← Back to Patent Explorer
US4104442A Expired / Lapsed US ⏱️ 0.0 years remaining

Silicon nitride-containing material with self-glazing surface and process for its production

Assignee: Rosenthal AG
•
Filing: 1976-03-23
•
Granted: 1978-08-01
•
Expires: 1996-03-23
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract The invention concerns a silicon nitride-containing material with a gas-tight surface and improved oxidation resistance, and the invention also relates to a process for the production of such material.

Inventors

  • 👤 Godehard Sussmuth

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 02:15
CPC Classifications
C; C04; C04B; C04B41/00; C04B41/009; C04B35/00; C04B35/515; C04B35/58; C04B35/584; C04B35/591; C04B41/45; C04B41/50; C04B41/5022

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 99 words
A process for the production of a silicon nitride-containing material with a gas-tight surface and improved oxidation resistance which comprises admixing 3-25 percent by weight based on the weight of the resulting admixture of at least one powdered ceramic, silicate-containing additive having a particle size of less than 20 mμ and the silicon raw material, subjecting the admixture to standard nitriding condition and subjecting the nitrided admixture to a heat treatment between 1,000° C and 1,500° C in an oxygen-containing atmosphere, wherein said admixture is heated to said temperature at a rate exceeding 100° C per minute, nitride-containing material.
Claim 2
Dependent Claim 99 words
A process for the production of a silicon nitride-containing material with a gas-tight surface and improved oxidation resistance which comprises admixing 3-25 percent by weight based on the weight of the resulting admixture of at least one powdered ceramic, silicate-containing additive having a particle size of less than 20 mμ and the silicon raw material, subjecting the admixture to standard nitriding condition and subjecting the nitrided admixture to a heat treatment between 1,000° C and 1,500° C in an oxygen-containing atmosphere, wherein said admixture is heated to said temperature at a rate exceeding 100° C per minute, nitride-containing material.
Claim 3
Dependent Claim 23 words
Process for the production of a silicon nitride-containing material according to claim 1, characterized in that the heat treatment is effected in air.
Claim 4
Dependent Claim 29 words
Process for the production of a silicon nitride-containing material according to claim 1, characterized in that the additive is magnesium aluminum silicate in an amount of 10-15 weight percent.
Claim 5
Dependent Claim 26 words
Process for the production of a silicon nitride-containing material according to claim 1, characterized in that lithium aluminum silicate is an amount of 5-10 weight percent.
Claim 6
Dependent Claim 21 words
A silicon nitride-containing body having a gas tight surface and improved resistance to oxidation produced by the process of claim 1.

References Cited (Backward Citations)

US2741565A Cited
GB909271A Cited
GB887942A Cited
US3455729A Cited
GB1151475A Cited
US3811928A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1981-07-31 1982-01-30 1982-08-01 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1985-07-31 1986-01-30 1986-08-01 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1989-07-31 1990-01-30 1990-08-01 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag