US4128670A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Fabrication method for integrated circuits with polysilicon lines having low sheet resistance
Assignee: International Business Machines Corp
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Filing: 1977-11-11
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Granted: 1978-12-05
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Expires: 1997-11-11
Abstract
Abstract A method and structure for polysilicon lines which include a silicide layer for providing a low sheet resistance. The invention may be employed in a polysilicon gate MOSFET process for integrated circuits as well as other integrated structures. In the method a first layer of polysilicon is deposited followed by a deposition of a metal of the silicide forming type. Another polysilicon layer is then deposited on top of the silicide forming metal to produce a three layer structure. The three layer structure is subjected to heat, for example, during the reoxidation step in a gate fabrication process, the metal reacts with the polysilicon at two reaction fronts to form a silicide. The resultant silicide has a much lower resistivity than doped polysilicon and therefore provides a second conductive layer which can be used more compatibly and efficiently in connection with the normal metal layer employed in integrated circuits to give a two-dimensional degree of freedom for the distribution of signals.
Inventors
- 👤 Fritz H. Gaensslen
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 02:57
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/01; H10D30/021; H10D30/0223; H10D64/00; H10D64/01; H10D64/013; H10D64/01302; H10D64/01304; H10D64/01306; H10D64/01308; H10D64/0131; H10D64/60; H10D64/66; H10D64/661; H10D64/662; H10D64/663; H10P; H10P95/00; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/064; H10W20/066; H10W20/40; H10W20/41; H10W20/44; H10W20/4451; Y; Y10; Y10S; Y10S148/00; Y10S148/147
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
87 words
A method for fabricating an electrically conductive combined polysilicon and metal silicide structure for integrated circuits comprising the steps of depositing a first layer of polysilicon on a substrate, depositing a layer of silicide forming metal on said first polysilicon layer, depositing a second layer of polysilicon on said silicide forming metal layer, and heating said polysilicon and metal structure to cause said metal layer to react with said first and second polysilicon layers to form a metal silicide layer intermediate said first and second polysilicon layers.
Claim 2
Independent Claim
87 words
A method for fabricating an electrically conductive combined polysilicon and metal silicide structure for integrated circuits comprising the steps of depositing a first layer of polysilicon on a substrate, depositing a layer of silicide forming metal on said first polysilicon layer, depositing a second layer of polysilicon on said silicide forming metal layer, and heating said polysilicon and metal structure to cause said metal layer to react with said first and second polysilicon layers to form a metal silicide layer intermediate said first and second polysilicon layers.
Claim 3
Dependent Claim
44 words
A method for fabricating a polysilicon and metal silicide structure according to claim 1 wherein said silicide forming metal is selected to produce an electrically conductive silicide having a resistivity substantially at least an order of magnitude lower than the resistivity of said polysilicon.
Claim 4
Dependent Claim
13 words
A method according to claim 1 wherein said silicide forming metal is molybdenum.
Claim 5
Dependent Claim
13 words
A method according to claim 1 wherein said silicide forming metal is tungsten.
Claim 6
Dependent Claim
13 words
A method according to claim 1 wherein said silicide forming metal is titanium.
Claim 7
Dependent Claim
34 words
A method for fabricating a polysilicon and metal silicide structure according to claim 1 wherein said heating step also produces a layer of oxide on the upper surface of said second layer of polysilicon.
Claim 8
Dependent Claim
27 words
A method for fabricating a polysilicon and metal silicide structure according to claim 6 further including the step of forming a metal layer on said oxide layer.
Claim 9
Dependent Claim
14 words
A method according to claim 7 wherein said metal layer is composed of aluminum.
Claim 10
Independent Claim
129 words
A method for fabricating a gate electrode for an integrated circuit comprising the steps of depositing a first oxide layer on a semiconductor substrate, depositing a first layer of polysilicon on said first oxide layer, depositing a layer of silicide forming metal of said first polysilicon layer, depositing a second layer of polysilicon on said silicide forming metal layer to form a three-layer structure disposed on said first oxide layer on said semiconductor substrate, masking and delineating said three layer structure to form a gate electrode element, heating said combination to form a second oxide layer over said gate electrode element and to cause said silicide forming metal to react with said first and second polysilicon layers to form a silicide layer intermediate said first and second polysilicon layers.
Claim 11
Independent Claim
129 words
A method for fabricating a gate electrode for an integrated circuit comprising the steps of depositing a first oxide layer on a semiconductor substrate, depositing a first layer of polysilicon on said first oxide layer, depositing a layer of silicide forming metal of said first polysilicon layer, depositing a second layer of polysilicon on said silicide forming metal layer to form a three-layer structure disposed on said first oxide layer on said semiconductor substrate, masking and delineating said three layer structure to form a gate electrode element, heating said combination to form a second oxide layer over said gate electrode element and to cause said silicide forming metal to react with said first and second polysilicon layers to form a silicide layer intermediate said first and second polysilicon layers.
Claim 12
Dependent Claim
44 words
A method for fabricating a polysilicon and metal silicide structure according to claim 9 wherein said silicide forming metal is selected to produce an electrically conductive silicide having a resistivity substantially at least an order of magnitude lower than the resistivity of said polysilicon.
Claim 13
Dependent Claim
20 words
A method according to claim 10 further including the step of forming a metal layer over said second oxide layer.
Claim 14
Dependent Claim
14 words
A method according to claim 11 wherein said metal layer is composed of aluminum.
References Cited (Backward Citations)
US3375418A
Cited
US3987216A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1981-12-04 | 1982-06-05 | 1982-12-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1985-12-04 | 1986-06-05 | 1986-12-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1989-12-04 | 1990-06-05 | 1990-12-05 | $7700.00 | Window Closed / Lapsed |