
Claim 11
Dependent Claim 70 words
The semiconductor integrated circuit device according to claim 1 wherein a step-shaped raised polycrystalline semiconductor member is formed on said second insulating film, and said integrated circuit device further comprises an insulating film covering at least the raised side surfaces of said step-shaped polycrystalline semiconductor member, and an interconnecting conductor disposed on said second insulating film and extending over and contacting the upper surfaces of said step-shaped polycrytalline semiconductor member.

References Cited (Backward Citations)

US3738880A Cited
US3780359A Cited
US3860836A Cited
US4001762A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1981-12-04 1982-06-05 1982-12-05 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1985-12-04 1986-06-05 1986-12-05 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1989-12-04 1990-06-05 1990-12-05 $7700.00 Window Closed / Lapsed

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