US4075488A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Pattern forming apparatus using quadrupole lenses
Assignee: National Institute of Advanced Industrial Science and Technology
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Filing: 1976-05-19
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Granted: 1978-02-21
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Expires: 1996-05-19
Abstract
Abstract Disclosed is a pattern forming apparatus using a quadrupole lens system to control the cross section of a beam of electrons or ions to be projected onto a plate-like object. A variety of rectangular beams can be formed by electrically controlling the quadrupole lens system, and thus a desired pattern can be produced in the form of combination of rectangle and line pattern elements when the plate-like object is exposed to the beam of electric charged particles. The pattern forming apparatus according to this invention is useful particularly in fabricating integrated circuits, semiconductor devices and other precision devices.
Inventors
- 👤 Shigeo Okayama
- 👤 Hisazo Kawakatsu
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 13:00
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/3002; H01J37/3007
Claims Analysis
Total Claims: 25
Claim 1
Independent Claim
113 words
An apparatus for forming a rectangular or linear shaped pattern on an object with a beam of electrically charged particles, which comprises: a. a source of a beam of electrically charged particles, b. a diaphragm having a rectangular aperture for shaping the beam into a rectangular beam having four sides, c. a quadrupole lens system comprising at least one quadrupole lens, d. means for controlling the quadrupole lens systems for changing the ratio of the lengths of adjacent sides of the the rectangular beam to a desired ratio, and e. means for shifting the rectangular beam the lengths of whose sides have been changed to impinge upon a desired position on the object.
Claim 2
Independent Claim
113 words
An apparatus for forming a rectangular or linear shaped pattern on an object with a beam of electrically charged particles, which comprises: a. a source of a beam of electrically charged particles, b. a diaphragm having a rectangular aperture for shaping the beam into a rectangular beam having four sides, c. a quadrupole lens system comprising at least one quadrupole lens, d. means for controlling the quadrupole lens systems for changing the ratio of the lengths of adjacent sides of the the rectangular beam to a desired ratio, and e. means for shifting the rectangular beam the lengths of whose sides have been changed to impinge upon a desired position on the object.
Claim 3
Dependent Claim
15 words
The apparatus according to claim 1, wherein said quadrupole lens is of an electrostatic type.
Claim 4
Dependent Claim
15 words
The apparatus according to claim 1, wherein said quadrupole lens is of a magnetic type.
Claim 5
Dependent Claim
25 words
The apparatus according to claim 1, wherein said quadrupole lens system further comprises a means for correcting third order aperture aberration of the quadrupole lens.
Claim 6
Dependent Claim
34 words
The apparatus according to claim 4, wherein said means comprises at least one aperture electrode having an aperture coaxial with the quadrupole lens system and a means for supplying voltage to said aperture electrode.
Claim 7
Dependent Claim
33 words
The apparatus according to claim 5, further comprising a source of an accelerating voltage applied to the beam, the voltage applied to the aperture electrode being 1 - 10% of the accelerating voltage.
Claim 8
Dependent Claim
36 words
The apparatus according to claim 5, wherein said one aperture electrode is disposed in the vicinity of one side of said quadrupole lens which one side faces said source for the beam of electric charged particles.
Claim 9
Dependent Claim
29 words
The apparatus according to claim 5, wherein said one aperture electrode is disposed in the vicinity of one side of said quadrupole lens which one side faces the object.
Claim 10
Dependent Claim
17 words
The apparatus according to claim 5, wherein said one aperture electrode is disposed between two quadrupole lenses.
Claim 11
Dependent Claim
20 words
The apparatus according to claim 1, wherein said source for the beam of electrically charged particles is an electron gun.
Claim 12
Dependent Claim
20 words
The apparatus according to claim 1, wherein said source for a beam of electric charged particles is an ion source.
Claim 13
Dependent Claim
54 words
A quadrupole lens system comprising at least one quadrupole lens having two end surfaces, an aperture electrode adjacent at least one of the end surfaces and having an aperture coaxial with the quadrupole lens, and means for supplying a voltage to the aperture electrode for producing the effect of a combined quadrupole-octopole lens system.
Claim 14
Dependent Claim
54 words
A quadrupole lens system comprising at least one quadrupole lens having two end surfaces, an aperture electrode adjacent at least one of the end surfaces and having an aperture coaxial with the quadrupole lens, and means for supplying a voltage to the aperture electrode for producing the effect of a combined quadrupole-octopole lens system.
Claim 15
Dependent Claim
17 words
The quadrupole lens system according to claim 12, wherein said quadrupole lens is of a magnetic type.
Claim 16
Dependent Claim
17 words
The quadrupole lens system according to claim 12, wherein said quadrupole lens is of an electrostatic type.
Claim 17
Dependent Claim
46 words
The quadrupole lens system according to claim 12, further comprising a source of a beam of electrically charged particles, one of the end surfaces facing the source of the beam, and the aperture electrode being positioned between the one end surface the source of the beam.
Claim 18
Dependent Claim
34 words
The quadrupole lens system according to claim 12, further comprising an object, one of the end surfaces facing the object, and the aperture electrode being positioned between the one end surface and the object.
Claim 19
Dependent Claim
72 words
The quadrupole lens system according to claim 12, further comprising a source of a beam of electrically charged particles and an object arranged to receive the beam, one of the end surfaces facing the source of the beam and the other one of the end surfaces facing the object, and respective ones of the aperture electrodes being positioned between the end surfaces and the source of the beam and the object, respectively.
Claim 20
Dependent Claim
32 words
The quadrupole lens system according to claim 12, wherein a plurality of aperture electrodes are disposed one each between each of a plurality of quadrupole lenses and the quadrupole lens adjacent thereto.
Claim 21
Dependent Claim
41 words
The quadrupole lens system of claim 12, further comprising a source of electrically charge particles and a source of an accelerating voltage applied to the beam, the voltage applied to the aperture electrode being 1 - 10% of the accelerating voltage.
Claim 22
Independent Claim
91 words
A method of forming a rectangular or linear shaped pattern on an object with a beam of electrically charged particles, which comprises the steps of: a. passing a beam of electrically charge particles through a rectangular aperture to shape the beam into a rectangular beam having four sides, b. changing the ratio of the lengths of adjacent sides of the rectangular beam to a desired ratio, and c. shifting the rectangular beam the lengths of whose sides have been changed to impinge the same upon a desired position on the object.
Claim 23
Independent Claim
91 words
A method of forming a rectangular or linear shaped pattern on an object with a beam of electrically charged particles, which comprises the steps of: a. passing a beam of electrically charge particles through a rectangular aperture to shape the beam into a rectangular beam having four sides, b. changing the ratio of the lengths of adjacent sides of the rectangular beam to a desired ratio, and c. shifting the rectangular beam the lengths of whose sides have been changed to impinge the same upon a desired position on the object.
Claim 24
Dependent Claim
17 words
The method according to claim 20, wherein said beam of electrically charged particles is an electron beam.
Claim 25
Dependent Claim
17 words
The method according to claim 20, wherein said beam of electrically charged particles is an ion beam.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1981-02-20 | 1981-08-22 | 1982-02-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1985-02-20 | 1985-08-22 | 1986-02-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1989-02-20 | 1989-08-22 | 1990-02-21 | $7700.00 | Window Closed / Lapsed |