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US4078164A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for the accomplishment of deep microengraving by a laser beam

Assignee: Bpifrance Financement SA
•
Filing: 1976-01-09
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Granted: 1978-03-07
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Expires: 1996-01-09
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Abstract

Abstract A process for deep micro-engraving of a material includes the steps of superpositioning a plurality of elementary layers of respectively alternating indices on the material. Each of the layers is individually transparent to a predetermined wavelength in vacuum, and has an optical thickness equal to one quarter of the predetermined wavelength. The process further includes forming a plurality of openings in the elementary layers; the openings correspond to regions to be engraved on the material, and uncover selected portions of the material. The material is then illuminated by a laser beam of sufficient power to engrave, by sublimation, the uncovered material portions. The laser has the predetermined wavelength, and the plurality of layers form a mirror for the laser beam, which have a relatively high threshold of damage from the laser, and absorb substantially no power from the laser beam.

Inventors

  • 👤 Jacques Pelletier
  • 👤 Francois Rinchet

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 01:49
CPC Classifications
B; B23; B23K; B23K26/00; B23K26/02; B23K26/06; B23K26/064; B23K26/066; B23K26/0661

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 133 words
A process for deep micro-engraving of a material comprising the steps of: superpositioning a plurality of elementary layers of respectively alternating indices of refraction on the material, each of the layers being individually transparent to a predetermined wavelength in vacuum, and having an optical thickness equal to one quarter of the predetermined wavelength; forming a plurality of openings in the elementary layers, the openings corresponding to regions to be engraved on the material, the openings uncovering selected portions of the material; and illuminating the material by a laser beam of sufficient power to engrave, by sublimation, the uncovered material portions, the plurality of dielectric of alternating indices forming a mirror for the laser beam, having a relatively high threshold of damage from the laser, and absorbing substantially no power from the laser beam.
Claim 2
Dependent Claim 133 words
A process for deep micro-engraving of a material comprising the steps of: superpositioning a plurality of elementary layers of respectively alternating indices of refraction on the material, each of the layers being individually transparent to a predetermined wavelength in vacuum, and having an optical thickness equal to one quarter of the predetermined wavelength; forming a plurality of openings in the elementary layers, the openings corresponding to regions to be engraved on the material, the openings uncovering selected portions of the material; and illuminating the material by a laser beam of sufficient power to engrave, by sublimation, the uncovered material portions, the plurality of dielectric of alternating indices forming a mirror for the laser beam, having a relatively high threshold of damage from the laser, and absorbing substantially no power from the laser beam.
Claim 3
Dependent Claim 42 words
A process according to claim 1, further including the step of illuminating the material by a laser beam having an incident energy of 10 G W/cm 2 , the laser mirror having a threshold damage at least equal to said incident energy.
Claim 4
Dependent Claim 13 words
A process according to claim 1, wherein the material is a refractory material.
Claim 5
Dependent Claim 33 words
A process according to claim 1, wherein one of said indices is 1.35 and the other of said indices is 2.35, and wherein the material is a substrate having an index of 1.52.

References Cited (Backward Citations)

US3154371A Cited
US3181170A Cited
US3435186A Cited
US3560291A Cited
US3410979A Cited
US3553421A Cited
US3665483A Cited
US3832948A Cited
US3790744A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1981-03-06 1981-09-05 1982-03-07 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1985-03-06 1985-09-05 1986-03-07 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1989-03-06 1989-09-05 1990-03-07 $7700.00 Window Closed / Lapsed

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