Abstract A method for fabricating very narrow superconducting metallic lines on a substrate using ion-implantation and etching techniques. The method permits lines to be produced which are much smaller than those fabricated by conventional masking and etching techniques. It makes the fabrication of very small Josephson and other superconducting devices possible. Also since lines are formed in metals, they have high conductivity, so are useful as ordinary conductors at high temperature or when the technique is utilized with non-superconducting materials. The method includes the steps of depositing a selected metal film on a substrate, applying a photoresist or other masking pattern and exposing, etching away the exposed region, ion-implanting the edge of the resulting pattern, removing the photoresist and etching away the unimplanted portion of the metal leaving an ultra-narrow line pattern.
A method for fabricating ultra-narrow metal lines on a supporting substrate comprising the steps of: applying a thin metal film on the surface of a substrate, covering selected portions of said thin metal film with masking material to delineate a desired pattern, removing the unmasked portions of said thin metal film, selectively ion implanting the edges of said remaining masked portions of said thin metal film to predetermined desired depth, removing said masking material from said remaining portions of said thin metal film, and removing by selective etching the unimplanted portions of said thin metal film to provide a pattern of ultra-narrow metal lines on said substrate.
Claim 2
Independent Claim
107 words
A method for fabricating ultra-narrow metal lines on a supporting substrate comprising the steps of: applying a thin metal film on the surface of a substrate, covering selected portions of said thin metal film with masking material to delineate a desired pattern, removing the unmasked portions of said thin metal film, selectively ion implanting the edges of said remaining masked portions of said thin metal film to predetermined desired depth, removing said masking material from said remaining portions of said thin metal film, and removing by selective etching the unimplanted portions of said thin metal film to provide a pattern of ultra-narrow metal lines on said substrate.
Claim 3
Dependent Claim
38 words
A method according to claim 1 wherein said metal film is a transition metal characterized by having a transition temperature property which increases when the metal is ion implanted such that the ultra-narrow metal lines have superconductive properties.
Claim 4
Dependent Claim
12 words
A method according to claim 2 wherein said metal film is tungsten.
Claim 5
Dependent Claim
28 words
A method according to claim 1 wherein said depth of said ion implantation is approximately 500 Angstroms and said resulting ultra-narrow metal lines are approximately 500 Angstroms wide.