Process for preparing isocyanic acid derivatives

Claim 2

A process for preparing isocyanic acid derivative having a isocyanatomethyl group and/or isocyanurate ring structure, which consists essentially of reacting at 70° to 200° C (A) an organic halogen compound having a monohalogenomethyl group or monohalogenomethylene group, or mixtures thereof, with (B) an alkali cyanate selected from the group consisting of lithium cyanate, sodium cyanate, potassium cyanate, rubidium cyanate, cesium cyanate, ammonium cyanate and mixtures thereof, in (C) an organic solvent selected from the group consisting of N,N-disubstituted organic acid amines, N,N'-disubstituted organic sulfonic acid amides, dialkyl sulfoxides, dialkyl sulfones, polyalkylene sulfoxide, polyalkylene sulfone, macrocyclic polyethers and mixtures thereof, in the presence of (D) at least one polyhalogen compound selected from the group consisting of compounds having dihalogenomethyl group, dihalogenomethylene group or trihalogenomethyl group and tetrahalogenomethanes in an amount in the range of from 1 to 20 weight percent, based on the weight of said organic halogen compound (A), until isocyanic acid derivative of (A) is formed, said polyhalogen compound (D) being compatible with organic compounds or organic halogen compounds as reaction solvent and being present at the start or midway of the reaction and being effective to prevent side reactions and being unchanged by the reaction, and recovering from the reaction mixture said isocyanic acid derivative.

Claim 3

A process according to claim 1, in which said polyhalogen compound (D) is selected from the group consisting of carbon tetrachloride, carbon tetrabromide, hexachloroethane, hexachlorobutadiene, bromoform, iodoform and tetrabromoethane.

Claim 4

A process according to claim 1, in which the amount of said polyhalogen compound (D) is from 2 to 18 weight percent based on the weight of organic halogen compound (A).

Claim 5

A process according to claim 1, in which said organic solvent (C) is selected from the group consisting of dimethylformamide, diethylformamide, N,N-dimethylacetamide, N,N-diethylacetamide, N-methylpyrrolidone, dimethylsulfoxide and their mixtures.

Claim 6

A process according to claim 1, in which said organic halogen compound (A) is selected from the group consisting of alkyl chlorides, alkenyl chlorides, aralkyl chlorides and their bromides.

Claim 7

A process according to claim 5, in which said chlorides are selected from the group consisting of alkyl dichlorides alkenyl dichlorides and aralkyl dichlorides.

Claim 8

A process according to claim 6, in which said dichloride is xylylene dichloride.

Claim 9

A process according to claim 6, in which said dichloride is dichlorobutene-2.

Claim 10

A process according to claim 1 in which said organic halogen compound (A) is selected from the group consisting of methyl chloride, ethyl chloride, propyl chloride, butyl chloride, amyl chloride, hexyl chloride, heptyl chloride, octyl chloride, nonyl chloride, decyl chloride, dodecyl chloride, tetradecyl chloride, hexadecyl chloride, octadecyl chloride, chlorinated paraffin, cyclohexyl chloride, cyclopentyl chloride dichloroethane, dichloropropane, dichlorobutane, dichloropentane, dichlorohexane, allyl chloride, crotyl chloride, butenyl chloride, propargyl chloride, 1,4-dichlorobutene-2, di(chloromethyl)ether, di(chloroethyl)ether, di(chloropropyl)ether, di(chlorobutyl)ether, chlorodimethyl ether, chlorodiethyl ether, chlorodipropyl ether, methylchloroethyl ether, propylchloroethyl ether, butylchloroethyl ether, triethylene glycol dichloride, tetraethylene glycol dichloride, polyethylene glycol dichloride, di(chloroethyl)formal, di(chloroethyl)acetal, di(chloroethyl)butyral, ethylchloroethylacetal, di(chloroethyl)acetone ketal, chloroacetone, dichloroacetone, chlorocyclohexanone, dichlorocyclohexanone, chloroacetone methylketal, dichloroacetone dimethylketal, chloroacetic acid esters, chloroethyl chloroacetate, di(chloroethyl)maleate, di(chloroethyl) succinate, di(chloroethyl) adipate, di(chloroethyl) phthalate, di(chloroethyl) carbonate, chlorodimethyl thioether, chlorodiethyl thioether, di(chloromethyl) thioether, di(chlorethyl) thioeter, chloroacetonitrile, chloropropionitrile, chlorobutyronitrile, chlorocapronitrile, dichloroadiponitrile, benzyl chloride, chlorobenzyl chloride, methylbenzyl chloride, methoxybenzyl chloride, nitrobenzyl chloride, cyanobenzyl chloride, isocyanatomethylbenzyl chloride, xylylene dichloride, chloroxylylene dichloride, methyxylylene dichloride, dimethylxylydine dichloride, methoxyxylylene dichloride, isocyanatomethylxylylene dichloride, trichloropseudocumene, trichloromesitylene, tetrachlorodurene, chloromethylbiphenyl, chloromethylnaphthalene, chloromethylcyclopentadiene, chloromethylfuran, chloromethylpyride, chloromethyldiphenyl ether, di(chloromethylphenyl) ether, di(chloromethylphenyl) thioether, di(chloromethylphenyl)sulfone, di(chloromethylphenyl) sulfoxide, dichloromethylbenzidine, phenacyl chloride, chloromethylphenylmethyl ketone, chloromethylphenacyl chloride, chloromethylbenzophenone, di(chloromethyl)benzophenone, chloromethylnaphthylalkyl ethers, di(chloromethylnaphthyl) ether, chloromethylbisphenol A, bis(chlorocyclohexyl), bis(chlorocyclohexyl) ether, bis(chloromethyl)dichlorohexyl, chlorinated petroleum hydrocarbons, chlorinated alkylbenzenes, chloromethylated coal tar hydrocarbons, chloromethylated terpene hydrocarbons, chloromethylated polystyrenes, chloromethylated petroleum resins, chloromethylated coumaroneindene resins, chloromethylated polyterpenes, chloromethylated phenols and chloromethylated phenolic resins and said polyhalogen compound (D) is selected from the group consisting of dichloromethane, dibromomethane, diiodomethane, chloroform, bromoform, iodoform, carbon tetrachloride, carbon tetrabromide, carbon tetraiodide, dichlorodifluoromethane, fluorotrichloromethane, trifluoromethane, trifluorobromomethane, trifluoroiodomethane, trichloroethylene, tetrachloroethylene, perchlorobutadiene, trichloroethane, tetrachloroethane, pentachloroethane, hexachloroethane, tribromoethane, tetrabromoethane, trichloroethylene dibromide, tetrachloroethylene dibromide, tetrafluoroethylene dichloride, trifluorotrichloroethane, tetrafluoroethylene dibromide, trifluorochlorodibromethane, hexafluoropropene dichloride, hexafluoropropene dibromide, fureons, perfluorobutadiene tetrachloride, perfluorobutadiene tetrabromide, chloral, chloral acetal, pentachloroacetone, pentachloroacetone ketal, hexachloroacetone, pentachloroacetone, pentachloroacetone ketal, hexachloroacetone, hexachloroacetone ketal, pentafluoroacetone, pentrafluoroacetone ketal, hexafluoroacetone, hexafluoroacetone ketal, trichlorotrifluoroacetone, tetrachlorodifluoroacetone, pentachlorofluoroacetone, dichlorotetrafluoroacetone, chloropentafluoroacetone, trichloroacetonitrile, trifluoroacetonitrile, tribromoacetonitrile, dichloroacetonitrile, dichlorofluoroacetonitrile, chlorodifluoroacetonitrile, trifluoroacetic acid esters, perfluorofatty acid esters, perfluoroalkanes, perfluoroalkenes, perfluoroalkyl ethers, perfluoroalkylbenzens, perfluorofatty acid amides, benzal chloride, chlorobenzal chloride, benzotrichloride, chlorobenzotrichloride, benzal bluoride, chlorobenzal fluoride, benzotrifluroide, chlorobenzotrifluoride, trifluoromethylbenzal fluoride, trifluoromethylbenzotrifluoride, chlorodifluoromethylbenzene, dichlorofluoromethylbenzene, bromodifluoromethylbenzene, dibromofluoromethylbenzene, chlorodifluoromethylbenzotrifluoride, dichlorofluoromethylbenzotrichloride, dichlorofluoromethylbenzotrifluoride, perfluoroalkyl thioethers, perfluoroalkyl amines, perfluoroalkyl phosphoric acid esters, perfluroalkyl chlorides, perfluroalkyl bromides, and perfluoroalkyl iodides.

Claim 11

A process according to claim 9 in which said polyhalogen compound (D) is added in advance of the reaction to the organic halogen compound (A) or to the solvent (C).